Ryotaro Hanawa

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition
- Patent number 6,383,708
- Issue date May 7, 2002
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,792,585
- Issue date Aug 11, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,783,355
- Issue date Jul 21, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition comprising an alkal...
- Patent number 5,736,292
- Issue date Apr 7, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,714,620
- Issue date Feb 3, 1998
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,587,492
- Issue date Dec 24, 1996
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition
- Patent number 5,436,107
- Issue date Jul 25, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Quinone diazide photoresist composition containing alkali-soluble r...
- Patent number 5,362,598
- Issue date Nov 8, 1994
- Sumitomo Chemical Co., Ltd.
- Naoki Takeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions comprising styryl compound
- Patent number 5,354,644
- Issue date Oct 11, 1994
- Sumitomo Chemical Company, Limited
- Takanori Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive quinonediazide resist composition utilizing mixed solvent...
- Patent number 5,336,583
- Issue date Aug 9, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing radiation sensitive compound and positive res...
- Patent number 5,283,324
- Issue date Feb 1, 1994
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Styryl compounds, process for preparing the same and photoresist co...
- Patent number 5,218,136
- Issue date Jun 8, 1993
- Sumitomo Chemical Company, Limited
- Takanori Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition containing alkali-soluble resin, 1,2-quinone dia...
- Patent number 5,198,323
- Issue date Mar 30, 1993
- Sumitomo Chemical Co., Ltd.
- Teijiro Kitao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ryotaro Hanawa

Person

Patents Grantslast 30 patents

Positive resist composition

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition comprising an alkal...

Polyhydric phenol compound and positive resist composition comprisi...

Polyhydric phenol compound and positive resist composition comprisi...

Positive resist composition

Quinone diazide photoresist composition containing alkali-soluble r...

Photoresist compositions comprising styryl compound

Positive quinonediazide resist composition utilizing mixed solvent...

Process for preparing radiation sensitive compound and positive res...

Styryl compounds, process for preparing the same and photoresist co...

Resist composition containing alkali-soluble resin, 1,2-quinone dia...