Sanjay Kamath

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment process to densify oxide layers
- Patent number 12,094,709
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jung Chan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-pressure bipolar electrostatic chucking
- Patent number 12,040,210
- Issue date Jul 16, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 11,817,320
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for pressure ramped plasma purge
- Patent number 11,817,313
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power supply signal conditioning for an electrostatic chuck
- Patent number 11,776,835
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi channel splitter spool
- Patent number 11,600,468
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for depositing high density and high tensile st...
- Patent number 11,538,677
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Initiation modulation for plasma deposition
- Patent number 11,430,654
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi zone electrostatic chuck
- Patent number 11,270,903
- Issue date Mar 8, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential deposition and high frequency plasma treatment of deposi...
- Patent number 11,217,443
- Issue date Jan 4, 2022
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process development visualization tool
- Patent number 11,157,661
- Issue date Oct 26, 2021
- Applied Materials, Inc.
- Vinayak Veer Vats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pulsed plasma deposition etch step coverage improvement
- Patent number 10,950,430
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 10,410,869
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flowable low-k dielectric gapfill treatment
- Patent number 9,362,107
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma clean process with cycled high and low pressure clean...
- Patent number 7,967,913
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,799,704
- Issue date Sep 21, 2010
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas baffle and distributor for semiconductor processing chamber
- Patent number 7,740,706
- Issue date Jun 22, 2010
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HDP-CVD SiON films for gap-fill
- Patent number 7,704,897
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT
- Publication number 20240304437
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT
- Publication number 20240282605
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Rupankar CHOUDHURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL LAYER FOR FORMING MERGED HIGH ASPECT RATIO CONTACTS IN...
- Publication number 20240090213
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Jialiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS
- Publication number 20230030436
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Jung Chan LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PRESSURE BIPOLAR ELECTROSTATIC CHUCKING
- Publication number 20220122873
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM
- Publication number 20220119952
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Rana Howlader
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRIC ARC MITIGATING FACEPLATE
- Publication number 20220122811
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK
- Publication number 20220102179
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING HIGH DENSITY AND HIGH TENSILE ST...
- Publication number 20220068630
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Chuanxi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR PRESSURE RAMPED PLASMA PURGE
- Publication number 20210242016
- Publication date Aug 5, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI ZONE ELECTROSTATIC CHUCK
- Publication number 20210183678
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INITIATION MODULATION FOR PLASMA DEPOSITION
- Publication number 20210159073
- Publication date May 27, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE ENCASING MATERIAL LAYER
- Publication number 20210134592
- Publication date May 6, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPULSION MESH AND DEPOSITION METHODS
- Publication number 20210082732
- Publication date Mar 18, 2021
- Applied Materials, Inc.
- Madhu Santosh Kumar Mutyala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHANNEL SPLITTER SPOOL
- Publication number 20200251310
- Publication date Aug 6, 2020
- Applied Materials, Inc.
- Madhu Santosh Kumar MUTYALA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS FOR FORMING FILMS CONTAINING SILICON BORON WITH LOW LEAKAGE...
- Publication number 20200211834
- Publication date Jul 2, 2020
- Applied Materials, Inc.
- Chuanxi YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS DEVELOPMENT VISUALIZATION TOOL
- Publication number 20200202044
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...
- Publication number 20200176241
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD BASED OXIDE-METAL MULTI STRUCTURE FOR 3D NAND MEMORY DEVICES
- Publication number 20190393042
- Publication date Dec 26, 2019
- Applied Materials, Inc.
- Susmit SINGHA ROY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED PLASMA DEPOSITION ETCH STEP COVERAGE IMPROVEMENT
- Publication number 20190385844
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Vinayak Veer VATS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
QUALITY IMPROVEMENT OF FILMS DEPOSITED ON A SUBSTRATE
- Publication number 20180350563
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Pramit MANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD BASED OXIDE-METAL MULTI STRUCTURE FOR 3D NAND MEMORY DEVICES
- Publication number 20170372953
- Publication date Dec 28, 2017
- Applied Materials, Inc.
- Susmit Singha ROY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWABLE LOW-K DIELECTRIC GAPFILL TREATMENT
- Publication number 20160093488
- Publication date Mar 31, 2016
- Applied Materials, Inc.
- Kiran V. Thadani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF S...
- Publication number 20130217241
- Publication date Aug 22, 2013
- Applied Materials, Inc.
- Brian S. Underwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...
- Publication number 20100095979
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Zhong Qiang Hua
- B08 - CLEANING
Information Patent Application
HDP-CVD SION FILMS FOR GAP-FILL
- Publication number 20090215281
- Publication date Aug 27, 2009
- Applied Materials, Inc.
- HEMANT P. MUNGEKAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas Baffle and Distributor for Semiconductor Processing Chamber
- Publication number 20090093129
- Publication date Apr 9, 2009
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20080121179
- Publication date May 29, 2008
- Applied Materials, Inc.
- SOONAM PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER
- Publication number 20080124944
- Publication date May 29, 2008
- Applied Materials, Inc.
- Soonam Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Sanjay Kamath

