Reinhard SCHAUER

Person

Laufen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for depositing an epitaxial layer on a front side of a semic...
- Patent number 11,982,015
- Issue date May 14, 2024
- Siltronic AG
- Joerg Haberecht
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxially coated semiconductor wafer of monocrystalline silicon a...
- Patent number 11,578,424
- Issue date Feb 14, 2023
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor for holding a semiconductor wafer having an orientation n...
- Patent number 11,380,621
- Issue date Jul 5, 2022
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor for holding a semiconductor wafer with an orientation not...
- Patent number 10,991,614
- Issue date Apr 27, 2021
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing a semiconductor wafer with epitaxial layer in...
- Patent number 10,597,795
- Issue date Mar 24, 2020
- Siltronic AG
- Patrick Moos
- C30 - CRYSTAL GROWTH
Information Patent Grant
Susceptor for holding a semiconductor wafer having an orientation n...
- Patent number 9,991,208
- Issue date Jun 5, 2018
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing an epitaxially coated semiconductor wafer
- Patent number 9,240,316
- Issue date Jan 19, 2016
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Grant
Epitaxially coated silicon wafer and method for producing an epitax...
- Patent number 8,304,860
- Issue date Nov 6, 2012
- Siltronic AG
- Friedrich Passek
- C30 - CRYSTAL GROWTH
Information Patent Grant
Epitaxially coated silicon wafer and method for producing epitaxial...
- Patent number 7,935,614
- Issue date May 3, 2011
- Siltronic AG
- Reinhard Schauer
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Epitaxially coated silicon wafer and method for producing epitaxial...
- Patent number 7,922,813
- Issue date Apr 12, 2011
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Grant
Epitaxially coated semiconductor wafer and device and method for pr...
- Patent number 7,838,398
- Issue date Nov 23, 2010
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxially coated silicon wafer and method for producing epitaxial...
- Patent number 7,659,207
- Issue date Feb 9, 2010
- Siltronic AG
- Reinhard Schauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxially coated silicon wafer and method for producing epitaxial...
- Patent number 7,579,261
- Issue date Aug 25, 2009
- Siltronic AG
- Reinhard Schauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coated semiconductor wafer, and process and apparatus for producing...
- Patent number 7,285,483
- Issue date Oct 23, 2007
- Silitronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coated semiconductor wafer, and process and device for producing th...
- Patent number 7,101,794
- Issue date Sep 5, 2006
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for the production of an epitaxially grown semiconductor wafer
- Patent number 6,630,024
- Issue date Oct 7, 2003
- Wacker Siltronic Gesellschaft fur Halbleitermaterialien AG
- Rüdiger Schmolke
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for producing a semiconductor wafer
- Patent number 6,306,735
- Issue date Oct 23, 2001
- Wacker Siltronic Gesellschaft fur Halbleitermaterialien AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Grant
Epitaxially coated semiconductor wafers having low-oxygen zone of a...
- Patent number 5,355,831
- Issue date Oct 18, 1994
- Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
- Reinhard Schauer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR DEPOSITING AN EPITAXIAL LAYER ON A FRONT SIDE OF A SEMIC...
- Publication number 20220267926
- Publication date Aug 25, 2022
- Siltronic AG
- Joerg HABERECHT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIALLY COATED SEMICONDUCTOR WAFER OF MONOCRYSTALLINE SILICON A...
- Publication number 20210087705
- Publication date Mar 25, 2021
- Siltronic AG
- Reinhard SCHAUER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUSCEPTOR FOR HOLDING A SEMICONDUCTOR WAFER WITH AN ORIENTATION NOT...
- Publication number 20200365443
- Publication date Nov 19, 2020
- Siltronic AG
- Reinhard SCHAUER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING A SEMICONDUCTOR WAFER WITH EPITAXIAL LAYER IN...
- Publication number 20180282900
- Publication date Oct 4, 2018
- Siltronic AG
- Patrick MOOS
- C30 - CRYSTAL GROWTH
Information Patent Application
Susceptor For Holding A Semiconductor Wafer Having An Orientation N...
- Publication number 20180211923
- Publication date Jul 26, 2018
- Siltronic AG
- Reinhard Schauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR FOR HOLDING A SEMICONDUCTOR WAFER HAVING AN ORIENTATION N...
- Publication number 20170117228
- Publication date Apr 27, 2017
- Siltronic AG
- Reinhard SCHAUER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUSCEPTOR FOR SUPPORTING A SEMICONDUCTOR WAFER AND METHOD FOR DEPOS...
- Publication number 20120270407
- Publication date Oct 25, 2012
- Siltronic AG
- Norbert Werner
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially Coated Semiconductor Wafer and Device and Method For Pr...
- Publication number 20110073041
- Publication date Mar 31, 2011
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially coated silicon wafer and method for producing an epitax...
- Publication number 20100224964
- Publication date Sep 9, 2010
- Siltronic AG
- Friedrich Passek
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for producing an epitaxially coated semiconductor wafer
- Publication number 20090277376
- Publication date Nov 12, 2009
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
EPITAXIALLY COATED SILICON WAFER AND METHOD FOR PRODUCING EPITAXIAL...
- Publication number 20090261456
- Publication date Oct 22, 2009
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially coated semiconductor wafer and device and method for pr...
- Publication number 20080118712
- Publication date May 22, 2008
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially coated silicon wafer and method for producing epitaxial...
- Publication number 20070066082
- Publication date Mar 22, 2007
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially coated silicon wafer and method for producing epitaxial...
- Publication number 20070066036
- Publication date Mar 22, 2007
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Epitaxially coated silicon wafer and method for producing epitaxial...
- Publication number 20070062438
- Publication date Mar 22, 2007
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Coated semiconductor wafer, and process and apparatus for producing...
- Publication number 20060079089
- Publication date Apr 13, 2006
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Coated semiconductor wafer, and process and device for producing th...
- Publication number 20040266181
- Publication date Dec 30, 2004
- Siltronic AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Semiconductor wafer with a thin epitaxial silicon layer, and produc...
- Publication number 20040144977
- Publication date Jul 29, 2004
- WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG
- Reinhard Schauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for the production of an epitaxially grown semiconductor wafer
- Publication number 20020022351
- Publication date Feb 21, 2002
- Rudiger Schmolke
- C30 - CRYSTAL GROWTH
Information Patent Application
Standard for a nanotopography unit, and a method for producing the...
- Publication number 20010041258
- Publication date Nov 15, 2001
- WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AG
- Friedrich Passek
- B82 - NANO-TECHNOLOGY

