Robert Soper

Person

Plano, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sub-resolution assist feature to improve symmetry for contact hole...
- Patent number 7,987,436
- Issue date Jul 26, 2011
- Texas Instruments Incorporated
- Scott William Jessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-resolution assist feature to improve symmetry for contact hole...
- Patent number 7,512,928
- Issue date Mar 31, 2009
- Texas Instruments Incorporated
- Scott William Jessen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for contiguous proximity correction for semicondu...
- Patent number 7,341,808
- Issue date Mar 11, 2008
- Texas Instruments Incorporated
- Theodore W. Houston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correcting a mask pattern using a clip mask
- Patent number 6,807,661
- Issue date Oct 19, 2004
- Texas Instruments Incorporated
- Robert A. Soper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double pattern and etch of poly with hard mask
- Patent number 6,787,469
- Issue date Sep 7, 2004
- Texas Instruments Incorporated
- Theodore W. Houston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting a mask pattern using multiple correction grids
- Patent number 6,785,878
- Issue date Aug 31, 2004
- Texas Instruments Incorporated
- Robert A. Soper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for mask pattern correction
- Patent number 6,764,795
- Issue date Jul 20, 2004
- Texas Instruments Incorporated
- Thomas J. Aton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Sub-Resolution Assist Feature To Improve Symmetry for Contact Hole...
- Publication number 20090146259
- Publication date Jun 11, 2009
- TEXAS INSTRUMENTS INCORPORATED
- Scott William Jessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for forming a photomask pattern
- Publication number 20070231710
- Publication date Oct 4, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Thomas J. Aton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using a center pole illumination scheme to improve symmetry for con...
- Publication number 20070082425
- Publication date Apr 12, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Scott William Jessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sub-resolution assist feature to improve symmetry for contact hole...
- Publication number 20070035031
- Publication date Feb 15, 2007
- TEXAS INSTRUMENTS INCORPORATED
- Scott William Jessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for contiguous proximity correction for semicondu...
- Publication number 20060019202
- Publication date Jan 26, 2006
- TEXAS INSTRUMENTS INCORPORATED
- Theodore W. Houston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correcting a mask pattern using a clip mask
- Publication number 20040181767
- Publication date Sep 16, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Robert A. Soper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Correcting a mask pattern using multiple correction grids
- Publication number 20040023127
- Publication date Feb 5, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Robert A. Soper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Double pattern and etch of poly with hard mask
- Publication number 20030124847
- Publication date Jul 3, 2003
- Theodore W. Houston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for mask pattern correction
- Publication number 20030039898
- Publication date Feb 27, 2003
- Thomas J. Aton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Robert Soper

Person

Patents Grantslast 30 patents

Sub-resolution assist feature to improve symmetry for contact hole...

Sub-resolution assist feature to improve symmetry for contact hole...

Method and system for contiguous proximity correction for semicondu...

Correcting a mask pattern using a clip mask

Double pattern and etch of poly with hard mask

Correcting a mask pattern using multiple correction grids

Method and system for mask pattern correction

Patents Applicationslast 30 patents

Sub-Resolution Assist Feature To Improve Symmetry for Contact Hole...

Method and system for forming a photomask pattern

Using a center pole illumination scheme to improve symmetry for con...

Sub-resolution assist feature to improve symmetry for contact hole...

Method and system for contiguous proximity correction for semicondu...

Correcting a mask pattern using a clip mask

Correcting a mask pattern using multiple correction grids

Double pattern and etch of poly with hard mask

Method and system for mask pattern correction