Rodney A. Kendall

Person

Ridgefield, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Individual beam detector for multiple beams, multi-beam irradiation...
- Patent number 10,714,311
- Issue date Jul 14, 2020
- NuFlare Technology, Inc.
- Yoshikuni Goshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun assembly
- Patent number 7,544,951
- Issue date Jun 9, 2009
- NuFlare Technology, Inc.
- Rodney Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote clamping mechanism via vacuum feedthrough
- Patent number 6,908,255
- Issue date Jun 21, 2005
- International Business Machines Corporation
- Rodney A. Kendall
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Electron beam position reference system
- Patent number 6,818,906
- Issue date Nov 16, 2004
- International Business Machines Corporation
- John G. Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam lithography apparatus with self actuated vacuum bypas...
- Patent number 6,724,001
- Issue date Apr 20, 2004
- International Business Machines Corporation
- David J. Pinckney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron scatter in a thin membrane to eliminate detector saturation
- Patent number 6,639,219
- Issue date Oct 28, 2003
- International Business Machines Corporation
- Rodney A. Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance source for electron beam projection lithography
- Patent number 6,596,999
- Issue date Jul 22, 2003
- Nikon Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method of high precision, thermally stable electromagne...
- Patent number 6,588,090
- Issue date Jul 8, 2003
- Nikon Corporation
- Rodney A. Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric blanking for high stability in electron beam exposure sys...
- Patent number 6,483,117
- Issue date Nov 19, 2002
- Nikon Corporation
- Clay S. Clement
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Target locking system for electron beam lithography
- Patent number 6,437,347
- Issue date Aug 20, 2002
- International Business Machines Corporation
- John George Hartley
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple numerical aperture electron beam projection lithography sy...
- Patent number 6,414,313
- Issue date Jul 2, 2002
- Nikon Corporation
- Michael S. Gordon
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Calibration target for electron beams
- Patent number 6,369,396
- Issue date Apr 9, 2002
- International Business Machines Corporation
- John G. Hartley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pinhole detector for electron intensity distribution
- Patent number 6,353,231
- Issue date Mar 5, 2002
- Nikon Corporation
- Steven Douglas Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Removable bombardment filament-module for electron beam projection...
- Patent number 6,252,339
- Issue date Jun 26, 2001
- Nikon Corporation
- Rodney Arthur Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-contact autofocus height detector for lithography systems
- Patent number 6,246,053
- Issue date Jun 12, 2001
- International Business Machines Corporation
- Rodney Arthur Kendall
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for writing a pattern using multiple variable shaped electro...
- Patent number 6,175,122
- Issue date Jan 16, 2001
- International Business Machines Corporation
- Timothy R. Groves
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Toroidal charged particle deflector with high mechanical stability...
- Patent number 6,153,885
- Issue date Nov 28, 2000
- Nikon Corporation
- Rodney Arthur Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High emittance electron source having high illumination uniformity
- Patent number 6,091,187
- Issue date Jul 18, 2000
- International Business Machines Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling method and apparatus for charged particle lenses and deflec...
- Patent number 6,053,241
- Issue date Apr 25, 2000
- Nikon Corporation
- Rodney Arthur Kendall
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Adjustment of particle beam landing angle
- Patent number 6,028,662
- Issue date Feb 22, 2000
- International Business Machines Corporation
- Maris A. Sturans
- G01 - MEASURING TESTING
Information Patent Grant
Distributed direct write lithography system using multiple variable...
- Patent number 5,981,962
- Issue date Nov 9, 1999
- International Business Machines Corporation
- Timothy R. Groves
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple variable shaped electron beam system with lithographic str...
- Patent number 5,962,859
- Issue date Oct 5, 1999
- International Business Machines Corporation
- Timothy R. Groves
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Heater for membrane mask in an electron-beam lithography system
- Patent number 5,742,065
- Issue date Apr 21, 1998
- International Business Machines Corporation
- Michael Stuart Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam nano-metrology system
- Patent number 5,585,629
- Issue date Dec 17, 1996
- International Business Machines Corporation
- Samuel K. Doran
- G01 - MEASURING TESTING
Information Patent Grant
Membrane electrostatic chuck
- Patent number 5,532,903
- Issue date Jul 2, 1996
- International Business Machines Corporation
- Rodney A. Kendall
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography tool with vibration isolation
- Patent number 5,508,518
- Issue date Apr 16, 1996
- International Business Machines Corporation
- Rodney A. Kendall
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spinning reticle scanning projection lithography exposure system an...
- Patent number 5,434,424
- Issue date Jul 18, 1995
- International Business Machines Corporation
- Werner Stickel
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Servo guided stage system
- Patent number 5,140,242
- Issue date Aug 18, 1992
- International Business Machines Corporation
- Samuel K. Doran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-dimensional positioning apparatus
- Patent number 5,059,090
- Issue date Oct 22, 1991
- International Business Machines Corp.
- Norman Bobroff
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ball joint with dynamic preload adjustment
- Patent number 5,052,844
- Issue date Oct 1, 1991
- International Business Machines Corporation
- Rodney A. Kendall
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...

