Robert Anthony Ditizio

Person

Petaluma, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Formation of a layer on a semiconductor substrate
- Patent number 10,096,473
- Issue date Oct 9, 2018
- Aixtron SE
- Maxim Kelman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanolayer deposition using bias power treatment
- Patent number 9,708,707
- Issue date Jul 18, 2017
- ASM International N.V.
- Robert Anthony Ditizio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
NanoLayer Deposition process for composite films
- Patent number 9,121,098
- Issue date Sep 1, 2015
- ASM International N.V.
- Robert Anthony Ditizio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etch stop process for eliminating electrical shorting in MRAM d...
- Patent number 7,955,870
- Issue date Jun 7, 2011
- OEM Group Inc.
- Robert A. Ditizio
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Dry etch stop process for eliminating electrical shorting in MRAM d...
- Patent number 7,645,618
- Issue date Jan 12, 2010
- Tegal Corporation
- Robert Anthony Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for processing a wafer including stop-on-aluminum...
- Patent number 7,169,623
- Issue date Jan 30, 2007
- Tegal Corporation
- Robert Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition shield for a plasma reactor
- Patent number 6,521,081
- Issue date Feb 18, 2003
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,360,686
- Issue date Mar 26, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,173,674
- Issue date Jan 16, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,170,431
- Issue date Jan 9, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with a deposition shield
- Patent number 6,006,694
- Issue date Dec 28, 1999
- Tegal Corporation
- Stephen P. DeOrnellas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FORMATION OF A LAYER ON A SEMICONDUCTOR SUBSTRATE
- Publication number 20170294306
- Publication date Oct 12, 2017
- AIXTRON SE
- Maxim Kelman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOLAYER DEPOSITION USING PLASMA TREATMENT
- Publication number 20120202353
- Publication date Aug 9, 2012
- ASM INTERNATIONAL N.V.
- Robert Anthony Ditizio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOLAYER DEPOSITION PROCESS FOR COMPOSITE FILMS
- Publication number 20120021138
- Publication date Jan 26, 2012
- Tegal Corporation
- Robert Anthony Ditizio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming and patterning conformal insulation layer in vias...
- Publication number 20110207323
- Publication date Aug 25, 2011
- Robert Ditizio
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
NANOLAYER DEPOSITION USING BIAS POWER TREATMENT
- Publication number 20100285237
- Publication date Nov 11, 2010
- Tegal Corporation
- Robert Anthony Ditizio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCH STOP PROCESS FOR ELIMINATING ELECTRICAL SHORTING IN MRAM D...
- Publication number 20100022030
- Publication date Jan 28, 2010
- TEGAL CORPORATION
- Robert Anthony Ditizio
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Dry etch stop process for eliminating electrical shorting in MRAM d...
- Publication number 20070155027
- Publication date Jul 5, 2007
- Tegal Corporation
- Robert Anthony Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated decoupling capacitor process
- Publication number 20070026626
- Publication date Feb 1, 2007
- Tegal Corporation
- Robert Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for processing a wafer including stop-on-alumina...
- Publication number 20060186496
- Publication date Aug 24, 2006
- Tegal Corporation
- Robert Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for processing a wafer including stop-on-aluminum...
- Publication number 20060051881
- Publication date Mar 9, 2006
- Tegal Corporation
- Robert Ditizio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with a deposition shield
- Publication number 20010029894
- Publication date Oct 18, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS

Robert Anthony Ditizio

Person

Patents Grantslast 30 patents

Formation of a layer on a semiconductor substrate

Nanolayer deposition using bias power treatment

NanoLayer Deposition process for composite films

Dry etch stop process for eliminating electrical shorting in MRAM d...

Dry etch stop process for eliminating electrical shorting in MRAM d...

System and method for processing a wafer including stop-on-aluminum...

Deposition shield for a plasma reactor

Plasma reactor with a deposition shield

Plasma reactor with a deposition shield

Plasma reactor with a deposition shield

Plasma reactor with a deposition shield

Patents Applicationslast 30 patents

FORMATION OF A LAYER ON A SEMICONDUCTOR SUBSTRATE

NANOLAYER DEPOSITION USING PLASMA TREATMENT

NANOLAYER DEPOSITION PROCESS FOR COMPOSITE FILMS

Method of forming and patterning conformal insulation layer in vias...

NANOLAYER DEPOSITION USING BIAS POWER TREATMENT

DRY ETCH STOP PROCESS FOR ELIMINATING ELECTRICAL SHORTING IN MRAM D...

Dry etch stop process for eliminating electrical shorting in MRAM d...

Integrated decoupling capacitor process

System and method for processing a wafer including stop-on-alumina...

System and method for processing a wafer including stop-on-aluminum...

Plasma reactor with a deposition shield