Robert Charatan

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,614,149
- Issue date Dec 24, 2013
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for critical dimension reduction and pitch reduction
- Patent number 8,529,728
- Issue date Sep 10, 2013
- Lam Research Corporation
- Robert Charatan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,268,118
- Issue date Sep 18, 2012
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 7,695,632
- Issue date Apr 13, 2010
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas mixture for removing photoresist and post etch residue from low...
- Patent number 7,479,457
- Issue date Jan 20, 2009
- Lam Research Corporation
- Cristian Paduraru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch with photoresist mask
- Patent number 7,442,649
- Issue date Oct 28, 2008
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for critical dimension reduction and pitch reduction
- Patent number 7,427,458
- Issue date Sep 23, 2008
- Lam Research Corporation
- Robert Charatan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial layer for protection during trench etch
- Patent number 7,205,226
- Issue date Apr 17, 2007
- Lam Research Corporation
- David Schaefer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for minimizing agglomerate particle size in a...
- Patent number 7,014,539
- Issue date Mar 21, 2006
- Lam Research Corporation
- Robert Charatan
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and associated method for conditioning in chemical mechan...
- Patent number 7,004,825
- Issue date Feb 28, 2006
- Lam Research Corporation
- Travis R. Taylor
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad conditioning system
- Patent number 6,958,005
- Issue date Oct 25, 2005
- Lam Research Corporation
- Robert Charatan
- B24 - GRINDING POLISHING
Information Patent Grant
Method of and platen for controlling removal rate characteristics i...
- Patent number 6,955,588
- Issue date Oct 18, 2005
- Lam Research Corporation
- Robert L. Anderson, II
- B24 - GRINDING POLISHING
Information Patent Grant
Multiple-conditioning member device for chemical mechanical planari...
- Patent number 6,935,938
- Issue date Aug 30, 2005
- Lam Research Corporation
- Yehiel Gotkis
- B24 - GRINDING POLISHING
Information Patent Grant
Relative lateral motion in linear CMP
- Patent number 6,899,594
- Issue date May 31, 2005
- Lam Research Corporation
- Robert Charatan
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for an air bearing platen with raised topography
- Patent number 6,752,898
- Issue date Jun 22, 2004
- Lam Research Corporation
- Robert L. Anderson
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Wear Compensating Confinement Ring
- Publication number 20230369028
- Publication date Nov 16, 2023
- LAM RESEARCH CORPORATION
- Adam Christopher Mace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20120309201
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION
- Publication number 20120279656
- Publication date Nov 8, 2012
- Robert Charatan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20100148317
- Publication date Jun 17, 2010
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION
- Publication number 20100038032
- Publication date Feb 18, 2010
- Robert Charatan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for generating activated hydrogen for plasma s...
- Publication number 20070243713
- Publication date Oct 18, 2007
- LAM RESEARCH CORPORATION
- Robert Charatan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas mixture for removing photoresist and post etch residue from low...
- Publication number 20070054496
- Publication date Mar 8, 2007
- Cristian Paduraru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for critical dimension reduction and pitch reduction
- Publication number 20070004217
- Publication date Jan 4, 2007
- LAM RESEARCH CORPORATION
- Robert Charatan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical dimension reduction and roughness control
- Publication number 20060266478
- Publication date Nov 30, 2006
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch with photoresist mask
- Publication number 20060223327
- Publication date Oct 5, 2006
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD CONDITIONING SYSTEM
- Publication number 20050221731
- Publication date Oct 6, 2005
- Lam Research Corporation
- Robert Charatan
- B24 - GRINDING POLISHING
Information Patent Application
Polishing media for chemical mechanical planarization (CMP)
- Publication number 20040058623
- Publication date Mar 25, 2004
- LAM RESEARCH CORPORATION
- Jibing Lin
- B24 - GRINDING POLISHING

Robert Charatan

Person

Patents Grantslast 30 patents

Critical dimension reduction and roughness control

System and method for critical dimension reduction and pitch reduction

Critical dimension reduction and roughness control

Critical dimension reduction and roughness control

Gas mixture for removing photoresist and post etch residue from low...

Etch with photoresist mask

System and method for critical dimension reduction and pitch reduction

Sacrificial layer for protection during trench etch

Method and apparatus for minimizing agglomerate particle size in a...

Apparatus and associated method for conditioning in chemical mechan...

Polishing pad conditioning system

Method of and platen for controlling removal rate characteristics i...

Multiple-conditioning member device for chemical mechanical planari...

Relative lateral motion in linear CMP

Method and apparatus for an air bearing platen with raised topography

Patents Applicationslast 30 patents

Wear Compensating Confinement Ring

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION

Apparatus and method for generating activated hydrogen for plasma s...

Gas mixture for removing photoresist and post etch residue from low...

System and method for critical dimension reduction and pitch reduction

Critical dimension reduction and roughness control

Etch with photoresist mask

POLISHING PAD CONDITIONING SYSTEM

Polishing media for chemical mechanical planarization (CMP)