Robert F. Rogler

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Rehoboth, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Selected novolak resin planarization layer for lithographic applica...
- Patent number 5,276,126
- Issue date Jan 4, 1994
- OCG Microelectronic Materials, Inc.
- Robert F. Rogler
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist developer containing fluorinated amphoteric surfactant
- Patent number 5,164,286
- Issue date Nov 17, 1992
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for developing selected positive photoresists
- Patent number 5,069,996
- Issue date Dec 3, 1991
- OCG Microelectronic Materials, Inc.
- Robert F. Rogler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY