Roger Leung

Person

Morristown, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Antireflective coatings for via fill and photolithography applicati...
- Patent number 8,992,806
- Issue date Mar 31, 2015
- Honeywell International Inc.
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Dopant ink compositions for forming doped regions in semiconductor...
- Patent number 8,975,170
- Issue date Mar 10, 2015
- Honeywell International Inc.
- Ligui Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Boron-comprising inks for forming boron-doped regions in semiconduc...
- Patent number 8,518,170
- Issue date Aug 27, 2013
- Honeywell International Inc.
- Roger Yu-Kwan Leung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for making toughening agent materials
- Patent number 8,475,666
- Issue date Jul 2, 2013
- Honeywell International Inc.
- Teresa A. Ramos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antireflective coatings for via fill and photolithography applicati...
- Patent number 8,053,159
- Issue date Nov 8, 2011
- Honeywell International Inc.
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Treating agent materials
- Patent number 7,915,159
- Issue date Mar 29, 2011
- Honeywell International Inc.
- Anil S. Bhanap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repairing damage to low-k dielectric materials using silylating agents
- Patent number 7,709,371
- Issue date May 4, 2010
- Honeywell International Inc.
- Anil S. Bhanap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porogens for porous silica dielectric for integral circuit applicat...
- Patent number 7,381,442
- Issue date Jun 3, 2008
- Honeywell International Inc.
- Victor Y. Lu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low metal porous silica dielectric for integral circuit applications
- Patent number 7,381,441
- Issue date Jun 3, 2008
- Honeywell International Inc.
- Roger Y. Leung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low dielectric constant materials and methods of preparation thereof
- Patent number 7,307,137
- Issue date Dec 11, 2007
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hybrid inorganic/organic low k dielectric films with improved mecha...
- Patent number 7,148,263
- Issue date Dec 12, 2006
- Honeywell International Inc.
- Bo Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organosiloxanes
- Patent number 7,011,889
- Issue date Mar 14, 2006
- Honeywell International Inc.
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Colloidal silica composite films for premetal dielectric applications
- Patent number 6,967,172
- Issue date Nov 22, 2005
- Honeywell International Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organosiloxanes
- Patent number 6,962,727
- Issue date Nov 8, 2005
- Honeywell International Inc.
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low dielectric materials and methods of producing same
- Patent number 6,890,641
- Issue date May 10, 2005
- Honeywell International Inc.
- Shyama Mukherjee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low dielectric constant organic dielectrics based on cage-like stru...
- Patent number 6,849,696
- Issue date Feb 1, 2005
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low dielectric constant organic dielectrics based on cage-like stru...
- Patent number 6,797,777
- Issue date Sep 28, 2004
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dielectric films for narrow gap-fill applications
- Patent number 6,653,718
- Issue date Nov 25, 2003
- Honeywell International, Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric materials and methods of producing same
- Patent number 6,627,669
- Issue date Sep 30, 2003
- Honeywell International Inc.
- Shyama Mukherjee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low dielectric constant organic dielectrics based on cage-like stru...
- Patent number 6,509,415
- Issue date Jan 21, 2003
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dielectric films for narrow gap-fill applications
- Patent number 6,444,495
- Issue date Sep 3, 2002
- Honeywell International, Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric materials and methods of producing same
- Patent number 6,444,715
- Issue date Sep 3, 2002
- Honeywell International Inc.
- Shyama Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric foam dielectric formed from polymer decomposition
- Patent number 6,413,882
- Issue date Jul 2, 2002
- AlliedSignal Inc.
- Roger Yu-Kwan Leung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymers having backbones with reactive groups employed in crosslin...
- Patent number 6,313,185
- Issue date Nov 6, 2001
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Nanoporous material fabricated using a dissolvable reagent
- Patent number 6,214,746
- Issue date Apr 10, 2001
- Honeywell International Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric constant porous films
- Patent number 6,204,202
- Issue date Mar 20, 2001
- AlliedSignal, Inc.
- Roger Yu-Kwan Leung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Infiltrated nanoporous materials and methods of producing same
- Patent number 6,171,687
- Issue date Jan 9, 2001
- Honeywell International Inc.
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanoporous polymers crosslinked via cyclic structures
- Patent number 6,172,128
- Issue date Jan 9, 2001
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Stable inorganic polymers
- Patent number 6,015,457
- Issue date Jan 18, 2000
- AlliedSignal Inc.
- Roger Y. Leung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon carboxide fibers from gel spinning cyclosiloxane polymer pr...
- Patent number 5,629,249
- Issue date May 13, 1997
- AlliedSignal Inc.
- Roger Y. Leung
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
LIQUID TITANIUM OXIDE COMPOSITIONS, METHODS FOR FORMING THE SAME, A...
- Publication number 20160148814
- Publication date May 26, 2016
- HONEYWELL INTERNATIONAL INC.
- Helen X. Xu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DOPANT INK COMPOSITIONS FOR FORMING DOPED REGIONS IN SEMICONDUCTOR...
- Publication number 20150126653
- Publication date May 7, 2015
- Honeywell International Inc.
- Ligui Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BORON-COMPRISING INKS FOR FORMING BORON-DOPED REGIONS IN SEMICONDUC...
- Publication number 20130240794
- Publication date Sep 19, 2013
- Honeywell International Inc.
- Roger Yu-Kwan Leung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DOPANT INK COMPOSITIONS FOR FORMING DOPED REGIONS IN SEMICONDUCTOR...
- Publication number 20130098266
- Publication date Apr 25, 2013
- Honeywell International Inc.
- Ligui Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coatings for Via Fill and Photolithography Applicati...
- Publication number 20120001135
- Publication date Jan 5, 2012
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS OF MAKING LOW-REFRACTIVE INDEX AND/OR LOW-K ORGANOSILICATE...
- Publication number 20090026924
- Publication date Jan 29, 2009
- Roger Y. Leung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
THERMAL INTERCONNECT AND INTERFACE MATERIALS, METHODS OF PRODUCTION...
- Publication number 20080291634
- Publication date Nov 27, 2008
- Martin W. Weiser
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Thick crack-free silica film by colloidal silica incorporation
- Publication number 20070099005
- Publication date May 3, 2007
- Honeywell International Inc.
- Roger Y. Leung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for making toughening agent materials
- Publication number 20060057855
- Publication date Mar 16, 2006
- Teresa A. Ramos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treating agent materials
- Publication number 20060057837
- Publication date Mar 16, 2006
- Anil S. Bhanap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid inorganic/organic low k dielectric films with improved mecha...
- Publication number 20060014842
- Publication date Jan 19, 2006
- Bo Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Interlayer adhesion promoter for low k materials
- Publication number 20050173803
- Publication date Aug 11, 2005
- Victor Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antireflective coatings for via fill and photolithography applicati...
- Publication number 20050171277
- Publication date Aug 4, 2005
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Porous silica dielectric having improved etch selectivity towards i...
- Publication number 20050136687
- Publication date Jun 23, 2005
- Honeywell International Inc.
- Victor Y. Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Porogens for porous silica dielectric for integral circuit applicat...
- Publication number 20050123735
- Publication date Jun 9, 2005
- Victor Y. Lu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low metal porous silica dielectric for integral circuit applications
- Publication number 20050106376
- Publication date May 19, 2005
- Roger Y. Leung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Repairing damage to low-k dielectric materials using silylating agents
- Publication number 20050095840
- Publication date May 5, 2005
- Anil S. Bhanap
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric films for narrow gap-fill applications
- Publication number 20040228967
- Publication date Nov 18, 2004
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low dielectric materials and methods of producing same
- Publication number 20040176488
- Publication date Sep 9, 2004
- Shyama Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low dielectric constant materials and methods of preparation thereof
- Publication number 20040158024
- Publication date Aug 12, 2004
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low dielectric constant organic dielectrics based on cage-like stru...
- Publication number 20030187139
- Publication date Oct 2, 2003
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Organosiloxanes
- Publication number 20030105264
- Publication date Jun 5, 2003
- William B. Bedwell
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dielectric films for narrow gap-fill applications
- Publication number 20030087485
- Publication date May 8, 2003
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Organosiloxanes
- Publication number 20030031789
- Publication date Feb 13, 2003
- William B. Bedwell
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low dielectric materials and methods of producing same
- Publication number 20020169225
- Publication date Nov 14, 2002
- Shyama Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS
- Publication number 20020137260
- Publication date Sep 26, 2002
- Roger Leung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low dielectric constant organic dielectrics based on cage-like stru...
- Publication number 20020016414
- Publication date Feb 7, 2002
- Honeywell International Inc.
- Kreisler Lau
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Roger Leung

