Riichirou Aoki

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,966,821
- Issue date Nov 22, 2005
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,547,638
- Issue date Apr 15, 2003
- Ebara Corporation
- Katsuya Okumura
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,443,808
- Issue date Sep 3, 2002
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,439,971
- Issue date Aug 27, 2002
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,425,806
- Issue date Jul 30, 2002
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 6,273,802
- Issue date Aug 14, 2001
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Polishing apparatus and method for planarizing layer on a semicondu...
- Patent number 5,948,205
- Issue date Sep 7, 1999
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and method for planarizing layer on a semicondu...
- Patent number 5,914,275
- Issue date Jun 22, 1999
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Patent number 5,885,138
- Issue date Mar 23, 1999
- Ebara Corporation
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Method for planarizing a semiconductor body by CMP method and an ap...
- Patent number 5,695,601
- Issue date Dec 9, 1997
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus with improved exhaust
- Patent number 5,653,623
- Issue date Aug 5, 1997
- Ebara Corporation
- Norio Kimura
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device
- Patent number 5,641,581
- Issue date Jun 24, 1997
- Kabushiki Kaisha Toshiba
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 5,616,063
- Issue date Apr 1, 1997
- Kabushiki Kaisya Toshiba
- Katsuya Okumura
- B08 - CLEANING
Information Patent Grant
Semiconductor planarizing apparatus
- Patent number 5,597,341
- Issue date Jan 28, 1997
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming silicon oxide on a semiconductor
- Patent number 5,571,578
- Issue date Nov 5, 1996
- Kabushiki Kaisha Tohsiba
- Naruhiko Kaji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for planarizing a semiconductor device having a amorphous layer
- Patent number 5,445,996
- Issue date Aug 29, 1995
- Kabushiki Kaisha Toshiba
- Masako Kodera
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing silicon oxide film containing fluorine
- Patent number 5,429,995
- Issue date Jul 4, 1995
- Kabushiki Kaisha Toshiba
- Yukio Nishiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for polishing a workpiece
- Patent number 5,398,459
- Issue date Mar 21, 1995
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor device having a backplate electrode
- Patent number 5,068,709
- Issue date Nov 26, 1991
- Kabushiki Kaisha Toshiba
- Hidemitsu Egawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 4,937,652
- Issue date Jun 26, 1990
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a backplate electrode
- Patent number 4,875,088
- Issue date Oct 17, 1989
- Kabushiki Kaisha Toshiba
- Hidemitsu Egawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20080090501
- Publication date Apr 17, 2008
- Katsuya Okumura
- B08 - CLEANING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20060009130
- Publication date Jan 12, 2006
- Katsuya Okumura
- B08 - CLEANING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20030148714
- Publication date Aug 7, 2003
- Katsuya Okumura
- B08 - CLEANING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20010014572
- Publication date Aug 16, 2001
- Katsuya Okumura
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20010010996
- Publication date Aug 2, 2001
- Katsuya Okumura
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20010011000
- Publication date Aug 2, 2001
- Katsuya Okumura
- F24 - HEATING RANGES VENTILATING
Information Patent Application
Method and apparatus for dry-in, dry-out polishing and washing of a...
- Publication number 20010010997
- Publication date Aug 2, 2001
- Katsuya Okumura
- F24 - HEATING RANGES VENTILATING

Riichirou Aoki

Person

Patents Grantslast 30 patents

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Polishing apparatus and method for planarizing layer on a semicondu...

Polishing apparatus and method for planarizing layer on a semicondu...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method for planarizing a semiconductor body by CMP method and an ap...

Polishing apparatus with improved exhaust

Semiconductor device

Polishing apparatus

Semiconductor planarizing apparatus

Method for forming silicon oxide on a semiconductor

Method for planarizing a semiconductor device having a amorphous layer

Method of manufacturing silicon oxide film containing fluorine

Method and apparatus for polishing a workpiece

Semiconductor device having a backplate electrode

Semiconductor device and method of manufacturing the same

Semiconductor device having a backplate electrode

Patents Applicationslast 30 patents

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...

Method and apparatus for dry-in, dry-out polishing and washing of a...