Roel Gronheid

Person

Huldenberg, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Combined anneal and selective deposition process
- Patent number 10,741,394
- Issue date Aug 11, 2020
- ASM IP Holding B.V.
- Jan Willem Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a mask
- Patent number 10,720,336
- Issue date Jul 21, 2020
- Imec VZW
- Emily Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a directed self-assembled layer on a substrate
- Patent number 10,551,741
- Issue date Feb 4, 2020
- ASM IP Holding B.V.
- Werner Knaepen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined anneal and selective deposition process
- Patent number 10,204,782
- Issue date Feb 12, 2019
- Imec VZW
- Jan Willem Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing fin structures of a semiconductor device in a...
- Patent number 10,192,956
- Issue date Jan 29, 2019
- Imec VZW
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective fin cut
- Patent number 10,186,459
- Issue date Jan 22, 2019
- Imec VZW
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quality assessment of directed self-assembling method
- Patent number 10,048,212
- Issue date Aug 14, 2018
- Imec VZW
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing fin structures of a semiconductor device in a...
- Patent number 9,391,141
- Issue date Jul 12, 2016
- Imec VZW
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of process optimization for dual tone development
- Patent number 8,257,911
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A DIRECTED SELF-ASSEMBLED LAYER ON A SUBSTRATE
- Publication number 20190155159
- Publication date May 23, 2019
- ASM IP HOLDING B.V.
- Werner Knaepen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMBINED ANNEAL AND SELECTIVE DEPOSITION PROCESS
- Publication number 20190157086
- Publication date May 23, 2019
- ASM IP HOLDING B.V.
- Jan Willem MAES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Manufacturing a Mask
- Publication number 20190074186
- Publication date Mar 7, 2019
- IMEC vzw
- Emily Gallagher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Mask Layer
- Publication number 20180173109
- Publication date Jun 21, 2018
- IMEC vzw
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selective Fin Cut
- Publication number 20180076092
- Publication date Mar 15, 2018
- IMEC vzw
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Pillar or Hole Structures in a Layer of a...
- Publication number 20170330760
- Publication date Nov 16, 2017
- IMEC vzw
- Arjun SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMBINED ANNEAL AND SELECTIVE DEPOSITION PROCESS
- Publication number 20170301542
- Publication date Oct 19, 2017
- ASM IP HOLDING B.V.
- Jan Willem MAES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Producing Fin Structures of a Semiconductor Device in a...
- Publication number 20160322461
- Publication date Nov 3, 2016
- IMEC vzw
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Quality Assessment of Directed Self-Assembling Method
- Publication number 20150276624
- Publication date Oct 1, 2015
- Katholieke Universiteit Leuven, K.U.Leuven R&D
- Roel Gronheid
- G01 - MEASURING TESTING
Information Patent Application
Method for Producing Fin Structures of a Semiconductor Device in a...
- Publication number 20150243509
- Publication date Aug 27, 2015
- IMEC vzw
- Boon Teik Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT
- Publication number 20100055624
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT
- Publication number 20100055625
- Publication date Mar 4, 2010
- TOKYO ELECTRON LIMITED
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Roel Gronheid

Person

Patents Grantslast 30 patents

Combined anneal and selective deposition process

Method for manufacturing a mask

Method of forming a directed self-assembled layer on a substrate

Combined anneal and selective deposition process

Method for producing fin structures of a semiconductor device in a...

Selective fin cut

Quality assessment of directed self-assembling method

Method for producing fin structures of a semiconductor device in a...

Method of process optimization for dual tone development

Patents Applicationslast 30 patents

METHOD OF FORMING A DIRECTED SELF-ASSEMBLED LAYER ON A SUBSTRATE

COMBINED ANNEAL AND SELECTIVE DEPOSITION PROCESS

Method for Manufacturing a Mask

Lithographic Mask Layer

Selective Fin Cut

Method for Manufacturing Pillar or Hole Structures in a Layer of a...

COMBINED ANNEAL AND SELECTIVE DEPOSITION PROCESS

Method for Producing Fin Structures of a Semiconductor Device in a...

Quality Assessment of Directed Self-Assembling Method

Method for Producing Fin Structures of a Semiconductor Device in a...

METHOD OF PATTERNING A SUBSTRATE USING DUAL TONE DEVELOPMENT

METHOD OF PROCESS OPTIMIZATION FOR DUAL TONE DEVELOPMENT