Rie Inazawa

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Yamanashi-ken, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for multilayer photoresist dry development
- Patent number 8,048,325
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Vaidyanathan Balasubramaniam
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for multilayer photoresist dry development
- Publication number 20080128388
- Publication date Jun 5, 2008
- TOKYO ELECTRON LIMITED
- Vaidyanathan BALASUBRAMANIAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060154486
- Publication date Jul 13, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-pressure removal of photoresist and etch residue
- Publication number 20060144817
- Publication date Jul 6, 2006
- TOKYO ELECTRON LIMITED
- Vaidyanathan Balasubramaniam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etching method and plasma etching apparatus
- Publication number 20050103441
- Publication date May 19, 2005
- Masanobu Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method
- Publication number 20050085077
- Publication date Apr 21, 2005
- Kazuto Ogawa
- H01 - BASIC ELECTRIC ELEMENTS