Santiago E. del Puerto

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method
- Patent number 10,908,518
- Issue date Feb 2, 2021
- ASML Holding N.V.
- Santiago E. Delpuerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle cooling by non-uniform gas flow
- Patent number 10,423,081
- Issue date Sep 24, 2019
- ASML Holding N.V.
- Thomas Venturino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pneumatic bearing with bonded polymer film wear surface and product...
- Patent number 10,267,360
- Issue date Apr 23, 2019
- ASML Holding N.V.
- Dragos Pariza
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,001,713
- Issue date Jun 19, 2018
- ASML Holding N.V.
- Santiago E. Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining position and curvature information directly from a surf...
- Patent number 9,377,700
- Issue date Jun 28, 2016
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle support that reduces reticle slippage
- Patent number 9,229,341
- Issue date Jan 5, 2016
- ASML Holding N.V.
- Santiago E. Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, projection system and damper for use in a l...
- Patent number 8,625,070
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Windy Lynn Farnsworth
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Optically compensated unidirectional reticle bender
- Patent number 8,553,207
- Issue date Oct 8, 2013
- ASML Holdings N.V.
- Santiago E. Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for using a two part cover and a box for protecti...
- Patent number 8,446,570
- Issue date May 21, 2013
- ASML Holding N.V.
- Santiago Del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compensation techniques for fluid and magnetic bearings
- Patent number 7,894,140
- Issue date Feb 22, 2011
- ASML Holding N.V.
- Roberto B. Wiener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for using a two part cover and a box for protecti...
- Patent number 7,830,497
- Issue date Nov 9, 2010
- ASML Holding N.V.
- Santiago del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resonant scanning mirror
- Patent number 7,697,115
- Issue date Apr 13, 2010
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for using a two part cover for protecting a reticle
- Patent number 7,304,720
- Issue date Dec 4, 2007
- ASML Holding N.V.
- Santiago del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer handling method for use in lithography patterning
- Patent number 7,298,459
- Issue date Nov 20, 2007
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum pre-loaded pneumatic bearing with onboard vacuum generator
- Patent number 7,290,931
- Issue date Nov 6, 2007
- ASML Holding N.V.
- Geoffrey B. Wardman
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
System and method for reticle protection and transport
- Patent number 7,249,925
- Issue date Jul 31, 2007
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for managing actinic intensity transients in a...
- Patent number 7,163,301
- Issue date Jan 16, 2007
- ASML Holding N.V.
- Santiago del Puerto
- G02 - OPTICS
Information Patent Grant
Method and apparatus for cooling a reticle during lithographic expo...
- Patent number 7,105,836
- Issue date Sep 12, 2006
- ASML Holding N.V.
- Santiago del Puerto
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Patent number 7,057,711
- Issue date Jun 6, 2006
- ASML Holding N.V.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measuring thermal expansion
- Patent number 7,025,498
- Issue date Apr 11, 2006
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Foam core chuck for the scanning stage of a lithography system
- Patent number 7,009,359
- Issue date Mar 7, 2006
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bearing arrangement for reaction mass in a controlled environment
- Patent number 7,009,685
- Issue date Mar 7, 2006
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for managing actinic intensity transients in a...
- Patent number 6,994,444
- Issue date Feb 7, 2006
- ASML Holding N.V.
- Santiago del Puerto
- G02 - OPTICS
Information Patent Grant
System and method for reticle protection and transport
- Patent number 6,991,416
- Issue date Jan 31, 2006
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bearing arrangement for reaction mass in a controlled environment
- Patent number 6,947,125
- Issue date Sep 20, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer handling method for use in lithography patterning
- Patent number 6,927,842
- Issue date Aug 9, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for using a two part cover for protecting a reticle
- Patent number 6,906,783
- Issue date Jun 14, 2005
- ASML Holding N.V.
- Santiago del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Patent number 6,826,451
- Issue date Nov 30, 2004
- ASML Holding N.V.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer handling system for use in lithography patterning
- Patent number 6,778,258
- Issue date Aug 17, 2004
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist outgassing mitigation system method and apparatus for i...
- Patent number 6,369,874
- Issue date Apr 9, 2002
- Silicon Valley Group, Inc.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING
- Publication number 20240419088
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Akshay Dipakkumar HARLALKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180267414
- Publication date Sep 20, 2018
- ASML Holding N.V.
- Santiago E. DELPUERTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle Cooling by Non-Uniform Gas Flow
- Publication number 20170363973
- Publication date Dec 21, 2017
- ASML Holding N.V.
- Thomas VENTURINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20150370180
- Publication date Dec 24, 2015
- ASML Holding N.V.
- Santiago E. DEL PUERTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...
- Publication number 20140307246
- Publication date Oct 16, 2014
- ASML Holding N.V.
- Mark Josef Schuster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pneumatic Bearing with Bonded Polymer Film Wear Surface and Product...
- Publication number 20130108203
- Publication date May 2, 2013
- ASML Holdings N.V.
- Dragos Pariza
- B32 - LAYERED PRODUCTS
Information Patent Application
System and Method for Using a Two Part Cover and a Box for Protecti...
- Publication number 20130010277
- Publication date Jan 10, 2013
- ASML Holding N.V.
- Santiago del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reticle Support that Reduces Reticle Slippage
- Publication number 20100195081
- Publication date Aug 5, 2010
- ASML Holding N.V.
- Santiago E. DEL PUERTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optically Compensated Unidirectional Reticle Bender
- Publication number 20100167189
- Publication date Jul 1, 2010
- ASML Holding N.V.
- Santiago E. DEL PUERTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus, Projection System And Damper for Use in a L...
- Publication number 20090180091
- Publication date Jul 16, 2009
- ASML Holding N.V.
- Windy Lynn FARNSWORTH
- G02 - OPTICS
Information Patent Application
Compensation Techniques for Fluid and Magnetic Bearings
- Publication number 20080151386
- Publication date Jun 26, 2008
- ASML Holding N.V.
- Roberto B. Wiener
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compensation techniques for fluid and magnetic bearings
- Publication number 20080111977
- Publication date May 15, 2008
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Vacuum pre-loaded pneumatic bearing with onboard vacuum generator
- Publication number 20070014494
- Publication date Jan 18, 2007
- ASML Holding N.V.
- Geoffrey B. Wardman
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
System and method for reticle protection and transport
- Publication number 20060078407
- Publication date Apr 13, 2006
- ASML Holding N.V.
- Santiago E. del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Wafer handling method for use in lithography patterning
- Publication number 20050264791
- Publication date Dec 1, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for managing actinic intensity transients in a...
- Publication number 20050254154
- Publication date Nov 17, 2005
- ASML Holding N.V.
- Santiago del Puerto
- G02 - OPTICS
Information Patent Application
Bearing arrangement for reaction mass in a controlled environment
- Publication number 20050248742
- Publication date Nov 10, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Publication number 20050057740
- Publication date Mar 17, 2005
- ASML Holding N.V.
- Santiago Del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bearing arrangement for reaction mass in a controlled environment
- Publication number 20050046820
- Publication date Mar 3, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Foam core chuck for the scanning stage of a lithography system
- Publication number 20050029981
- Publication date Feb 10, 2005
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer handling method for use in lithography patterning
- Publication number 20040257554
- Publication date Dec 23, 2004
- ASML Holding N.V.
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stage with thermal expansion compensation
- Publication number 20040240513
- Publication date Dec 2, 2004
- ASML Holding N.V.
- Santiago E. del Puerto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for cooling a reticle during lithographic expo...
- Publication number 20040079518
- Publication date Apr 29, 2004
- ASML US, Inc.
- Santiago del Puerto
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Lithography tool having a vacuum reticle library coupled to a vacuu...
- Publication number 20040019408
- Publication date Jan 29, 2004
- ASML US, Inc.
- Santiago del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for using a two part cover for protecting a reticle
- Publication number 20030227605
- Publication date Dec 11, 2003
- ASML Netherlands B.V.
- Santiago del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Application
System and method for using a two part cover for protecting a reticle
- Publication number 20030218728
- Publication date Nov 27, 2003
- ASML Netherlands B.V.
- Santiago del Puerto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Wafer handling system and method for use in lithography patterning
- Publication number 20030082466
- Publication date May 1, 2003
- ASML, Lithography Division
- Santiago E. del Puerto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for reticle protection and transport
- Publication number 20030082030
- Publication date May 1, 2003
- Santiago E. del Puerto
- B82 - NANO-TECHNOLOGY

