Regina Freed

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition of semiconductor integration films
- Patent number 12,300,491
- Issue date May 13, 2025
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase photoresists deposition
- Patent number 12,084,764
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self aligned multiple patterning
- Patent number 11,881,402
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned subtractive etch
- Patent number 11,869,807
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for controllable metal and barrier-liner recess
- Patent number 11,705,366
- Issue date Jul 18, 2023
- Micromaterials LLC
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 11,621,172
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,562,904
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contact and contact over active gate structures
- Patent number 11,437,273
- Issue date Sep 6, 2022
- Micromaterials LLC
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 11,437,274
- Issue date Sep 6, 2022
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching metal oxides with less etch residue
- Patent number 11,232,955
- Issue date Jan 25, 2022
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing transfer pattern defects in a semiconductor de...
- Patent number 11,217,448
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM capacitor module
- Patent number 11,164,938
- Issue date Nov 2, 2021
- Micromaterials LLC
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for performing profile metrology on semicondu...
- Patent number 11,133,152
- Issue date Sep 28, 2021
- Applied Materials, Inc.
- Regina Freed
- G01 - MEASURING TESTING
Information Patent Grant
Methods for controllable metal and barrier-liner recess
- Patent number 11,062,942
- Issue date Jul 13, 2021
- Micromaterials LLC
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 11,037,825
- Issue date Jun 15, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating a fully self-aligned via
- Patent number 10,892,187
- Issue date Jan 12, 2021
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for removing metal oxides
- Patent number 10,892,183
- Issue date Jan 12, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 10,790,191
- Issue date Sep 29, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing transfer pattern defects in a semiconductor de...
- Patent number 10,777,414
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for creating a fully self-aligned via
- Patent number 10,699,953
- Issue date Jun 30, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for fault isolation by emission spectra analysis
- Patent number 10,620,263
- Issue date Apr 14, 2020
- FEI EFA, Inc.
- Herve Deslandes
- G01 - MEASURING TESTING
Information Patent Grant
Methods of etching metal oxides with less etch residue
- Patent number 10,622,221
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing self-aligned vias
- Patent number 10,600,688
- Issue date Mar 24, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etched self-aligned via processes
- Patent number 10,593,594
- Issue date Mar 17, 2020
- Micromaterials LLC
- Yung-Chen Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing self-aligned grown via
- Patent number 10,573,555
- Issue date Feb 25, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of producing fully self-aligned vias and contacts
- Patent number 10,553,485
- Issue date Feb 4, 2020
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 10,522,404
- Issue date Dec 31, 2019
- Micromaterials LLC
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...
- Publication number 20240027916
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- RUIYING HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230386839
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230290646
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS
- Publication number 20230259035
- Publication date Aug 17, 2023
- Applied Materials, Inc.
- Paola DE CECCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20230215736
- Publication date Jul 6, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230127535
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20220367270
- Publication date Nov 17, 2022
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20220359289
- Publication date Nov 10, 2022
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION
- Publication number 20220197146
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Lauren Bagby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RECIPE OPTIMIZATION THROUGH MACHINE LEARNING
- Publication number 20220198333
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Robert Charles Pack
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF ALIGNED MULTIPLE PATTERNING
- Publication number 20220102144
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Lili FENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20220028691
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20220026807
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM Capacitor Module
- Publication number 20220013624
- Publication date Jan 13, 2022
- Micromaterials LLC.
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY DEVELOP PROCESS OF PHOTORESIST
- Publication number 20220004105
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Yuqiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE PHOTORESISTS DEPOSITION
- Publication number 20220002869
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS
- Publication number 20220002882
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED SUBTRACTIVE ETCH
- Publication number 20210391215
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods For Controllable Metal And Barrier-Liner Recess
- Publication number 20210305091
- Publication date Sep 30, 2021
- Micromaterials LLC.
- He Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20210090952
- Publication date Mar 25, 2021
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20200388535
- Publication date Dec 10, 2020
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING TRANSFER PATTERN DEFECTS IN A SEMICONDUCTOR DE...
- Publication number 20200357639
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAM Capacitor Module
- Publication number 20200312953
- Publication date Oct 1, 2020
- Micromaterials LLC.
- Uday Mitra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PERFORMING PROFILE METROLOGY ON SEMICONDU...
- Publication number 20200300618
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- REGINA FREED
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING TRANSFER PATTERN DEFECTS IN A SEMICONDUCTOR DE...
- Publication number 20200294802
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20200279773
- Publication date Sep 3, 2020
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Etching Metal Oxides With Less Etch Residue
- Publication number 20200227275
- Publication date Jul 16, 2020
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...
- Publication number 20200135464
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- SREE RANGASAI V. KESAPRAGADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20200098633
- Publication date Mar 26, 2020
- Micromaterials LLC.
- Ying Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Creating A Fully Self-Aligned Via
- Publication number 20190378756
- Publication date Dec 12, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS

Regina Freed

Person

Patents Grantslast 30 patents

Deposition of semiconductor integration films

Vapor phase photoresists deposition

Vapor phase thermal etch solutions for metal oxo photoresists

Vapor phase thermal etch solutions for metal oxo photoresists

Deposition of semiconductor integration films

Self aligned multiple patterning

Fully self-aligned subtractive etch

Methods for controllable metal and barrier-liner recess

Vapor phase thermal etch solutions for metal oxo photoresists

Deposition of semiconductor integration films

Self-aligned contact and contact over active gate structures

Fully self-aligned via

Methods of etching metal oxides with less etch residue

Methods for reducing transfer pattern defects in a semiconductor de...

DRAM capacitor module

Methods and apparatus for performing profile metrology on semicondu...

Methods for controllable metal and barrier-liner recess

Selective removal process to create high aspect ratio fully self-al...

Method for creating a fully self-aligned via

Methods for removing metal oxides

Selective removal process to create high aspect ratio fully self-al...

Methods for reducing transfer pattern defects in a semiconductor de...

Method for creating a fully self-aligned via

System and method for fault isolation by emission spectra analysis

Methods of etching metal oxides with less etch residue

Methods of producing self-aligned vias

Selectively etched self-aligned via processes

Methods of producing self-aligned grown via

Methods of producing fully self-aligned vias and contacts

Fully self-aligned via

Patents Applicationslast 30 patents

FINGERPRINTING AND PROCESS CONTROL OF PHOTOSENSITIVE FILM DEPOSITIO...

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

FULLY SELF-ALIGNED VIA

PHOTORESISTS BY PHYSICAL VAPOR DEPOSITION

RECIPE OPTIMIZATION THROUGH MACHINE LEARNING

SELF ALIGNED MULTIPLE PATTERNING

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

DRAM Capacitor Module

DRY DEVELOP PROCESS OF PHOTORESIST

VAPOR PHASE PHOTORESISTS DEPOSITION

VAPOR PHASE THERMAL ETCH SOLUTIONS FOR METAL OXO PHOTORESISTS

FULLY SELF-ALIGNED SUBTRACTIVE ETCH

Methods For Controllable Metal And Barrier-Liner Recess

Fully Self-Aligned Via

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

METHODS FOR REDUCING TRANSFER PATTERN DEFECTS IN A SEMICONDUCTOR DE...

DRAM Capacitor Module

METHODS AND APPARATUS FOR PERFORMING PROFILE METROLOGY ON SEMICONDU...

METHODS FOR REDUCING TRANSFER PATTERN DEFECTS IN A SEMICONDUCTOR DE...

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

Methods Of Etching Metal Oxides With Less Etch Residue

METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...

FULLY SELF-ALIGNED VIA

Method For Creating A Fully Self-Aligned Via