Sandra L. Hyland

Person

Guilderland, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for growing germanium/silicon—germanium superlattice
- Patent number 9,255,345
- Issue date Feb 9, 2016
- BAE Systems Information and Electronic Systems Integration Inc.
- Vu Anh Vu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and system for introduction of an active material to a chemi...
- Patent number 8,580,075
- Issue date Nov 12, 2013
- Tokyo Electron Limited
- John A. Hughes
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for double patterning a thin film
- Patent number 7,883,835
- Issue date Feb 8, 2011
- Tokyo Electron Limited
- Sandra L. Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning an anti-reflective coating by partial developing
- Patent number 7,811,747
- Issue date Oct 12, 2010
- Tokyo Electron Limited
- Sandra L. Hyland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for selective removal of damaged multi-stack bilayer films
- Patent number 7,723,237
- Issue date May 25, 2010
- Tokyo Electron Limited
- Sandra Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved baffle plate
- Patent number 7,461,614
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Steven T Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a dual damascene structure utilizing a developabl...
- Patent number 7,432,191
- Issue date Oct 7, 2008
- Tokyo Electron Limited
- Harlan D. Stamper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching high aspect ratio features
- Patent number 7,226,868
- Issue date Jun 5, 2007
- Tokyo Electron Limited
- Aelan Mosden
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device using double endpoint dete...
- Patent number 6,376,262
- Issue date Apr 23, 2002
- National Semiconductor Corporation
- Danielle Ki'ilani Kempa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR GROWING GERMANIUM/SILICON-GERMANIUM SUPERLATTICE
- Publication number 20150028286
- Publication date Jan 29, 2015
- BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC
- Vu Anh Vu
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD AND SYSTEM FOR INTRODUCTION OF AN ACTIVE MATERIAL TO A CHEMI...
- Publication number 20120199288
- Publication date Aug 9, 2012
- TOKYO ELECTRON LIMITED
- John A. HUGHES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABL...
- Publication number 20080241763
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Harlan Stamper
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SELECTIVE REMOVAL OF DAMAGED MULTI-STACK BILAYER FILMS
- Publication number 20080142988
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Sandra Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING AN ANTI-REFLECTIVE COATING BY PARTIAL ETCHING
- Publication number 20080073321
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- Sandra L. Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOUBLE PATTERNING A THIN FILM
- Publication number 20080076075
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- Sandra L. Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING AN ANTI-REFLECTIVE COATING BY PARTIAL DEVELOPING
- Publication number 20080076069
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- Sandra L. Hyland
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for improved baffle plate
- Publication number 20050098265
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for introduction of an active material to a chemi...
- Publication number 20050067098
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- John A. Hughes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching high aspect ratio features
- Publication number 20040221797
- Publication date Nov 11, 2004
- Aelan Mosden
- H01 - BASIC ELECTRIC ELEMENTS

Sandra L. Hyland

Person

Patents Grantslast 30 patents

Method for growing germanium/silicon—germanium superlattice

Method and system for introduction of an active material to a chemi...

Method for double patterning a thin film

Method of patterning an anti-reflective coating by partial developing

Method for selective removal of damaged multi-stack bilayer films

Method and apparatus for improved baffle plate

Method of forming a dual damascene structure utilizing a developabl...

Method of etching high aspect ratio features

Method of forming a semiconductor device using double endpoint dete...

Patents Applicationslast 30 patents

METHOD FOR GROWING GERMANIUM/SILICON-GERMANIUM SUPERLATTICE

METHOD AND SYSTEM FOR INTRODUCTION OF AN ACTIVE MATERIAL TO A CHEMI...

METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABL...

METHOD FOR SELECTIVE REMOVAL OF DAMAGED MULTI-STACK BILAYER FILMS

METHOD OF PATTERNING AN ANTI-REFLECTIVE COATING BY PARTIAL ETCHING

METHOD FOR DOUBLE PATTERNING A THIN FILM

METHOD OF PATTERNING AN ANTI-REFLECTIVE COATING BY PARTIAL DEVELOPING

Method and apparatus for improved baffle plate

Method and system for introduction of an active material to a chemi...

Method of etching high aspect ratio features