Randal Chance

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to align mask patterns
- Patent number 8,674,512
- Issue date Mar 18, 2014
- Micron Technology, Inc.
- Gurtej S. Sandhu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method to align mask patterns
- Patent number 8,338,085
- Issue date Dec 25, 2012
- Micron Technology, Inc.
- Gurtej S. Sandhu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Imprint templates for imprint lithography, and methods of patternin...
- Patent number 7,767,129
- Issue date Aug 3, 2010
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method to align mask patterns
- Patent number 7,655,387
- Issue date Feb 2, 2010
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to align mask patterns
- Patent number 7,455,956
- Issue date Nov 25, 2008
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to align mask patterns
- Patent number 7,435,536
- Issue date Oct 14, 2008
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for photolithographic processing
- Patent number 7,375,793
- Issue date May 20, 2008
- Micron Technology, Inc.
- Kevin Duesman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor constructions
- Patent number 7,271,413
- Issue date Sep 18, 2007
- Micron Technology, Inc.
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor constructions
- Patent number 7,122,425
- Issue date Oct 17, 2006
- Micron Technology, Inc.
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for photolithographic processing
- Patent number 6,872,509
- Issue date Mar 29, 2005
- Micron Technology, Inc.
- Kevin Duesman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Static discharge circuit having low breakdown voltage bipolar clamp
- Patent number 5,581,104
- Issue date Dec 3, 1996
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing, by a factor or 2.sup.-N, the minimum masking p...
- Patent number 5,328,810
- Issue date Jul 12, 1994
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shifting reticle fabrication using ion implantation
- Patent number 5,208,125
- Issue date May 4, 1993
- Micron Technology, Inc.
- Tyler A. Lowrey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for fabricating, on the edge of a silicon mesa, a MOSFET wh...
- Patent number 5,177,027
- Issue date Jan 5, 1993
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor package utilizing edge connected semiconductor dice
- Patent number 5,146,308
- Issue date Sep 8, 1992
- Micron Technology, Inc.
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing edge connected semiconductor die
- Patent number 5,126,286
- Issue date Jun 30, 1992
- Micron Technology, Inc.
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device transistor and cell structure
- Patent number 5,087,951
- Issue date Feb 11, 1992
- Micron Technology
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Split-polysilicon CMOS process incorporating unmasked punchthrough...
- Patent number 5,032,530
- Issue date Jul 16, 1991
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating a DRAM array having feature widths that tra...
- Patent number 5,013,680
- Issue date May 7, 1991
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced mask manufacture of semiconductor memory devices
- Patent number 4,957,878
- Issue date Sep 18, 1990
- Micron Technology, Inc.
- Tyler A. Lowrey
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD TO ALIGN MASK PATTERNS
- Publication number 20130105976
- Publication date May 2, 2013
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO ALIGN MASK PATTERNS
- Publication number 20100092890
- Publication date Apr 15, 2010
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO ALIGN MASK PATTERNS
- Publication number 20070190463
- Publication date Aug 16, 2007
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Imprint templates for imprint lithography, and methods of patternin...
- Publication number 20060255505
- Publication date Nov 16, 2006
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to align mask patterns
- Publication number 20060240362
- Publication date Oct 26, 2006
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming mask patterns, methods of correcting feature dim...
- Publication number 20060183025
- Publication date Aug 17, 2006
- Micron Technology, Inc.
- Baorui Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor constructions
- Publication number 20060063350
- Publication date Mar 23, 2006
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming semiconductor constructions
- Publication number 20060046424
- Publication date Mar 2, 2006
- Randal W. Chance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to align mask patterns
- Publication number 20060046201
- Publication date Mar 2, 2006
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for converting reticle configurations
- Publication number 20050077266
- Publication date Apr 14, 2005
- Randal W. Chance
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for photolithographic processing
- Publication number 20040191702
- Publication date Sep 30, 2004
- Kevin Duesman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and methods for photolithographic processing
- Publication number 20040023137
- Publication date Feb 5, 2004
- Kevin Duesman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Randal Chance

Person

Patents Grantslast 30 patents

Method to align mask patterns

Method to align mask patterns

Imprint templates for imprint lithography, and methods of patternin...

Method to align mask patterns

Method to align mask patterns

Method to align mask patterns

Apparatus for photolithographic processing

Semiconductor constructions

Methods of forming semiconductor constructions

Apparatus and methods for photolithographic processing

Static discharge circuit having low breakdown voltage bipolar clamp

Method for reducing, by a factor or 2.sup.-N, the minimum masking p...

Phase shifting reticle fabrication using ion implantation

Process for fabricating, on the edge of a silicon mesa, a MOSFET wh...

Semiconductor package utilizing edge connected semiconductor dice

Method of manufacturing edge connected semiconductor die

Semiconductor memory device transistor and cell structure

Split-polysilicon CMOS process incorporating unmasked punchthrough...

Process for fabricating a DRAM array having feature widths that tra...

Reduced mask manufacture of semiconductor memory devices

Patents Applicationslast 30 patents

METHOD TO ALIGN MASK PATTERNS

METHOD TO ALIGN MASK PATTERNS

METHOD TO ALIGN MASK PATTERNS

Imprint templates for imprint lithography, and methods of patternin...

Method to align mask patterns

Methods of forming mask patterns, methods of correcting feature dim...

Semiconductor constructions

Methods of forming semiconductor constructions

Method to align mask patterns

Methods for converting reticle configurations

Apparatus for photolithographic processing

Apparatus and methods for photolithographic processing