Rongping WANG

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for actively tuning a plasma power source
- Patent number 11,398,369
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for monitoring input power for process control...
- Patent number 11,355,325
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Ramesh Gopalan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ignition circuit
- Patent number 11,328,900
- Issue date May 10, 2022
- Applied Materials, Inc.
- Teryl Pratt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,757,797
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Rongping Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arcing detection apparatus for plasma processing
- Patent number 10,580,626
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source RF power split inner coil to improve BCD and etch depth perf...
- Patent number 10,211,030
- Issue date Feb 19, 2019
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,187,966
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cooling a composition using a hall effect enhanced capaci...
- Patent number 10,176,973
- Issue date Jan 8, 2019
- Applied Materials, Inc.
- Michael S. Cox
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for treating a gas in a conduit
- Patent number 9,767,990
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Jibing Zeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring and controlling wafer potential in pulsed RF bias processing
- Patent number 9,659,757
- Issue date May 23, 2017
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement system having a plasma source
- Patent number 9,552,967
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma source for abating compounds produced i...
- Patent number 9,543,124
- Issue date Jan 10, 2017
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating a gas in a conduit
- Patent number 9,378,928
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Jibing Zeng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Hall effect enhanced capacitively coupled plasma source, an abateme...
- Patent number 9,240,308
- Issue date Jan 19, 2016
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hall effect enhanced capacitively coupled plasma source
- Patent number 9,230,780
- Issue date Jan 5, 2016
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase tensile stress of silicon nitride films using a...
- Patent number 8,753,989
- Issue date Jun 17, 2014
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for fabricating silicon heterojunction solar c...
- Patent number 8,728,918
- Issue date May 20, 2014
- Applied Materials, Inc.
- Shuran Sheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring and controlling wafer potential in pulsed RF bias processing
- Patent number 8,303,763
- Issue date Nov 6, 2012
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of and apparatus for measuring and controlling wafer potent...
- Patent number 8,192,576
- Issue date Jun 5, 2012
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase tensile stress of silicon nitride films using a...
- Patent number 8,129,290
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-frequency bias power in HDP-CVD processes
- Patent number 7,571,698
- Issue date Aug 11, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Heated Pedestal With Impedance Matching Radio Frequency (RF) Rod
- Publication number 20240186123
- Publication date Jun 6, 2024
- Yao-Hung YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PROCESSING A SUBSTRATE
- Publication number 20210375701
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Ramesh GOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR MONITORING INPUT POWER FOR PROCESS CONTROL...
- Publication number 20210375601
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Ramesh GOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR ACTIVELY TUNING A PLASMA POWER SOURCE
- Publication number 20200411288
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IGNITION CIRCUIT
- Publication number 20200294769
- Publication date Sep 17, 2020
- Applied Materials, Inc.
- Teryl PRATT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR GAS ABATEMENT
- Publication number 20190246481
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Rongping WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERF...
- Publication number 20170200585
- Publication date Jul 13, 2017
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARCING DETECTION APPARATUS FOR PLASMA PROCESSING
- Publication number 20170162370
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- Lin ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20170133208
- Publication date May 11, 2017
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRODUCTIVITY PECVD TOOL FOR WAFER PROCESSING OF SEMICONDUCTOR...
- Publication number 20170114462
- Publication date Apr 27, 2017
- Applied Materials, Inc.
- Lin ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR GAS ABATEMENT
- Publication number 20170027049
- Publication date Jan 26, 2017
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING A GAS IN A CONDUIT
- Publication number 20160300692
- Publication date Oct 13, 2016
- Applied Materials, Inc.
- JIBING ZENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20160133442
- Publication date May 12, 2016
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE
- Publication number 20160118226
- Publication date Apr 28, 2016
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-CHAMBER ABATEMENT USING UPSTREAM PLASMA SOURCES
- Publication number 20160042916
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Rongping WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR TREATING A GAS IN A CONDUIT
- Publication number 20150348754
- Publication date Dec 3, 2015
- Applied Materials, Inc.
- JIBING ZENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE
- Publication number 20150255251
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...
- Publication number 20150255256
- Publication date Sep 10, 2015
- Applied Materials, Inc.
- Michael S. COX
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FABRICATING SILICON HETEROJUNCTION SOLAR C...
- Publication number 20130102133
- Publication date Apr 25, 2013
- Applied Materials, Inc.
- Shuran Sheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING
- Publication number 20130050892
- Publication date Feb 28, 2013
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING
- Publication number 20120206127
- Publication date Aug 16, 2012
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE TENSILE STRESS OF SILICON NITRIDE FILMS USING A...
- Publication number 20120196452
- Publication date Aug 2, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of and apparatus for measuring and controlling wafer potent...
- Publication number 20100315064
- Publication date Dec 16, 2010
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULATION OF RF RETURNING STRAPS FOR UNIFORMITY CONTROL
- Publication number 20100136261
- Publication date Jun 3, 2010
- Applied Materials, Inc.
- Alan Tso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES
- Publication number 20090263594
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to increase tensile stress of silicon nitride films using a...
- Publication number 20060269693
- Publication date Nov 30, 2006
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low-frequency bias power in HDP-CVD processes
- Publication number 20060150913
- Publication date Jul 13, 2006
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tensile and compressive stressed materials for semiconductors
- Publication number 20060105106
- Publication date May 18, 2006
- APPLIED MATERIALS, INC.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Rongping WANG