Patents Applicationslast 30 patents

Information Patent Application
INDIVIDUAL BEAM DETECTOR FOR MULTIPLE BEAMS, MULTI-BEAM IRRADIATION...
- Publication number 20190139739
- Publication date May 9, 2019
- NuFlare Technology, Inc.
- Yoshikuni GOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REMOTE CLAMPING MECHANISM VIA VACUUM FEEDTHROUGH
- Publication number 20040265052
- Publication date Dec 30, 2004
- Rodney A. Kendall
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron scatter in a thin membrane to eliminate detector saturation
- Publication number 20030089853
- Publication date May 15, 2003
- International Business Machines Corporation
- Rodney A. Kendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High performance source for electron beam projection lithography
- Publication number 20030085364
- Publication date May 8, 2003
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE NUMERICAL APERTURE ELECTRON BEAM PROJECTION LITHOGRAPHY SY...
- Publication number 20020074506
- Publication date Jun 20, 2002
- MICHAEL S. GORDON
- B82 - NANO-TECHNOLOGY
Information Patent Application
TARGET LOCKING SYSTEM FOR ELECTRON BEAM LITHOGRAPHY
- Publication number 20020056813
- Publication date May 16, 2002
- JOHN GEORGE HARTLEY
- B82 - NANO-TECHNOLOGY

Rodney A. Kendall

Person

Patents Grantslast 30 patents

Individual beam detector for multiple beams, multi-beam irradiation...

Electron gun assembly

Remote clamping mechanism via vacuum feedthrough

Electron beam position reference system

Electron beam lithography apparatus with self actuated vacuum bypas...

Electron scatter in a thin membrane to eliminate detector saturation

High performance source for electron beam projection lithography

Fabrication method of high precision, thermally stable electromagne...

Symmetric blanking for high stability in electron beam exposure sys...

Target locking system for electron beam lithography

Multiple numerical aperture electron beam projection lithography sy...

Calibration target for electron beams

Pinhole detector for electron intensity distribution

Removable bombardment filament-module for electron beam projection...

Non-contact autofocus height detector for lithography systems

Method for writing a pattern using multiple variable shaped electro...

Toroidal charged particle deflector with high mechanical stability...

High emittance electron source having high illumination uniformity

Cooling method and apparatus for charged particle lenses and deflec...

Adjustment of particle beam landing angle

Distributed direct write lithography system using multiple variable...

Multiple variable shaped electron beam system with lithographic str...

Heater for membrane mask in an electron-beam lithography system

Electron beam nano-metrology system

Membrane electrostatic chuck

Lithography tool with vibration isolation

Spinning reticle scanning projection lithography exposure system an...

Servo guided stage system

Two-dimensional positioning apparatus

Ball joint with dynamic preload adjustment

Patents Applicationslast 30 patents

INDIVIDUAL BEAM DETECTOR FOR MULTIPLE BEAMS, MULTI-BEAM IRRADIATION...

REMOTE CLAMPING MECHANISM VIA VACUUM FEEDTHROUGH

Electron scatter in a thin membrane to eliminate detector saturation

High performance source for electron beam projection lithography

MULTIPLE NUMERICAL APERTURE ELECTRON BEAM PROJECTION LITHOGRAPHY SY...

TARGET LOCKING SYSTEM FOR ELECTRON BEAM LITHOGRAPHY