Ryota SAKANE

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,170,991
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,832,891
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing method and processing apparatus
- Patent number 10,676,823
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Feeder-cover structure and semiconductor production apparatus
- Patent number 10,374,358
- Issue date Aug 6, 2019
- Tokyo Electron Limited
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 9,991,100
- Issue date Jun 5, 2018
- Tokyo Electron Limited
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220375730
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST RING ASSEMBLY AND PLASMA PROCESSING APPARATUS
- Publication number 20220223388
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20220037131
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180226245
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180158650
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Ryota Sakane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20180148838
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20170213703
- Publication date Jul 27, 2017
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDER-COVER STRUCTURE AND SEMICONDUCTOR PRODUCTION APPARATUS
- Publication number 20150214653
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS

Ryota SAKANE

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Processing method and processing apparatus

Feeder-cover structure and semiconductor production apparatus

Plasma processing apparatus and control method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

EXHAUST RING ASSEMBLY AND PLASMA PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROCESSING METHOD AND PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

FEEDER-COVER STRUCTURE AND SEMICONDUCTOR PRODUCTION APPARATUS