Person

Patents Grantslast 30 patents

Method and apparatus for actively tuning a plasma power source

Methods and systems for monitoring input power for process control...

Plasma ignition circuit

Method and apparatus for gas abatement

Arcing detection apparatus for plasma processing

Source RF power split inner coil to improve BCD and etch depth perf...

Method and apparatus for gas abatement

Method of cooling a composition using a hall effect enhanced capaci...

Apparatus for treating a gas in a conduit

Measuring and controlling wafer potential in pulsed RF bias processing

Abatement system having a plasma source

Capacitively coupled plasma source for abating compounds produced i...

Apparatus for treating a gas in a conduit

Hall effect enhanced capacitively coupled plasma source, an abateme...

Hall effect enhanced capacitively coupled plasma source

Method to increase tensile stress of silicon nitride films using a...

Method and apparatus for fabricating silicon heterojunction solar c...

Measuring and controlling wafer potential in pulsed RF bias processing

Methods of and apparatus for measuring and controlling wafer potent...

Method to increase tensile stress of silicon nitride films using a...

Low-frequency bias power in HDP-CVD processes

Patents Applicationslast 30 patents

Heated Pedestal With Impedance Matching Radio Frequency (RF) Rod

METHODS AND SYSTEMS FOR PROCESSING A SUBSTRATE

METHODS AND SYSTEMS FOR MONITORING INPUT POWER FOR PROCESS CONTROL...

METHOD AND APPARATUS FOR ACTIVELY TUNING A PLASMA POWER SOURCE

PLASMA IGNITION CIRCUIT

METHOD AND APPARATUS FOR GAS ABATEMENT

SOURCE RF POWER SPLIT INNER COIL TO IMPROVE BCD AND ETCH DEPTH PERF...

ARCING DETECTION APPARATUS FOR PLASMA PROCESSING

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

HIGH PRODUCTIVITY PECVD TOOL FOR WAFER PROCESSING OF SEMICONDUCTOR...

METHOD AND APPARATUS FOR GAS ABATEMENT

APPARATUS FOR TREATING A GAS IN A CONDUIT

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE

POST-CHAMBER ABATEMENT USING UPSTREAM PLASMA SOURCES

APPARATUS FOR TREATING A GAS IN A CONDUIT

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE

HALL EFFECT ENHANCED CAPACITIVELY COUPLED PLASMA SOURCE, AN ABATEME...

METHOD AND APPARATUS FOR FABRICATING SILICON HETEROJUNCTION SOLAR C...

MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING

MEASURING AND CONTROLLING WAFER POTENTIAL IN PULSED RF BIAS PROCESSING

METHOD TO INCREASE TENSILE STRESS OF SILICON NITRIDE FILMS USING A...

Methods of and apparatus for measuring and controlling wafer potent...

MODULATION OF RF RETURNING STRAPS FOR UNIFORMITY CONTROL

LOW-FREQUENCY BIAS POWER IN HDP-CVD PROCESSES

Method to increase tensile stress of silicon nitride films using a...

Low-frequency bias power in HDP-CVD processes

Tensile and compressive stressed materials for semiconductors