Sascha MIGURA

Person

Aalen-Unterrombach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and method
- Patent number 10,558,126
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for use in a microlithography projection exposure apparatus
- Patent number 9,568,845
- Issue date Feb 14, 2017
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imaging optical unit and projection exposure apparatus for projecti...
- Patent number 9,291,751
- Issue date Mar 22, 2016
- Carl Zeiss SMT GmbH
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Reflective optical imaging system
- Patent number 9,188,771
- Issue date Nov 17, 2015
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Projection objective having mirror elements with reflective coatings
- Patent number 9,013,678
- Issue date Apr 21, 2015
- Carl Zeiss SMT GmbH
- Danny Chan
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask for EUV lithography
- Patent number 8,486,590
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection objective having mirror elements with reflective coatings
- Patent number 8,279,404
- Issue date Oct 2, 2012
- Carl Zeiss SMT GmbH
- Danny Chan
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170176868
- Publication date Jun 22, 2017
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...
- Publication number 20140368801
- Publication date Dec 18, 2014
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS
- Publication number 20130010352
- Publication date Jan 10, 2013
- Carl Zeiss SMT GMBH
- Danny Chan
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK FOR EUV LITHOGRAPHY
- Publication number 20120320348
- Publication date Dec 20, 2012
- Carl Zeiss SMT GMBH
- Vladimir KAMENOV
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS
- Publication number 20120229784
- Publication date Sep 13, 2012
- Carl Zeiss SMT GMBH
- Martin ROCKTAESCHEL
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL IMAGING SYSTEM
- Publication number 20120224160
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...
- Publication number 20120212810
- Publication date Aug 23, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...
- Publication number 20120134015
- Publication date May 31, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS
- Publication number 20100195075
- Publication date Aug 5, 2010
- Carl Zeiss SMT AG
- Danny Chan
- G02 - OPTICS

Sascha MIGURA

Person

Patents Grantslast 30 patents

Lithographic apparatus and method

Mirror for use in a microlithography projection exposure apparatus

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Imaging optical unit and projection exposure apparatus for projecti...

Reflective optical imaging system

Projection objective having mirror elements with reflective coatings

Reflective mask for EUV lithography

Projection objective having mirror elements with reflective coatings

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND METHOD

IMAGING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR PROJECTI...

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS

REFLECTIVE MASK FOR EUV LITHOGRAPHY

MIRROR FOR USE IN A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

REFLECTIVE OPTICAL IMAGING SYSTEM

MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...

MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...

PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS