Rami HOURANI

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Bottom-up fill dielectric materials for semiconductor structure fab...
- Patent number 12,341,061
- Issue date Jun 24, 2025
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures with metal oxide-caped contacts...
- Patent number 12,087,836
- Issue date Sep 10, 2024
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures with metal oxide layers to inhi...
- Patent number 12,080,639
- Issue date Sep 3, 2024
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric helmet-based approaches for back end of line (BEOL) inte...
- Patent number 11,990,403
- Issue date May 21, 2024
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lined photobucket structure for back end of line (BEOL) interconnec...
- Patent number 11,953,826
- Issue date Apr 9, 2024
- Intel Corporation
- James M. Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential hardmasks for modulation of electrobucket sensitivity
- Patent number 11,955,377
- Issue date Apr 9, 2024
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grating replication using helmets and topographically-selective dep...
- Patent number 11,894,270
- Issue date Feb 6, 2024
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned gate endcap (SAGE) architectures without fin end gap
- Patent number 11,869,889
- Issue date Jan 9, 2024
- Intel Corporation
- Szuya S. Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structures with metal oxide-caped contacts...
- Patent number 11,837,644
- Issue date Dec 5, 2023
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming gate structures for transistors arranged in...
- Patent number 11,616,060
- Issue date Mar 28, 2023
- Intel Corporation
- Aaron D. Lilak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective gate spacers for semiconductor devices
- Patent number 11,532,724
- Issue date Dec 20, 2022
- Intel Corporation
- Scott B. Clendenning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop layer-based approaches for conductive via fabrication and...
- Patent number 11,456,248
- Issue date Sep 27, 2022
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive cap-based approaches for conductive via fabrication and...
- Patent number 11,417,567
- Issue date Aug 16, 2022
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned repeatedly stackable 3D vertical RRAM
- Patent number 11,404,482
- Issue date Aug 2, 2022
- Intel Corporation
- Noriyuki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multifunctional molecules for selective polymer formation on conduc...
- Patent number 11,398,428
- Issue date Jul 26, 2022
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grating replication using helmets and topographically-selective dep...
- Patent number 11,335,598
- Issue date May 17, 2022
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differential hardmasks for modulation of electrobucket sensitivity
- Patent number 11,251,072
- Issue date Feb 15, 2022
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom-up fill dielectric materials for semiconductor structure fab...
- Patent number 11,232,980
- Issue date Jan 25, 2022
- Intel Corporation
- Florian Gstrein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lined photobucket structure for back end of line (BEOL) interconnec...
- Patent number 11,137,681
- Issue date Oct 5, 2021
- Intel Corporation
- James M. Blackwell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical thin film transistor structures with localized gate dielec...
- Patent number 11,139,401
- Issue date Oct 5, 2021
- Intel Corporation
- Brian Doyle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric helmet-based approaches for back end of line (BEOL) inte...
- Patent number 11,011,463
- Issue date May 18, 2021
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective gate spacers for semiconductor devices
- Patent number 10,971,600
- Issue date Apr 6, 2021
- Intel Corporation
- Scott B. Clendenning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photobucket floor colors with selective grafting
- Patent number 10,892,184
- Issue date Jan 12, 2021
- Intel Corporation
- Robert L. Bristol
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Differentiated molecular domains for selective hardmask fabrication...
- Patent number 10,886,175
- Issue date Jan 5, 2021
- Intel Corporation
- Eungnak Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition utilizing sacrificial blocking layers for semi...
- Patent number 10,756,215
- Issue date Aug 25, 2020
- Intel Corporation
- Grant Kloster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Via blocking layer
- Patent number 10,672,650
- Issue date Jun 2, 2020
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned via
- Patent number 10,615,117
- Issue date Apr 7, 2020
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Via blocking layer
- Patent number 10,535,601
- Issue date Jan 14, 2020
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microelectronic conductive routes and methods of making the same
- Patent number 10,497,613
- Issue date Dec 3, 2019
- Intel Corporation
- Jasmeet S. Chawla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective gate spacers for semiconductor devices
- Patent number 10,396,176
- Issue date Aug 27, 2019
- Intel Corporation
- Scott B. Clendenning
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITHOUT FIN END GAP
