Ryan Chia-Jen Chen

Person

Chiaya, TW

People

Patents Grantslast 30 patents

Information Patent Grant
High-k metal gate CMOS patterning method
- Patent number 8,349,680
- Issue date Jan 8, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kong-Beng Thei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to integrate gate etching as all-in-one process for high K m...
- Patent number 8,304,349
- Issue date Nov 6, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jr Jung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning methodology for uniformity control
- Patent number 8,273,632
- Issue date Sep 25, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sealing layer of a field effect transistor
- Patent number 8,258,588
- Issue date Sep 4, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device with aluminum surface protection
- Patent number 8,237,231
- Issue date Aug 7, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo Bin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an isolation structure
- Patent number 8,163,625
- Issue date Apr 24, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a layer of a semiconductor device using an etchan...
- Patent number 8,153,523
- Issue date Apr 10, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low K dielectric surface damage control
- Patent number 8,148,270
- Issue date Apr 3, 2012
- Taiwan Semiconductor Manufactuiring Co., Ltd.
- Hun-Jan Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating high-k metal gate devices
- Patent number 8,148,249
- Issue date Apr 3, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature anneal for aluminum surface protection
- Patent number 8,119,473
- Issue date Feb 21, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo Bin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning methodology for uniformity control
- Patent number 8,053,323
- Issue date Nov 8, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating gate structures
- Patent number 8,030,214
- Issue date Oct 4, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pochi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrating high-K/metal gate in CMOS process flow
- Patent number 8,003,507
- Issue date Aug 23, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of defining gate structure height for semiconductor devices
- Patent number 7,833,853
- Issue date Nov 16, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-K dielectric metal gate device structure
- Patent number 7,829,949
- Issue date Nov 9, 2010
- Taiwan Semconductor Manufacturing Co., Ltd
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution for polymer and capping layer removing with wet dipping in...
- Patent number 7,776,755
- Issue date Aug 17, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jr Jung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing a critical dimension of a semiconductor device
- Patent number 7,759,239
- Issue date Jul 20, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low K dielectric surface damage control
- Patent number 7,709,392
- Issue date May 4, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hun-Jan Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for semiconductor device performance enhancement
- Patent number 7,632,729
- Issue date Dec 15, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k dielectric metal gate device structure and method for formin...
- Patent number 7,625,791
- Issue date Dec 1, 2009
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating dual-gate semiconductor device
- Patent number 7,510,940
- Issue date Mar 31, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Nan Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching process to avoid polysilicon notching
- Patent number 7,109,085
- Issue date Sep 19, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming offset spacer manufacturing for critical dimensio...
- Patent number 6,900,104
- Issue date May 31, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF FABRICATING HIGH-K METAL GATE DEVICES
- Publication number 20120164822
- Publication date Jun 28, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning Methodology for Uniformity Control
- Publication number 20120108046
- Publication date May 3, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE WITH ALUMINUM SURFACE PROTECTION
- Publication number 20120086075
- Publication date Apr 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo Bin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated High-K/Metal Gate in CMOS Process Flow
- Publication number 20110275212
- Publication date Nov 10, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING GATE STRUCTURES
- Publication number 20110207315
- Publication date Aug 25, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pochi WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER STRUCTURE OF A FIELD EFFECT TRANSISTOR
- Publication number 20110198675
- Publication date Aug 18, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jin-Aun NG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Temperature Anneal for Aluminum Surface Protection
- Publication number 20110156166
- Publication date Jun 30, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo Bin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING INTEGRATED CIRCUITS
- Publication number 20110086504
- Publication date Apr 14, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo Bin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING LAYER OF A FIELD EFFECT TRANSISTOR
- Publication number 20110031562
- Publication date Feb 10, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING AN ISOLATION STRUCTURE
- Publication number 20100255654
- Publication date Oct 7, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW K DIELECTRIC SURFACE DAMAGE CONTROL
- Publication number 20100173499
- Publication date Jul 8, 2010
- Taiwan Semiconductor Manufacturing Co., LTD
- Hun-Jan Tao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PRE-HEAT AND STABILIZE ETCHING CHAMBER CONDITION AND IMPR...
- Publication number 20100071719
- Publication date Mar 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEFINING GATE STRUCTURE HEIGHT FOR SEMICONDUCTOR DEVICES
- Publication number 20100068861
- Publication date Mar 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING A LAYER OF A SEMICONDUCTOR DEVICE USING AN ETCHAN...
- Publication number 20100068884
- Publication date Mar 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING HIGH-K METAL GATE DEVICES
- Publication number 20100068876
- Publication date Mar 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL SOLUTION FOR POLYMER AND CAPPING LAYER REMOVING WITH WET DIPP...
- Publication number 20100062590
- Publication date Mar 11, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jr Jung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N2 BASED PLASMA TREATMENT AND ASH FOR HK METAL GATE PROTECTION
- Publication number 20100062591
- Publication date Mar 11, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu Chao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-K dielectric metal gate device structure
- Publication number 20100044800
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE
- Publication number 20100048011
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Matt Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL HIGH-K METAL GATE CMOS PATTERNING METHOD
- Publication number 20100048013
- Publication date Feb 25, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kong-Beng Thei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...
- Publication number 20100038721
- Publication date Feb 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yih-Ann Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL METHOD TO INTEGRATE GATE ETCHING AS ALL-IN-ONE PROCESS FOR HI...
- Publication number 20100041236
- Publication date Feb 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jr Jung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INTEGRATING HIGH-K/METAL GATE IN CMOS PROCESS FLOW
- Publication number 20100041223
- Publication date Feb 18, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ryan Chia-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC METAL GATE DEVICE STRUCTURE AND METHOD FOR FORMIN...
- Publication number 20090108365
- Publication date Apr 30, 2009
- Taiwan Semiconductor Manufacturing Co., LTD
- Joshua Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating dual-gate semiconductor device
- Publication number 20080197420
- Publication date Aug 21, 2008
- Chen-Nan Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for semiconductor device performance enhancement
- Publication number 20080076215
- Publication date Mar 27, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Harry Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterned microelectronic mask layer formation method employing mul...
- Publication number 20050136335
- Publication date Jun 23, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ryan Chia-Jen Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryan Chia-Jen Chen

Person

Patents Grantslast 30 patents

High-k metal gate CMOS patterning method

Method to integrate gate etching as all-in-one process for high K m...

Patterning methodology for uniformity control

Sealing layer of a field effect transistor

Device with aluminum surface protection

Method for fabricating an isolation structure

Method of etching a layer of a semiconductor device using an etchan...

Low K dielectric surface damage control

Methods of fabricating high-k metal gate devices

High temperature anneal for aluminum surface protection

Patterning methodology for uniformity control

Method of fabricating gate structures

Method of integrating high-K/metal gate in CMOS process flow

Method of defining gate structure height for semiconductor devices

High-K dielectric metal gate device structure

Solution for polymer and capping layer removing with wet dipping in...

Method of reducing a critical dimension of a semiconductor device

Low K dielectric surface damage control

Method for semiconductor device performance enhancement

High-k dielectric metal gate device structure and method for formin...

Method for fabricating dual-gate semiconductor device

Etching process to avoid polysilicon notching

Method of forming offset spacer manufacturing for critical dimensio...

Patents Applicationslast 30 patents

METHODS OF FABRICATING HIGH-K METAL GATE DEVICES

Patterning Methodology for Uniformity Control

DEVICE WITH ALUMINUM SURFACE PROTECTION

Integrated High-K/Metal Gate in CMOS Process Flow

METHOD OF FABRICATING GATE STRUCTURES

SPACER STRUCTURE OF A FIELD EFFECT TRANSISTOR

High Temperature Anneal for Aluminum Surface Protection

METHODS FOR FORMING INTEGRATED CIRCUITS

SEALING LAYER OF A FIELD EFFECT TRANSISTOR

METHOD FOR FABRICATING AN ISOLATION STRUCTURE

LOW K DIELECTRIC SURFACE DAMAGE CONTROL

METHOD TO PRE-HEAT AND STABILIZE ETCHING CHAMBER CONDITION AND IMPR...

METHOD OF DEFINING GATE STRUCTURE HEIGHT FOR SEMICONDUCTOR DEVICES

METHOD OF ETCHING A LAYER OF A SEMICONDUCTOR DEVICE USING AN ETCHAN...

METHODS OF FABRICATING HIGH-K METAL GATE DEVICES

NOVEL SOLUTION FOR POLYMER AND CAPPING LAYER REMOVING WITH WET DIPP...

N2 BASED PLASMA TREATMENT AND ASH FOR HK METAL GATE PROTECTION

High-K dielectric metal gate device structure

METHOD OF PATTERNING A METAL GATE OF SEMICONDUCTOR DEVICE

NOVEL HIGH-K METAL GATE CMOS PATTERNING METHOD

METHOD OF FORMING A SINGLE METAL THAT PERFORMS N WORK FUNCTION AND...

NOVEL METHOD TO INTEGRATE GATE ETCHING AS ALL-IN-ONE PROCESS FOR HI...

METHOD OF INTEGRATING HIGH-K/METAL GATE IN CMOS PROCESS FLOW

HIGH-K DIELECTRIC METAL GATE DEVICE STRUCTURE AND METHOD FOR FORMIN...

Method for fabricating dual-gate semiconductor device

Method for semiconductor device performance enhancement

Patterned microelectronic mask layer formation method employing mul...