Number | Name | Date | Kind |
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4408338 | Grobman | Oct 1983 | A |
5973764 | Mc Cullough et al. | Oct 1999 | A |
6031598 | Tichenor et al. | Feb 2000 | A |
Number | Date | Country |
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0 532 968 | Mar 1993 | EP |
0 957 402 | Nov 1999 | EP |
Entry |
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Jos. P.H. Benschop et al., Euclides: European EUV Lithography Milestones, Solid State Technology, Sep. 1999, pp. 43, 44, 46, 51, and 52. |
Roderick R. Kunz et al., Photo-induced Organic Contamination of Lithographic Optics, Microlithography World, Winter 2000, pp. 2, 4, 6, and 8. |
B.M. Mertens et al., Mitigation of Surface Contamination from Resist Outgassing in EUV Lithography (paper presented at Micro and Nano Engineering 99 International Conference (Rome, Sep. 21-23, 1999)), 4 pages. |