- Publication number 20240088143
- Publication date Mar 14, 2024
- Intel Corporation
- Szuya S. LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE-CAPED CONTACTS...
- Publication number 20240047543
- Publication date Feb 8, 2024
- Intel Corporation
- Rami HOURANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...
- Publication number 20220238376
- Publication date Jul 28, 2022
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY
- Publication number 20220130719
- Publication date Apr 28, 2022
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM-UP FILL DIELECTRIC MATERIALS FOR SEMICONDUCTOR STRUCTURE FAB...
- Publication number 20220102207
- Publication date Mar 31, 2022
- Intel Corporation
- Florian GSTREIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...
- Publication number 20210397084
- Publication date Dec 23, 2021
- Intel Corporation
- James M. BLACKWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC HELMET-BASED APPROACHES FOR BACK END OF LINE (BEOL) INTE...
- Publication number 20210225698
- Publication date Jul 22, 2021
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE GATE SPACERS FOR SEMICONDUCTOR DEVICES
- Publication number 20210143265
- Publication date May 13, 2021
- Intel Corporation
- Scott B. CLENDENNING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE-CAPED CONTACTS...
- Publication number 20210091194
- Publication date Mar 25, 2021
- Intel Corporation
- Rami HOURANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE LAYERS TO INHI...
- Publication number 20210090990
- Publication date Mar 25, 2021
- Intel Corporation
- Rami HOURANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITHOUT FIN END GAP
- Publication number 20210091075
- Publication date Mar 25, 2021
- Intel Corporation
- Szuya S. LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIFUNCTIONAL MOLECULES FOR SELECTIVE POLYMER FORMATION ON CONDUC...
- Publication number 20210057337
- Publication date Feb 25, 2021
- Intel Corporation
- Eungnak HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH STOP LAYER-BASED APPROACHES FOR CONDUCTIVE VIA FABRICATION AND...
- Publication number 20210013145
- Publication date Jan 14, 2021
- Intel Corporation
- Florian GSTREIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE
- Publication number 20200402917
- Publication date Dec 24, 2020
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL THIN FILM TRANSISTOR STRUCTURES WITH LOCALIZED GATE DIELEC...
- Publication number 20200388711
- Publication date Dec 10, 2020
- Intel Corporation
- Brian Doyle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING
- Publication number 20200066521
- Publication date Feb 27, 2020
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIATED MOLECULAR DOMAINS FOR SELECTIVE HARDMASK FABRICATION...
- Publication number 20200058548
- Publication date Feb 20, 2020
- Intel Corporation
- Eungnak HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE GATE SPACERS FOR SEMICONDUCTOR DEVICES
- Publication number 20200020786
- Publication date Jan 16, 2020
- Intel Corporation
- Scott B. CLENDENNING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED REPEATEDLY STACKABLE 3D VERTICAL RRAM
- Publication number 20200006427
- Publication date Jan 2, 2020
- Intel Corporation
- Noriyuki SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR FORMING GATE STRUCTURES FOR TRANSISTORS ARRANGED IN...
- Publication number 20200006331
- Publication date Jan 2, 2020
- Intel Corporation
- AARON D. LILAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...
- Publication number 20200006138
- Publication date Jan 2, 2020
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDUCTIVE CAP-BASED APPROACHES FOR CONDUCTIVE VIA FABRICATION AND...
- Publication number 20190363008
- Publication date Nov 28, 2019
- Intel Corporation
- Florian GSTREIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY
- Publication number 20190318959
- Publication date Oct 17, 2019
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING
- Publication number 20190318958
- Publication date Oct 17, 2019
- Intel Corporation
- Robert L. BRISTOL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED VIA
- Publication number 20190311984
- Publication date Oct 10, 2019
- Intel Corporation
- Kevin L. Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM-UP FILL DIELECTRIC MATERIALS FOR SEMICONDUCTOR STRUCTURE FAB...
- Publication number 20190267282
- Publication date Aug 29, 2019
- Intel Corporation
- Florian GSTREIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION UTILIZING SACRIFICIAL BLOCKING LAYERS FOR SEMI...
- Publication number 20190189803
- Publication date Jun 20, 2019
- Intel Corporation
- Grant KLOSTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...
- Publication number 20190146335
- Publication date May 16, 2019
- Intel Corporation
- James M. BLACKWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIELECTRIC HELMET-BASED APPROACHES FOR BACK END OF LINE (BEOL) INTE...
- Publication number 20190139887
- Publication date May 9, 2019
- Intel Corporation
- Kevin L. LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIA BLOCKING LAYER
- Publication number 20190122982
- Publication date Apr 25, 2019
- Intel Corporation
- Rami Hourani
- H01 - BASIC ELECTRIC ELEMENTS

Rami HOURANI

Person

Patents Grantslast 30 patents

Bottom-up fill dielectric materials for semiconductor structure fab...

