Ranadeep BHOWMICK

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control for ion energy delivery using multiple generators a...
- Patent number 12,255,052
- Issue date Mar 18, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for extracting process control information from...
- Patent number 12,131,886
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance match with an elongated RF strap
- Patent number 12,080,518
- Issue date Sep 3, 2024
- Lam Research Corporation
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,935,726
- Issue date Mar 19, 2024
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,908,660
- Issue date Feb 20, 2024
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing power delivery to an electrode o...
- Patent number 11,335,539
- Issue date May 17, 2022
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High speed synchronization of plasma source/bias power delivery
- Patent number 11,158,488
- Issue date Oct 26, 2021
- MKS Instruments, Inc.
- Aaron T. Radomski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,861,708
- Issue date Dec 8, 2020
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three or more states for achieving high aspect ratio dielectric etch
- Patent number 10,504,744
- Issue date Dec 10, 2019
- Lam Research Corporation
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active feedback control of subsystems of a process module
- Patent number 10,366,869
- Issue date Jul 30, 2019
- Lam Research Corporation
- Scott Riggs
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fluorocarbon based aspect-ratio independent etching
- Patent number 9,257,300
- Issue date Feb 9, 2016
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER ASSOCIATED WITH AN...
- Publication number 20250140526
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING
- Publication number 20250118534
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20240395504
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20240186112
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Use of Low Frequency Harmonics in Bias Radi...
- Publication number 20230317414
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20230298857
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK
- Publication number 20230274914
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC
- Publication number 20230245874
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CONTROL FOR ION ENERGY DELIVERY USING MULTIPLE GENERATORS A...
- Publication number 20230230804
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY
- Publication number 20230215694
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20230081542
- Publication date Mar 16, 2023
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiofrequency Signal Filter Arrangement for Plasma Processing System
- Publication number 20230054699
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimization of Radiofrequency Signal Ground Return in Plasma Proce...
- Publication number 20230059495
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...
- Publication number 20230007885
- Publication date Jan 12, 2023
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20220199366
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20220005674
- Publication date Jan 6, 2022
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...
- Publication number 20210319980
- Publication date Oct 14, 2021
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Speed Synchronization Of Plasma Source/Bias Power Delivery
- Publication number 20200411289
- Publication date Dec 31, 2020
- MKS Instruments, Inc.
- Aaron T. RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE OR MORE STATES FOR ACHIEVING HIGH ASPECT RATIO DIELECTRIC ETCH
- Publication number 20200090948
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Takumi Yanagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE FEEDBACK CONTROL OF SUBSYSTEMS OF A PROCESS MODULE
- Publication number 20190157039
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Scott Riggs
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLUOROCARBON BASED ASPECT-RATIO INDEPENDENT ETCHING
- Publication number 20150017809
- Publication date Jan 15, 2015
- LAM RESEARCH CORPORATION
- Ranadeep BHOWMICK
- H01 - BASIC ELECTRIC ELEMENTS

Ranadeep BHOWMICK

Person

Patents Grantslast 30 patents

Systems and methods for using binning to increase power during a lo...

Process control for ion energy delivery using multiple generators a...

Systems and methods for extracting process control information from...

Impedance match with an elongated RF strap

High speed synchronization of plasma source/bias power delivery

Systems and methods for optimizing power delivery to an electrode o...

Systems and methods for optimizing power delivery to an electrode o...

High speed synchronization of plasma source/bias power delivery

Three or more states for achieving high aspect ratio dielectric etch

Three or more states for achieving high aspect ratio dielectric etch

Active feedback control of subsystems of a process module

Fluorocarbon based aspect-ratio independent etching

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER ASSOCIATED WITH AN...

SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING

Systems and Methods for Extracting Process Control Information from...

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

Systems and Methods for Use of Low Frequency Harmonics in Bias Radi...

Systems and Methods for Extracting Process Control Information from...

LOW FREQUENCY RF GENERATOR AND ASSOCIATED ELECTROSTATIC CHUCK

SYSTEMS AND METHODS FOR CONTROLLING A PLASMA SHEATH CHARACTERISTIC

PROCESS CONTROL FOR ION ENERGY DELIVERY USING MULTIPLE GENERATORS A...

DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

Radiofrequency Signal Filter Arrangement for Plasma Processing System

Optimization of Radiofrequency Signal Ground Return in Plasma Proce...

SYSTEMS AND METHODS FOR USING BINNING TO INCREASE POWER DURING A LO...

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

High Speed Synchronization Of Plasma Source/Bias Power Delivery

SYSTEMS AND METHODS FOR OPTIMIZING POWER DELIVERY TO AN ELECTRODE O...

High Speed Synchronization Of Plasma Source/Bias Power Delivery

THREE OR MORE STATES FOR ACHIEVING HIGH ASPECT RATIO DIELECTRIC ETCH

ACTIVE FEEDBACK CONTROL OF SUBSYSTEMS OF A PROCESS MODULE

FLUOROCARBON BASED ASPECT-RATIO INDEPENDENT ETCHING