Person

Patents Grantslast 30 patents

Plasma treatment process to densify oxide layers

Multi-pressure bipolar electrostatic chucking

CVD based oxide-metal multi structure for 3D NAND memory devices

Methods for pressure ramped plasma purge

Power supply signal conditioning for an electrostatic chuck

Multi channel splitter spool

Systems and methods for depositing high density and high tensile st...

Initiation modulation for plasma deposition

Multi zone electrostatic chuck

Sequential deposition and high frequency plasma treatment of deposi...

Process development visualization tool

Pulsed plasma deposition etch step coverage improvement

CVD based oxide-metal multi structure for 3D NAND memory devices

Flowable low-k dielectric gapfill treatment

Remote plasma clean process with cycled high and low pressure clean...

Gas baffle and distributor for semiconductor processing chamber

Gas baffle and distributor for semiconductor processing chamber

HDP-CVD SiON films for gap-fill

Patents Applicationslast 30 patents

PECVD OF SIBN THIN FILMS WITH LOW LEAKAGE CURRENT

LOUVER DESIGN FOR ELIMINATING LINE OF SIGHT

SACRIFICIAL LAYER FOR FORMING MERGED HIGH ASPECT RATIO CONTACTS IN...

PLASMA TREATMENT PROCESS TO DENSIFY OXIDE LAYERS

MULTI-PRESSURE BIPOLAR ELECTROSTATIC CHUCKING

METHOD OF REDUCING DEFECTS IN A MULTI-LAYER PECVD TEOS OXIDE FILM

ELECTRIC ARC MITIGATING FACEPLATE

POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK

SYSTEMS AND METHODS FOR DEPOSITING HIGH DENSITY AND HIGH TENSILE ST...

METHODS FOR PRESSURE RAMPED PLASMA PURGE

MULTI ZONE ELECTROSTATIC CHUCK

INITIATION MODULATION FOR PLASMA DEPOSITION

SURFACE ENCASING MATERIAL LAYER

REPULSION MESH AND DEPOSITION METHODS

MULTI CHANNEL SPLITTER SPOOL

METHODS FOR FORMING FILMS CONTAINING SILICON BORON WITH LOW LEAKAGE...

PROCESS DEVELOPMENT VISUALIZATION TOOL

SEQUENTIAL DEPOSITION AND HIGH FREQUENCY PLASMA TREATMENT OF DEPOSI...

CVD BASED OXIDE-METAL MULTI STRUCTURE FOR 3D NAND MEMORY DEVICES

PULSED PLASMA DEPOSITION ETCH STEP COVERAGE IMPROVEMENT

QUALITY IMPROVEMENT OF FILMS DEPOSITED ON A SUBSTRATE

CVD BASED OXIDE-METAL MULTI STRUCTURE FOR 3D NAND MEMORY DEVICES

FLOWABLE LOW-K DIELECTRIC GAPFILL TREATMENT

TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF S...

REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...

HDP-CVD SION FILMS FOR GAP-FILL

Gas Baffle and Distributor for Semiconductor Processing Chamber

GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER

GAS BAFFLE AND DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER