Robert D. Tolles

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Small batch polishing fluid delivery for CMP
- Patent number 11,772,234
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Color imaging for CMP monitoring
- Patent number 11,715,193
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Dominic J. Benvegnu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layered nano-fibrous CMP pads
- Patent number 10,800,000
- Issue date Oct 13, 2020
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Thin plastic polishing article for CMP applications
- Patent number 10,786,885
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Color imaging for CMP monitoring
- Patent number 10,565,701
- Issue date Feb 18, 2020
- Applied Materials, Inc.
- Dominic J. Benvegnu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bonding apparatus and method
- Patent number 8,545,660
- Issue date Oct 1, 2013
- GTAT Corporation
- Steven M. Zuniga
- B32 - LAYERED PRODUCTS
Information Patent Grant
Bonding apparatus and method
- Patent number 8,151,852
- Issue date Apr 10, 2012
- Twin Creeks Technologies, Inc.
- Steven M. Zuniga
- B32 - LAYERED PRODUCTS
Information Patent Grant
Chemical mechanical polishing system having multiple polishing stat...
- Patent number 8,079,894
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for rapid filling of a processing volume
- Patent number 7,950,407
- Issue date May 31, 2011
- Applied Materials, Inc.
- Victor Burton Mimken
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods of forming a photovoltaic cell
- Patent number 7,754,519
- Issue date Jul 13, 2010
- Twin Creeks Technologies, Inc.
- Robert D. Tolles
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Multilayer polishing pad and method of making
- Patent number 7,677,959
- Issue date Mar 16, 2010
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing system having multiple polishing stat...
- Patent number 7,614,939
- Issue date Nov 10, 2009
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing system having multiple polishing stat...
- Patent number 7,255,632
- Issue date Aug 14, 2007
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus having a trough
- Patent number 7,238,090
- Issue date Jul 3, 2007
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with transparent window having reduced window leakage...
- Patent number 7,189,141
- Issue date Mar 13, 2007
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Megasonic wafer cleaning tank with reflector for improved wafer edg...
- Patent number 7,165,565
- Issue date Jan 23, 2007
- Applied Materials, Inc.
- Robert D Tolles
- B08 - CLEANING
Information Patent Grant
Chemical mechanical polishing system having multiple polishing stat...
- Patent number 7,097,544
- Issue date Aug 29, 2006
- Applied Materials Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Two part retaining ring
- Patent number 6,974,371
- Issue date Dec 13, 2005
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with transparent window having reduced window leakage...
- Patent number 6,896,585
- Issue date May 24, 2005
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for making a polishing pad with a partial adhesive coating
- Patent number 6,716,092
- Issue date Apr 6, 2004
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for conditioning a polishing pad
- Patent number 6,702,651
- Issue date Mar 9, 2004
- Applied Materials Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing article
- Patent number 6,688,957
- Issue date Feb 10, 2004
- Applied Materials Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing apparatus
- Patent number 6,623,341
- Issue date Sep 23, 2003
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Material for use in carrier and polishing pads
- Patent number 6,607,428
- Issue date Aug 19, 2003
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
CMP platen with patterned surface
- Patent number 6,592,438
- Issue date Jul 15, 2003
- Applied Materials Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
CMP polishing pad
- Patent number 6,575,825
- Issue date Jun 10, 2003
- Applied Materials Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad conditioning element with discret...
- Patent number 6,572,446
- Issue date Jun 3, 2003
- Applied Materials Inc.
- Thomas H. Osterheld
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing article
- Patent number 6,533,645
- Issue date Mar 18, 2003
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Carrier head for providing a polishing slurry
- Patent number 6,527,624
- Issue date Mar 4, 2003
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with transparent window having reduced window leakage...
- Patent number 6,524,164
- Issue date Feb 25, 2003
- Applied Materials, Inc.
- Robert D. Tolles
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
SMALL BATCH POLISHING FLUID DELIVERY FOR CMP
- Publication number 20210122008
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Robert D. TOLLES
- B24 - GRINDING POLISHING
Information Patent Application
COLOR IMAGING FOR CMP MONITORING
- Publication number 20200151868
- Publication date May 14, 2020
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF IDENTIFYING AND TRACKING ROLL TO ROLL POLISHING PAD MATER...
- Publication number 20190030677
- Publication date Jan 31, 2019
- Applied Materials, Inc.
- Jeonghoon OH
- B24 - GRINDING POLISHING
Information Patent Application
THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS
- Publication number 20180207770
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Robert D. TOLLES
- B24 - GRINDING POLISHING
Information Patent Application
MULTI-LAYERED NANO-FIBROUS CMP PADS
- Publication number 20180009079
- Publication date Jan 11, 2018
- Applied Materials, Inc.
- Robert D. TOLLES
- B24 - GRINDING POLISHING
Information Patent Application
COLOR IMAGING FOR CMP MONITORING
- Publication number 20170140525
- Publication date May 18, 2017
- Dominic J. Benvegnu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BONDING OF THIN LAMINA
- Publication number 20140048201
- Publication date Feb 20, 2014
- GTAT CORPORATION
- Venkateswaran Subbaraman
- B32 - LAYERED PRODUCTS
Information Patent Application
BONDING APPARATUS AND METHOD
- Publication number 20100330776
- Publication date Dec 30, 2010
- Steven M. Zuniga
- B32 - LAYERED PRODUCTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STAT...
- Publication number 20100035526
- Publication date Feb 11, 2010
- Applied Materials, Inc.
- Robert D. Tolles
- B08 - CLEANING
Information Patent Application
OZONATION FOR ELIMINATION OF BACTERIA FOR WET PROCESSING SYSTEMS
- Publication number 20090044838
- Publication date Feb 19, 2009
- APPLIED MATERIALS, INC.
- Bruce Willing
- B08 - CLEANING
Information Patent Application
METHOD OF PROCESSING WAFERS IN A SEQUENTIAL FASHION
- Publication number 20080236615
- Publication date Oct 2, 2008
- VICTOR B. MIMKEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR RAPID FILLING OF A PROCESSING VOLUME
- Publication number 20080185018
- Publication date Aug 7, 2008
- APPLIED MATERIALS, INC.
- VICTOR BURTON MIMKEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STAT...
- Publication number 20070238399
- Publication date Oct 11, 2007
- Applied Materials, Inc.
- Robert D. Tolles
- B08 - CLEANING
Information Patent Application
Ozonation for elimination of bacteria for wet processing systems
- Publication number 20070068552
- Publication date Mar 29, 2007
- Bruce Willing
- B08 - CLEANING
Information Patent Application
Chemical mechanical polishing system having multiple polishing stat...
- Publication number 20060194525
- Publication date Aug 31, 2006
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B08 - CLEANING
Information Patent Application
Multilayer polishing pad and method of making
- Publication number 20060154568
- Publication date Jul 13, 2006
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for electroless capping with vapor drying
- Publication number 20060003570
- Publication date Jan 5, 2006
- Arulkumar Shanmugasundram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical mechanical polishing system having multiple polishing stat...
- Publication number 20050048880
- Publication date Mar 3, 2005
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B08 - CLEANING
Information Patent Application
Two part retaining ring
- Publication number 20040219870
- Publication date Nov 4, 2004
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with a partial adhesive coating
- Publication number 20040198187
- Publication date Oct 7, 2004
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Megasonic wafer cleaning tank with reflector for improved wafer edg...
- Publication number 20040154639
- Publication date Aug 12, 2004
- APPLIED MATERIALS, INC.
- Robert Tolles
- B08 - CLEANING
Information Patent Application
Substrate scrubbing apparatus having stationary brush member in con...
- Publication number 20040049870
- Publication date Mar 18, 2004
- APPLIED MATERIALS, INC.
- Robert Tolles
- B08 - CLEANING
Information Patent Application
CMP platen with patterned surface
- Publication number 20040053566
- Publication date Mar 18, 2004
- APPLIED MATERIALS, INC.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with transparent window having reduced window leakage...
- Publication number 20030171070
- Publication date Sep 11, 2003
- Applied Materials, a Delaware corporation
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with transparent window having reduced window leakage...
- Publication number 20030109197
- Publication date Jun 12, 2003
- APPLIED MATERIALS, INC.
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Material for use in carrier and polishing pads
- Publication number 20030003846
- Publication date Jan 2, 2003
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for conditioning a polishing pad
- Publication number 20020164928
- Publication date Nov 7, 2002
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Substrate polishing apparatus
- Publication number 20020132569
- Publication date Sep 19, 2002
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
Substrate polishing article
- Publication number 20020086619
- Publication date Jul 4, 2002
- Applied Materials, Inc., a Delaware corporation
- Robert D. Tolles
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING ARTICLE
- Publication number 20020077034
- Publication date Jun 20, 2002
- T0LLES
- Robert D Tolles
- B24 - GRINDING POLISHING

Robert D. Tolles

Person

Patents Grantslast 30 patents

Small batch polishing fluid delivery for CMP

Color imaging for CMP monitoring

Multi-layered nano-fibrous CMP pads

Thin plastic polishing article for CMP applications

Color imaging for CMP monitoring

Bonding apparatus and method

Bonding apparatus and method

Chemical mechanical polishing system having multiple polishing stat...

Apparatus for rapid filling of a processing volume

Methods of forming a photovoltaic cell

Multilayer polishing pad and method of making

Chemical mechanical polishing system having multiple polishing stat...

Chemical mechanical polishing system having multiple polishing stat...

Polishing apparatus having a trough

Polishing pad with transparent window having reduced window leakage...

Megasonic wafer cleaning tank with reflector for improved wafer edg...

Chemical mechanical polishing system having multiple polishing stat...

Two part retaining ring

Polishing pad with transparent window having reduced window leakage...

Apparatus for making a polishing pad with a partial adhesive coating

Method and apparatus for conditioning a polishing pad

Substrate polishing article

Substrate polishing apparatus

Material for use in carrier and polishing pads

CMP platen with patterned surface

CMP polishing pad

Chemical mechanical polishing pad conditioning element with discret...

Substrate polishing article

Carrier head for providing a polishing slurry

Polishing pad with transparent window having reduced window leakage...

Patents Applicationslast 30 patents

SMALL BATCH POLISHING FLUID DELIVERY FOR CMP

COLOR IMAGING FOR CMP MONITORING

METHOD OF IDENTIFYING AND TRACKING ROLL TO ROLL POLISHING PAD MATER...

THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS

MULTI-LAYERED NANO-FIBROUS CMP PADS

COLOR IMAGING FOR CMP MONITORING

BONDING OF THIN LAMINA

BONDING APPARATUS AND METHOD

CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STAT...

OZONATION FOR ELIMINATION OF BACTERIA FOR WET PROCESSING SYSTEMS

METHOD OF PROCESSING WAFERS IN A SEQUENTIAL FASHION

APPARATUS FOR RAPID FILLING OF A PROCESSING VOLUME

CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STAT...

Ozonation for elimination of bacteria for wet processing systems

Chemical mechanical polishing system having multiple polishing stat...

Multilayer polishing pad and method of making

Method and apparatus for electroless capping with vapor drying

Chemical mechanical polishing system having multiple polishing stat...

Two part retaining ring

Polishing pad with a partial adhesive coating

Megasonic wafer cleaning tank with reflector for improved wafer edg...

Substrate scrubbing apparatus having stationary brush member in con...

CMP platen with patterned surface

Polishing pad with transparent window having reduced window leakage...

Polishing pad with transparent window having reduced window leakage...

Material for use in carrier and polishing pads

Method and apparatus for conditioning a polishing pad

Substrate polishing apparatus

Substrate polishing article

SUBSTRATE POLISHING ARTICLE