Richard Parsons

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for wall film monitoring
- Patent number 7,732,227
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for wall film monitoring
- Patent number 7,214,289
- Issue date May 8, 2007
- Tokyo Electron Limited
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Grant
Non-linear test load and method of calibrating a plasma system
- Patent number 7,216,067
- Issue date May 8, 2007
- Tokyo Electron Limited
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for electron density measurement
- Patent number 7,177,781
- Issue date Feb 13, 2007
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved plasma processing uniformity
- Patent number 7,164,236
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Man-machine interface for monitoring and controlling a process
- Patent number 7,158,845
- Issue date Jan 2, 2007
- Tokyo Electron Limited
- Richard Parsons
- G05 - CONTROLLING REGULATING
Information Patent Grant
Integrated VI probe
- Patent number 7,154,256
- Issue date Dec 26, 2006
- Tokyo Electron Limited
- Richard Parsons
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for removing harmonics in semiconductor plasma pr...
- Patent number 7,102,292
- Issue date Sep 5, 2006
- Tokyo Electron Limited
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Addition of power at selected harmonics of plasma processor drive f...
- Patent number 6,917,204
- Issue date Jul 12, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Control of power delivered to a multiple segment inject electrode
- Patent number 6,884,635
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for monitoring and controlling gas plasma processes
- Patent number 6,535,785
- Issue date Mar 18, 2003
- Tokyo Electron Limited
- Wayne Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for monitoring and controlling gas plasma processes
- Patent number 6,351,683
- Issue date Feb 26, 2002
- Tokyo Electron Limited
- Wayne Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for detecting and preventing arcing in RF plasma...
- Patent number 6,332,961
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Wayne L. Johnson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical impedance matching system and method
- Patent number 6,313,584
- Issue date Nov 6, 2001
- Tokyo Electron Limited
- Wayne L. Johnson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for wall film monitoring
- Publication number 20070020776
- Publication date Jan 25, 2007
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- G01 - MEASURING TESTING
Information Patent Application
Method and system for electron density measurement
- Publication number 20060032287
- Publication date Feb 16, 2006
- TOKYO ELECTRON LIMITED
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for non-invasive measurement and analysis of s...
- Publication number 20060021970
- Publication date Feb 2, 2006
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device for remote identification of parts
- Publication number 20050231372
- Publication date Oct 20, 2005
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for non-invasive measurement and analysis of s...
- Publication number 20050183821
- Publication date Aug 25, 2005
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated vi probe
- Publication number 20050184668
- Publication date Aug 25, 2005
- TOKYO ELECTRON LIMITED
- Rick Parsons
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for non-invasive measurement and analysis of s...
- Publication number 20050145334
- Publication date Jul 7, 2005
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and device for removing harmonics in semiconductor plasma pr...
- Publication number 20050001555
- Publication date Jan 6, 2005
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Facility monitor
- Publication number 20040250108
- Publication date Dec 9, 2004
- Richard Parsons
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Method and apparatus for wall film monitoring
- Publication number 20040232920
- Publication date Nov 25, 2004
- Eric J Strang
- G01 - MEASURING TESTING
Information Patent Application
Man-machine interface for monitoring and controlling a process
- Publication number 20040236451
- Publication date Nov 25, 2004
- Richard Parsons
- G05 - CONTROLLING REGULATING
Information Patent Application
Non-linear test load and method of calibrating a plasma system
- Publication number 20040210407
- Publication date Oct 21, 2004
- TOKYO ELECTRON LIMITED
- Bill H. Quon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20040168770
- Publication date Sep 2, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Addition of power at selected harmonics of plasma processor drive f...
- Publication number 20040035837
- Publication date Feb 26, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Wafer bias drive for plasma source
- Publication number 20040018127
- Publication date Jan 29, 2004
- TOKYO ELECTRON LIMITED
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20030137251
- Publication date Jul 24, 2003
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for mitigating chamber resonances in plasma pr...
- Publication number 20030084999
- Publication date May 8, 2003
- TOKYO ELECTRON LIMITED
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-zone RF electrode for field/plasma uniformity control in capa...
- Publication number 20030079983
- Publication date May 1, 2003
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control of power delivered to a multiple segment inject electrode
- Publication number 20030052085
- Publication date Mar 20, 2003
- Richard Parsons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for monitoring and controlling gas plasma processes
- Publication number 20020026251
- Publication date Feb 28, 2002
- TOKYO ELECTRON LIMITED
- Wayne Johnson
- H01 - BASIC ELECTRIC ELEMENTS

Richard Parsons

Person

Patents Grantslast 30 patents

Method and apparatus for wall film monitoring

Method and apparatus for wall film monitoring

Non-linear test load and method of calibrating a plasma system

Method and system for electron density measurement

Method and apparatus for improved plasma processing uniformity

Man-machine interface for monitoring and controlling a process

Integrated VI probe

Method and device for removing harmonics in semiconductor plasma pr...

Addition of power at selected harmonics of plasma processor drive f...

Control of power delivered to a multiple segment inject electrode

System and method for monitoring and controlling gas plasma processes

System and method for monitoring and controlling gas plasma processes

Device and method for detecting and preventing arcing in RF plasma...

Electrical impedance matching system and method

Patents Applicationslast 30 patents

Method and apparatus for wall film monitoring

Method and system for electron density measurement

Method and apparatus for non-invasive measurement and analysis of s...

Device for remote identification of parts

Method and apparatus for non-invasive measurement and analysis of s...

Integrated vi probe

Method and apparatus for non-invasive measurement and analysis of s...

Method and device for removing harmonics in semiconductor plasma pr...

Facility monitor

Method and apparatus for wall film monitoring

Man-machine interface for monitoring and controlling a process

Non-linear test load and method of calibrating a plasma system

Method and apparatus for improved plasma processing uniformity

Addition of power at selected harmonics of plasma processor drive f...

Wafer bias drive for plasma source

Method and apparatus for improved plasma processing uniformity

Apparatus and method for mitigating chamber resonances in plasma pr...

Multi-zone RF electrode for field/plasma uniformity control in capa...

Control of power delivered to a multiple segment inject electrode

System and method for monitoring and controlling gas plasma processes