Contact over active gate structures with metal oxide-caped contacts...

Contact over active gate structures with metal oxide layers to inhi...

Dielectric helmet-based approaches for back end of line (BEOL) inte...

Lined photobucket structure for back end of line (BEOL) interconnec...

Differential hardmasks for modulation of electrobucket sensitivity

Grating replication using helmets and topographically-selective dep...

Self-aligned gate endcap (SAGE) architectures without fin end gap

Contact over active gate structures with metal oxide-caped contacts...

Techniques for forming gate structures for transistors arranged in...

Selective gate spacers for semiconductor devices

Etch stop layer-based approaches for conductive via fabrication and...

Conductive cap-based approaches for conductive via fabrication and...

Self-aligned repeatedly stackable 3D vertical RRAM

Multifunctional molecules for selective polymer formation on conduc...

Grating replication using helmets and topographically-selective dep...

Differential hardmasks for modulation of electrobucket sensitivity

Bottom-up fill dielectric materials for semiconductor structure fab...

Lined photobucket structure for back end of line (BEOL) interconnec...

Vertical thin film transistor structures with localized gate dielec...

Dielectric helmet-based approaches for back end of line (BEOL) inte...

Selective gate spacers for semiconductor devices

Photobucket floor colors with selective grafting

Differentiated molecular domains for selective hardmask fabrication...

Selective deposition utilizing sacrificial blocking layers for semi...

Via blocking layer

Self-aligned via

Via blocking layer

Microelectronic conductive routes and methods of making the same

Selective gate spacers for semiconductor devices

Patents Applicationslast 30 patents

SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITHOUT FIN END GAP

CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE-CAPED CONTACTS...

GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...

DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY

BOTTOM-UP FILL DIELECTRIC MATERIALS FOR SEMICONDUCTOR STRUCTURE FAB...

LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...

DIELECTRIC HELMET-BASED APPROACHES FOR BACK END OF LINE (BEOL) INTE...

SELECTIVE GATE SPACERS FOR SEMICONDUCTOR DEVICES

CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE-CAPED CONTACTS...

CONTACT OVER ACTIVE GATE STRUCTURES WITH METAL OXIDE LAYERS TO INHI...

SELF-ALIGNED GATE ENDCAP (SAGE) ARCHITECTURES WITHOUT FIN END GAP

MULTIFUNCTIONAL MOLECULES FOR SELECTIVE POLYMER FORMATION ON CONDUC...

ETCH STOP LAYER-BASED APPROACHES FOR CONDUCTIVE VIA FABRICATION AND...

INTEGRATED CIRCUIT STRUCTURE

VERTICAL THIN FILM TRANSISTOR STRUCTURES WITH LOCALIZED GATE DIELEC...

COLORED SELF-ALIGNED SUBTRACTIVE PATTERNING

DIFFERENTIATED MOLECULAR DOMAINS FOR SELECTIVE HARDMASK FABRICATION...

SELECTIVE GATE SPACERS FOR SEMICONDUCTOR DEVICES

SELF-ALIGNED REPEATEDLY STACKABLE 3D VERTICAL RRAM

TECHNIQUES FOR FORMING GATE STRUCTURES FOR TRANSISTORS ARRANGED IN...

GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...

CONDUCTIVE CAP-BASED APPROACHES FOR CONDUCTIVE VIA FABRICATION AND...

DIFFERENTIAL HARDMASKS FOR MODULATION OF ELECTROBUCKET SENSITIVITY

PHOTOBUCKET FLOOR COLORS WITH SELECTIVE GRAFTING

SELF-ALIGNED VIA

BOTTOM-UP FILL DIELECTRIC MATERIALS FOR SEMICONDUCTOR STRUCTURE FAB...

SELECTIVE DEPOSITION UTILIZING SACRIFICIAL BLOCKING LAYERS FOR SEMI...

LINED PHOTOBUCKET STRUCTURE FOR BACK END OF LINE (BEOL) INTERCONNEC...

DIELECTRIC HELMET-BASED APPROACHES FOR BACK END OF LINE (BEOL) INTE...

VIA BLOCKING LAYER