Person

Patents Grantslast 30 patents

Antireflective coatings for via fill and photolithography applicati...

Dopant ink compositions for forming doped regions in semiconductor...

Boron-comprising inks for forming boron-doped regions in semiconduc...

Method for making toughening agent materials

Antireflective coatings for via fill and photolithography applicati...

Treating agent materials

Repairing damage to low-k dielectric materials using silylating agents

Porogens for porous silica dielectric for integral circuit applicat...

Low metal porous silica dielectric for integral circuit applications

Low dielectric constant materials and methods of preparation thereof

Hybrid inorganic/organic low k dielectric films with improved mecha...

Organosiloxanes

Colloidal silica composite films for premetal dielectric applications

Organosiloxanes

Low dielectric materials and methods of producing same

Low dielectric constant organic dielectrics based on cage-like stru...

Low dielectric constant organic dielectrics based on cage-like stru...

Dielectric films for narrow gap-fill applications

Low dielectric materials and methods of producing same

Low dielectric constant organic dielectrics based on cage-like stru...

Dielectric films for narrow gap-fill applications

Low dielectric materials and methods of producing same

Low dielectric foam dielectric formed from polymer decomposition

Polymers having backbones with reactive groups employed in crosslin...

Nanoporous material fabricated using a dissolvable reagent

Low dielectric constant porous films

Infiltrated nanoporous materials and methods of producing same

Nanoporous polymers crosslinked via cyclic structures

Stable inorganic polymers

Silicon carboxide fibers from gel spinning cyclosiloxane polymer pr...

Patents Applicationslast 30 patents

LIQUID TITANIUM OXIDE COMPOSITIONS, METHODS FOR FORMING THE SAME, A...

DOPANT INK COMPOSITIONS FOR FORMING DOPED REGIONS IN SEMICONDUCTOR...

BORON-COMPRISING INKS FOR FORMING BORON-DOPED REGIONS IN SEMICONDUC...

DOPANT INK COMPOSITIONS FOR FORMING DOPED REGIONS IN SEMICONDUCTOR...

Antireflective Coatings for Via Fill and Photolithography Applicati...

METHODS OF MAKING LOW-REFRACTIVE INDEX AND/OR LOW-K ORGANOSILICATE...

THERMAL INTERCONNECT AND INTERFACE MATERIALS, METHODS OF PRODUCTION...

Thick crack-free silica film by colloidal silica incorporation

Method for making toughening agent materials

Treating agent materials

Hybrid inorganic/organic low k dielectric films with improved mecha...

Interlayer adhesion promoter for low k materials

Antireflective coatings for via fill and photolithography applicati...

Porous silica dielectric having improved etch selectivity towards i...

Porogens for porous silica dielectric for integral circuit applicat...

Low metal porous silica dielectric for integral circuit applications

Repairing damage to low-k dielectric materials using silylating agents

Dielectric films for narrow gap-fill applications

Low dielectric materials and methods of producing same

Low dielectric constant materials and methods of preparation thereof

Low dielectric constant organic dielectrics based on cage-like stru...

Organosiloxanes

Dielectric films for narrow gap-fill applications

Organosiloxanes

Low dielectric materials and methods of producing same

DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS

Low dielectric constant organic dielectrics based on cage-like stru...