Santiago E. del Puerto

Person

Patents Grantslast 30 patents

Lithographic apparatus and method

Reticle cooling by non-uniform gas flow

Pneumatic bearing with bonded polymer film wear surface and product...

Lithographic apparatus and method

Determining position and curvature information directly from a surf...

Reticle support that reduces reticle slippage

Lithographic apparatus, projection system and damper for use in a l...

Optically compensated unidirectional reticle bender

System and method for using a two part cover and a box for protecti...

Compensation techniques for fluid and magnetic bearings

System and method for using a two part cover and a box for protecti...

Resonant scanning mirror

System for using a two part cover for protecting a reticle

Wafer handling method for use in lithography patterning

Vacuum pre-loaded pneumatic bearing with onboard vacuum generator

System and method for reticle protection and transport

Method and apparatus for managing actinic intensity transients in a...

Method and apparatus for cooling a reticle during lithographic expo...

Lithography tool having a vacuum reticle library coupled to a vacuu...

System and method of measuring thermal expansion

Foam core chuck for the scanning stage of a lithography system

Bearing arrangement for reaction mass in a controlled environment

Method and apparatus for managing actinic intensity transients in a...

System and method for reticle protection and transport

Bearing arrangement for reaction mass in a controlled environment

Wafer handling method for use in lithography patterning

System for using a two part cover for protecting a reticle

Lithography tool having a vacuum reticle library coupled to a vacuu...

Wafer handling system for use in lithography patterning

Photoresist outgassing mitigation system method and apparatus for i...

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING

LITHOGRAPHIC APPARATUS AND METHOD

Reticle Cooling by Non-Uniform Gas Flow

Lithographic Apparatus and Method

DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURF...

Pneumatic Bearing with Bonded Polymer Film Wear Surface and Product...

System and Method for Using a Two Part Cover and a Box for Protecti...

Reticle Support that Reduces Reticle Slippage

Optically Compensated Unidirectional Reticle Bender

Lithographic Apparatus, Projection System And Damper for Use in a L...

Compensation Techniques for Fluid and Magnetic Bearings

Compensation techniques for fluid and magnetic bearings

Vacuum pre-loaded pneumatic bearing with onboard vacuum generator

System and method for reticle protection and transport

Wafer handling method for use in lithography patterning

Method and apparatus for managing actinic intensity transients in a...

Bearing arrangement for reaction mass in a controlled environment

Lithography tool having a vacuum reticle library coupled to a vacuu...

Bearing arrangement for reaction mass in a controlled environment

Foam core chuck for the scanning stage of a lithography system

Wafer handling method for use in lithography patterning

Stage with thermal expansion compensation

Method and apparatus for cooling a reticle during lithographic expo...

Lithography tool having a vacuum reticle library coupled to a vacuu...

System and method for using a two part cover for protecting a reticle

System and method for using a two part cover for protecting a reticle

Wafer handling system and method for use in lithography patterning

System and method for reticle protection and transport