Ryan O. Jung

Person

Glenmont, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gate cut with high selectivity to preserve interlevel dielectric layer
- Patent number 10,957,544
- Issue date Mar 23, 2021
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling high aspect ratio sacrificial gates
- Patent number 10,629,698
- Issue date Apr 21, 2020
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut with high selectivity to preserve interlevel dielectric layer
- Patent number 10,586,706
- Issue date Mar 10, 2020
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling controlled spacer RIE
- Patent number 10,446,452
- Issue date Oct 15, 2019
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling high aspect ratio sacrificial gates
- Patent number 9,842,739
- Issue date Dec 12, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut with high selectivity to preserve interlevel dielectric layer
- Patent number 9,837,276
- Issue date Dec 5, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form dual channel semiconductor material fins
- Patent number 9,786,666
- Issue date Oct 10, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling high aspect ratio sacrificial gates
- Patent number 9,659,779
- Issue date May 23, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate cut with high selectivity to preserve interlevel dielectric layer
- Patent number 9,659,786
- Issue date May 23, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling controlled spacer RIE
- Patent number 9,627,277
- Issue date Apr 18, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench formation for dielectric filled cut region
- Patent number 9,601,335
- Issue date Mar 21, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench formation for dielectric filled cut region
- Patent number 9,601,366
- Issue date Mar 21, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Junction overlap control in a semiconductor device using a sacrific...
- Patent number 9,530,864
- Issue date Dec 27, 2016
- GLOBALFOUNDRIES Inc.
- Steven J. Bentley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning features having differing widths
- Patent number 9,466,505
- Issue date Oct 11, 2016
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form dual channel semiconductor material fins
- Patent number 9,362,179
- Issue date Jun 7, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for enabling high aspect ratio sacrificial gates
- Patent number 9,318,574
- Issue date Apr 19, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer backside particle mitigation
- Patent number 9,318,347
- Issue date Apr 19, 2016
- International Business Machines Corporation
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of patterning features having differing widths
- Patent number 9,214,360
- Issue date Dec 15, 2015
- GLOBALFOUNDRIES Inc.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer backside particle mitigation
- Patent number 9,184,042
- Issue date Nov 10, 2015
- International Business Machines Corporation
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of simultaneously forming multiple structures having differe...
- Patent number 8,735,296
- Issue date May 27, 2014
- International Business Machines Corporation
- Ryan O. Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three photomask sidewall image transfer method
- Patent number 8,716,133
- Issue date May 6, 2014
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall image transfer process with multiple critical dimensions
- Patent number 8,673,165
- Issue date Mar 18, 2014
- International Business Machines Corporation
- Sudharshanan Raghunathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image transfer process employing a hard mask layer
- Patent number 8,637,406
- Issue date Jan 28, 2014
- International Business Machines Corporation
- Ryan O. Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...
- Publication number 20180315606
- Publication date Nov 1, 2018
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES
- Publication number 20180122643
- Publication date May 3, 2018
- International Business Machines Corporation
- Kangguo CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...
- Publication number 20170221721
- Publication date Aug 3, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING CONTROLLED SPACER RIE
- Publication number 20170221773
- Publication date Aug 3, 2017
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH FORMATION FOR DIELECTRIC FILLED CUT REGION
- Publication number 20170033000
- Publication date Feb 2, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH FORMATION FOR DIELECTRIC FILLED CUT REGION
- Publication number 20170033196
- Publication date Feb 2, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC LAYER
- Publication number 20170018437
- Publication date Jan 19, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...
- Publication number 20170018628
- Publication date Jan 19, 2017
- International Business Machines Corporation
- Andrew M. Greene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO FORM DUAL CHANNEL SEMICONDUCTOR MATERIAL FINS
- Publication number 20160372473
- Publication date Dec 22, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING CONTROLLED SPACER RIE
- Publication number 20160365292
- Publication date Dec 15, 2016
- International Business Machines Corporation
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES
- Publication number 20160233095
- Publication date Aug 11, 2016
- International Business Machines Corporation
- Kangguo CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS
- Publication number 20160064236
- Publication date Mar 3, 2016
- GLOBALFOUNDRIES INC.
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BACKSIDE PARTICLE MITIGATION
- Publication number 20160049311
- Publication date Feb 18, 2016
- International Business Machines Corporation
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JUNCTION OVERLAP CONTROL IN A SEMICONDUCTOR DEVICE USING A SACRIFIC...
- Publication number 20150380514
- Publication date Dec 31, 2015
- GLOBALFOUNDRIES INC.
- Steven J. Bentley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES
- Publication number 20150372113
- Publication date Dec 24, 2015
- International Business Machines Corporation
- Kangguo CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES
- Publication number 20150372127
- Publication date Dec 24, 2015
- International Business Machines Corporation
- Kangguo CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS
- Publication number 20140329388
- Publication date Nov 6, 2014
- International Business Machines Corporation
- Linus Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE PHOTOMASK SIDEWALL IMAGE TRANSFER METHOD
- Publication number 20140057436
- Publication date Feb 27, 2014
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE TRANSFER PROCESS EMPLOYING A HARD MASK LAYER
- Publication number 20140023834
- Publication date Jan 23, 2014
- International Business Machines Corporation
- Ryan O. Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE TRANSFER PROCESS EMPLOYING A HARD MASK LAYER
- Publication number 20140024219
- Publication date Jan 23, 2014
- International Business Machines Corporation
- Ryan O. Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SIMULTANEOUSLY FORMING MULTIPLE STRUCTURES HAVING DIFFERE...
- Publication number 20140024209
- Publication date Jan 23, 2014
- International Business Machines Corporation
- Ryan O. Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL IMAGE TRANSFER PROCESS WITH MULTIPLE CRITICAL DIMENSIONS
- Publication number 20130089984
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Sudharshanan Raghunathan
- H01 - BASIC ELECTRIC ELEMENTS

