Sajan Marokkey

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Test structures and methods
- Patent number 8,828,748
- Issue date Sep 9, 2014
- Infineon Technologies AG
- Sajan Marokkey
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Lithography systems and methods of manufacturing using thereof
- Patent number 8,715,909
- Issue date May 6, 2014
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming contacts in semiconductor devices
- Patent number 8,518,820
- Issue date Aug 27, 2013
- Infineon Technologies AG
- Roberto Schiwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test structures and methods
- Patent number 8,450,122
- Issue date May 28, 2013
- Infineon Technologies AG
- Sajan Marokkey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Alignment marks for polarized light lithography and method for use...
- Patent number 8,377,800
- Issue date Feb 19, 2013
- Infineon Technologies AG
- Sajan Marokkey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Stray light feedback for dose control in semiconductor lithography...
- Patent number 8,330,937
- Issue date Dec 11, 2012
- Infineon Technologies AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target for polarized light lithography
- Patent number 8,203,223
- Issue date Jun 19, 2012
- Infineon Technologies AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment marks for polarized light lithography and method for use...
- Patent number 8,183,129
- Issue date May 22, 2012
- Infineon Technologies AG
- Sajan Marokkey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 8,071,261
- Issue date Dec 6, 2011
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 7,947,431
- Issue date May 24, 2011
- Infineon Technologies AG
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Grant
Test structures and methods
- Patent number 7,820,458
- Issue date Oct 26, 2010
- Infineon Technologies AG
- Sajan Marokkey
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Overlay target for polarized light lithography
- Patent number 7,807,320
- Issue date Oct 5, 2010
- Infineon Technologies AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 7,799,486
- Issue date Sep 21, 2010
- Infineon Technologies AG
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Grant
Small feature integrated circuit fabrication
- Patent number 7,713,824
- Issue date May 11, 2010
- Infineon Technologies North America Corp.
- Chandrasekhar Sarma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment marks for polarized light lithography and method for use...
- Patent number 7,687,925
- Issue date Mar 30, 2010
- Infineon Technologies AG
- Sajan Marokkey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gridded contacts in semiconductor devices
- Patent number 7,674,703
- Issue date Mar 9, 2010
- Infineon Technologies AG
- Roberto Schiwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feature patterning methods
- Patent number 7,666,800
- Issue date Feb 23, 2010
- Infineon Technologies AG
- Sajan Marokkey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stray light feedback for dose control in semiconductor lithography...
- Patent number 7,583,362
- Issue date Sep 1, 2009
- Infineon Technologies AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target for polarized light lithography
- Patent number 7,556,898
- Issue date Jul 7, 2009
- Infineon Technologies AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ribs for line collapse prevention in damascene structures
- Patent number 7,514,356
- Issue date Apr 7, 2009
- Infineon Technologies AG
- Sajan Marokkey
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Alignment Marks for Polarized Light Lithography and Method for Use...
- Publication number 20120208341
- Publication date Aug 16, 2012
- INFINEON TECHNOLOGIES AG
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods For Forming Contacts in Semiconductor Devices
- Publication number 20120070977
- Publication date Mar 22, 2012
- INFINEON TECHNOLOGIES AG
- Roberto Schiwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Target for Polarized Light Lithography
- Publication number 20100330469
- Publication date Dec 30, 2010
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20100297398
- Publication date Nov 25, 2010
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Application
Test Structures and Methods
- Publication number 20100239964
- Publication date Sep 23, 2010
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contacts in Semiconductor Devices
- Publication number 20100187611
- Publication date Jul 29, 2010
- Roberto Schiwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Marks for Polarized Light Lithography and Method for Use...
- Publication number 20100128270
- Publication date May 27, 2010
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stray Light Feedback for Dose Control in Semiconductor Lithography...
- Publication number 20090284726
- Publication date Nov 19, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay Target for Polarized Light Lithography
- Publication number 20090233191
- Publication date Sep 17, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test Structures and Methods
- Publication number 20090200546
- Publication date Aug 13, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Devices and Methods of Manufacture Thereof
- Publication number 20090201474
- Publication date Aug 13, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feature Patterning Methods
- Publication number 20090200583
- Publication date Aug 13, 2009
- Sajan Marokkey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Systems and Methods of Manufacturing Using Thereof
- Publication number 20090092926
- Publication date Apr 9, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Systems and Methods of Manufacturing Using Thereof
- Publication number 20090091729
- Publication date Apr 9, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20090023078
- Publication date Jan 22, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Small Feature Integrated Circuit Fabrication
- Publication number 20080199784
- Publication date Aug 21, 2008
- Infineon Technologies North America Corp.
- Chandrasekhar Sarma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography masks and methods of manufacture thereof
- Publication number 20080119048
- Publication date May 22, 2008
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING
- Publication number 20070275330
- Publication date Nov 29, 2007
- International Business Machines Corporation
- Todd C. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment marks for polarized light lithography and method for use...
- Publication number 20070052113
- Publication date Mar 8, 2007
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay target for polarized light lithography
- Publication number 20070048629
- Publication date Mar 1, 2007
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ribs for line collapse prevention in damascene structures
- Publication number 20060199369
- Publication date Sep 7, 2006
- Sajan Marokkey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stray light feedback for dose control in semiconductor lithography...
- Publication number 20060110666
- Publication date May 25, 2006
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sajan Marokkey

Person

Patents Grantslast 30 patents

Test structures and methods

Lithography systems and methods of manufacturing using thereof

Methods for forming contacts in semiconductor devices

Test structures and methods

Alignment marks for polarized light lithography and method for use...

Stray light feedback for dose control in semiconductor lithography...

Overlay target for polarized light lithography

Alignment marks for polarized light lithography and method for use...

Lithography masks and methods of manufacture thereof

Lithography masks and methods of manufacture thereof

Test structures and methods

Overlay target for polarized light lithography

Lithography masks and methods of manufacture thereof

Small feature integrated circuit fabrication

Alignment marks for polarized light lithography and method for use...

Gridded contacts in semiconductor devices

Feature patterning methods

Stray light feedback for dose control in semiconductor lithography...

Overlay target for polarized light lithography

Ribs for line collapse prevention in damascene structures

Patents Applicationslast 30 patents

Alignment Marks for Polarized Light Lithography and Method for Use...

Methods For Forming Contacts in Semiconductor Devices

Overlay Target for Polarized Light Lithography

Lithography Masks and Methods of Manufacture Thereof

Test Structures and Methods

Contacts in Semiconductor Devices

Alignment Marks for Polarized Light Lithography and Method for Use...

Stray Light Feedback for Dose Control in Semiconductor Lithography...

Overlay Target for Polarized Light Lithography

Test Structures and Methods

Semiconductor Devices and Methods of Manufacture Thereof

Feature Patterning Methods

Lithography Systems and Methods of Manufacturing Using Thereof

Lithography Systems and Methods of Manufacturing Using Thereof

Lithography Masks and Methods of Manufacture Thereof

Small Feature Integrated Circuit Fabrication

Lithography masks and methods of manufacture thereof

BOTTOM ANTI-REFLECTIVE COATING

Alignment marks for polarized light lithography and method for use...

Overlay target for polarized light lithography

Ribs for line collapse prevention in damascene structures

Stray light feedback for dose control in semiconductor lithography...