Sangheon Lee

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for the deposition of a conformal film on a substrate and...
- Patent number 9,384,979
- Issue date Jul 5, 2016
- Lam Research Corporation
- Dae-Han Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,614,149
- Issue date Dec 24, 2013
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the deposition of a conformal film on a substrate and...
- Patent number 8,357,434
- Issue date Jan 22, 2013
- Lam Research Corporation
- Dae-han Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 8,268,118
- Issue date Sep 18, 2012
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Infinitely selective photoresist mask etch
- Patent number 7,910,489
- Issue date Mar 22, 2011
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glue layer for hydrofluorocarbon etch
- Patent number 7,902,073
- Issue date Mar 8, 2011
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension reduction and roughness control
- Patent number 7,695,632
- Issue date Apr 13, 2010
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned pitch reduction
- Patent number 7,560,388
- Issue date Jul 14, 2009
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of feature critical dimensions
- Patent number 7,541,291
- Issue date Jun 2, 2009
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch with photoresist mask
- Patent number 7,442,649
- Issue date Oct 28, 2008
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned pitch reduction
- Patent number 7,390,749
- Issue date Jun 24, 2008
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma stripping using periodic modulation of gas chemis...
- Patent number 7,294,580
- Issue date Nov 13, 2007
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of feature critical dimensions
- Patent number 7,250,371
- Issue date Jul 31, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plug fill
- Patent number 7,192,531
- Issue date Mar 20, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dual damascene structure
- Patent number 7,098,130
- Issue date Aug 29, 2006
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment for corrosion in substrate processing
- Patent number 7,084,070
- Issue date Aug 1, 2006
- Lam Research Corporation
- Sangheon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for inspecting contact openings in a plasma p...
- Patent number 6,979,579
- Issue date Dec 27, 2005
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...
- Publication number 20230005717
- Publication date Jan 5, 2023
- LAM RESEARCH CORPORATION
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR THE DEPOSITION OF A CONFORMAL FILM ON A SUBSTRATE AND...
- Publication number 20130074769
- Publication date Mar 28, 2013
- LAM RESEARCH CORPORATION
- Dae-Han CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20120309201
- Publication date Dec 6, 2012
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL
- Publication number 20100148317
- Publication date Jun 17, 2010
- LAM RESEARCH CORPORATION
- Sangheon LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GLUE LAYER FOR HYDROFLUOROCARBON ETCH
- Publication number 20080146032
- Publication date Jun 19, 2008
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of feature critical dimensions
- Publication number 20070293050
- Publication date Dec 20, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Infinitely selective photoresist mask etch
- Publication number 20070193973
- Publication date Aug 23, 2007
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED PITCH REDUCTION
- Publication number 20070122977
- Publication date May 31, 2007
- Lam Research Corporation
- Ji Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-aligned pitch reduction
- Publication number 20070123053
- Publication date May 31, 2007
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Critical dimension reduction and roughness control
- Publication number 20060266478
- Publication date Nov 30, 2006
- Lam Research Corporation
- Sangheon Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch with photoresist mask
- Publication number 20060223327
- Publication date Oct 5, 2006
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of feature critical dimensions
- Publication number 20050048785
- Publication date Mar 3, 2005
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma stripping using periodic modulation of gas chemis...
- Publication number 20040224520
- Publication date Nov 11, 2004
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness control
- Publication number 20040171260
- Publication date Sep 2, 2004
- Lam Research Corporation
- Youngjin Choi
- H01 - BASIC ELECTRIC ELEMENTS

Sangheon Lee

Person

Patents Grantslast 30 patents

Apparatus for the deposition of a conformal film on a substrate and...

Critical dimension reduction and roughness control

Apparatus for the deposition of a conformal film on a substrate and...

Critical dimension reduction and roughness control

Infinitely selective photoresist mask etch

Glue layer for hydrofluorocarbon etch

Critical dimension reduction and roughness control

Self-aligned pitch reduction

Reduction of feature critical dimensions

Etch with photoresist mask

Self-aligned pitch reduction

Method for plasma stripping using periodic modulation of gas chemis...

Reduction of feature critical dimensions

In-situ plug fill

Method of forming dual damascene structure

Treatment for corrosion in substrate processing

Methods and apparatus for inspecting contact openings in a plasma p...

Patents Applicationslast 30 patents

MULTI-STATE PULSING FOR ACHIEVING A BALANCE BETWEEN BOW CONTROL AND...

APPARATUS FOR THE DEPOSITION OF A CONFORMAL FILM ON A SUBSTRATE AND...

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

CRITICAL DIMENSION REDUCTION AND ROUGHNESS CONTROL

GLUE LAYER FOR HYDROFLUOROCARBON ETCH

Reduction of feature critical dimensions

Infinitely selective photoresist mask etch

SELF-ALIGNED PITCH REDUCTION

Self-aligned pitch reduction

Critical dimension reduction and roughness control

Etch with photoresist mask

Reduction of feature critical dimensions

Method for plasma stripping using periodic modulation of gas chemis...

Line edge roughness control