Ryan O. Jung

Person

Patents Grantslast 30 patents

Gate cut with high selectivity to preserve interlevel dielectric layer

Method and structure for enabling high aspect ratio sacrificial gates

Gate cut with high selectivity to preserve interlevel dielectric layer

Method and structure for enabling controlled spacer RIE

Method and structure for enabling high aspect ratio sacrificial gates

Gate cut with high selectivity to preserve interlevel dielectric layer

Method to form dual channel semiconductor material fins

Method and structure for enabling high aspect ratio sacrificial gates

Gate cut with high selectivity to preserve interlevel dielectric layer

Method and structure for enabling controlled spacer RIE

Trench formation for dielectric filled cut region

Trench formation for dielectric filled cut region

Junction overlap control in a semiconductor device using a sacrific...

Methods of patterning features having differing widths

Method to form dual channel semiconductor material fins

Method and structure for enabling high aspect ratio sacrificial gates

Wafer backside particle mitigation

Methods of patterning features having differing widths

Wafer backside particle mitigation

Method of simultaneously forming multiple structures having differe...

Three photomask sidewall image transfer method

Sidewall image transfer process with multiple critical dimensions

Image transfer process employing a hard mask layer

Patents Applicationslast 30 patents

GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...

METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES

GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...

METHOD AND STRUCTURE FOR ENABLING CONTROLLED SPACER RIE

TRENCH FORMATION FOR DIELECTRIC FILLED CUT REGION

TRENCH FORMATION FOR DIELECTRIC FILLED CUT REGION

GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC LAYER

GATE CUT WITH HIGH SELECTIVITY TO PRESERVE INTERLEVEL DIELECTRIC L...

METHOD TO FORM DUAL CHANNEL SEMICONDUCTOR MATERIAL FINS

METHOD AND STRUCTURE FOR ENABLING CONTROLLED SPACER RIE

METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES

METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS

WAFER BACKSIDE PARTICLE MITIGATION

JUNCTION OVERLAP CONTROL IN A SEMICONDUCTOR DEVICE USING A SACRIFIC...

METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES

METHOD AND STRUCTURE FOR ENABLING HIGH ASPECT RATIO SACRIFICIAL GATES

METHODS OF PATTERNING FEATURES HAVING DIFFERING WIDTHS

THREE PHOTOMASK SIDEWALL IMAGE TRANSFER METHOD

IMAGE TRANSFER PROCESS EMPLOYING A HARD MASK LAYER

IMAGE TRANSFER PROCESS EMPLOYING A HARD MASK LAYER

METHOD OF SIMULTANEOUSLY FORMING MULTIPLE STRUCTURES HAVING DIFFERE...

SIDEWALL IMAGE TRANSFER PROCESS WITH MULTIPLE CRITICAL DIMENSIONS