Reinhard SCHAUER

Person

Patents Grantslast 30 patents

Method for depositing an epitaxial layer on a front side of a semic...

Epitaxially coated semiconductor wafer of monocrystalline silicon a...

Susceptor for holding a semiconductor wafer having an orientation n...

Susceptor for holding a semiconductor wafer with an orientation not...

Method for producing a semiconductor wafer with epitaxial layer in...

Susceptor for holding a semiconductor wafer having an orientation n...

Method for producing an epitaxially coated semiconductor wafer

Epitaxially coated silicon wafer and method for producing an epitax...

Epitaxially coated silicon wafer and method for producing epitaxial...

Epitaxially coated silicon wafer and method for producing epitaxial...

Epitaxially coated semiconductor wafer and device and method for pr...

Epitaxially coated silicon wafer and method for producing epitaxial...

Epitaxially coated silicon wafer and method for producing epitaxial...

Coated semiconductor wafer, and process and apparatus for producing...

Coated semiconductor wafer, and process and device for producing th...

Method for the production of an epitaxially grown semiconductor wafer

Method for producing a semiconductor wafer

Epitaxially coated semiconductor wafers having low-oxygen zone of a...

Patents Applicationslast 30 patents

METHOD FOR DEPOSITING AN EPITAXIAL LAYER ON A FRONT SIDE OF A SEMIC...

EPITAXIALLY COATED SEMICONDUCTOR WAFER OF MONOCRYSTALLINE SILICON A...

SUSCEPTOR FOR HOLDING A SEMICONDUCTOR WAFER WITH AN ORIENTATION NOT...

METHOD FOR PRODUCING A SEMICONDUCTOR WAFER WITH EPITAXIAL LAYER IN...

Susceptor For Holding A Semiconductor Wafer Having An Orientation N...

SUSCEPTOR FOR HOLDING A SEMICONDUCTOR WAFER HAVING AN ORIENTATION N...

SUSCEPTOR FOR SUPPORTING A SEMICONDUCTOR WAFER AND METHOD FOR DEPOS...

Epitaxially Coated Semiconductor Wafer and Device and Method For Pr...

Epitaxially coated silicon wafer and method for producing an epitax...

Method for producing an epitaxially coated semiconductor wafer

EPITAXIALLY COATED SILICON WAFER AND METHOD FOR PRODUCING EPITAXIAL...

Epitaxially coated semiconductor wafer and device and method for pr...

Epitaxially coated silicon wafer and method for producing epitaxial...

Epitaxially coated silicon wafer and method for producing epitaxial...

Epitaxially coated silicon wafer and method for producing epitaxial...

Coated semiconductor wafer, and process and apparatus for producing...

Coated semiconductor wafer, and process and device for producing th...

Semiconductor wafer with a thin epitaxial silicon layer, and produc...

Method for the production of an epitaxially grown semiconductor wafer

Standard for a nanotopography unit, and a method for producing the...