Satoru Asai

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,553,198
- Issue date Oct 8, 2013
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 8,409,786
- Issue date Apr 2, 2013
- Fujitsu Semiconductor Limited
- Tomohiko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 8,227,153
- Issue date Jul 24, 2012
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Creating method of photomask pattern data, photomask created by usi...
- Patent number 7,971,160
- Issue date Jun 28, 2011
- Fujitsu Semiconductor Limited
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern correction device, method of correcting mask pattern,...
- Patent number 7,732,107
- Issue date Jun 8, 2010
- Fujitsu Semiconductor Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Local flare correction
- Patent number 7,604,912
- Issue date Oct 20, 2009
- Fujitsu Microelectronics Limited
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for correcting pattern dimension and photo mas...
- Patent number 7,601,471
- Issue date Oct 13, 2009
- Fujitsu Microelectronics Limited
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and equipment for simulation
- Patent number 7,577,556
- Issue date Aug 18, 2009
- Fujitsu Microelectronics Limited
- Hiroki Futatsuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method for detecting pattern defect of the same, and met...
- Patent number 7,371,489
- Issue date May 13, 2008
- Fujitsu Limited
- Tomohiko Yamamoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask, method for detecting pattern defect of the same, and met...
- Patent number 7,074,524
- Issue date Jul 11, 2006
- Fujitsu Limited
- Tomohiko Yamamoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical exposure method
- Patent number 6,420,094
- Issue date Jul 16, 2002
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 6,045,976
- Issue date Apr 4, 2000
- Fujitsu, Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Levenson type phase shift photomask and manufacture method of semic...
- Patent number 5,994,004
- Issue date Nov 30, 1999
- Fujitsu Limited
- Yasuko Tabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned mask having a transparent etching stopper layer
- Patent number 5,876,877
- Issue date Mar 2, 1999
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having a regrowth crystal region
- Patent number 5,818,078
- Issue date Oct 6, 1998
- Fujitsu Limited
- Kozo Makiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical exposure method
- Patent number 5,607,821
- Issue date Mar 4, 1997
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift optical mask and method of correcting defects in optica...
- Patent number 5,561,010
- Issue date Oct 1, 1996
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method
- Patent number 5,465,220
- Issue date Nov 7, 1995
- Fujitsu Limited
- Tamae Haruki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical mask and exposure method using the optical mask
- Patent number 5,428,478
- Issue date Jun 27, 1995
- Fujitsu, Ltd.
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical mask using phase shift and method of producing the same
- Patent number 5,424,153
- Issue date Jun 13, 1995
- Fujitsu Limited
- Satoru Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and an optical mask for use in projectio...
- Patent number 5,418,093
- Issue date May 23, 1995
- Fujitsu Limited
- Satoru Asai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of fabricating the same
- Patent number 5,368,963
- Issue date Nov 29, 1994
- Fujitsu Limited
- Isamu Hanyu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask Pattern Correction Device, Method of Correcting Mask Pattern,...
- Publication number 20120236279
- Publication date Sep 20, 2012
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...
- Publication number 20100209834
- Publication date Aug 19, 2010
- FUJITSU SEMICONDUCTOR LTD.
- Teruyoshi YAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CREATING METHOD OF PHOTOMASK PATTERN DATA, PHOTOMASK CREATED BY USI...
- Publication number 20080113280
- Publication date May 15, 2008
- Fujitsu Limited
- Morimi OSAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...
- Publication number 20070298353
- Publication date Dec 27, 2007
- Fujitsu Limited
- Tomohiko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20070275331
- Publication date Nov 29, 2007
- FUJITSU LIMITED
- Tomohiko Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for detecting pattern defect of the same, and met...
- Publication number 20060210930
- Publication date Sep 21, 2006
- FUJITSU LIMITED
- Tomohiko Yamamoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask pattern correction device, method of correcting mask pattern,...
- Publication number 20060018529
- Publication date Jan 26, 2006
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and method for correcting pattern dimension and photo mas...
- Publication number 20050233226
- Publication date Oct 20, 2005
- FUJITSU LIMITED
- Morimi Osawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Local flare correction
- Publication number 20050225736
- Publication date Oct 13, 2005
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask
- Publication number 20050095513
- Publication date May 5, 2005
- FUJITSU LIMITED
- Teruyoshi Yao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and equipment for simulation
- Publication number 20050050490
- Publication date Mar 3, 2005
- FUJITSU LIMITED
- Hiroki Futatsuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for detecting pattern defect of the same, and met...
- Publication number 20040023128
- Publication date Feb 5, 2004
- FUJITSU LIMITED
- Tomohiko Yamamoto
- G06 - COMPUTING CALCULATING COUNTING

Satoru Asai

Person

Patents Grantslast 30 patents

Mask pattern correction device, method of correcting mask pattern,...

Pattern forming method and method for manufacturing semiconductor d...

Mask pattern correction device, method of correcting mask pattern,...

Creating method of photomask pattern data, photomask created by usi...

Mask pattern correction device, method of correcting mask pattern,...

Local flare correction

Apparatus and method for correcting pattern dimension and photo mas...

Method and equipment for simulation

Photomask, method for detecting pattern defect of the same, and met...

Photomask, method for detecting pattern defect of the same, and met...

Optical exposure method

Optical exposure method

Levenson type phase shift photomask and manufacture method of semic...

Patterned mask having a transparent etching stopper layer

Semiconductor device having a regrowth crystal region

Optical exposure method

Phase shift optical mask and method of correcting defects in optica...

Optical exposure method

Optical mask and exposure method using the optical mask

Optical mask using phase shift and method of producing the same

Projection exposure method and an optical mask for use in projectio...

Photomask and method of fabricating the same

Patents Applicationslast 30 patents

Mask Pattern Correction Device, Method of Correcting Mask Pattern,...

MASK PATTERN CORRECTION DEVICE, METHOD OF CORRECTING MASK PATTERN,...

CREATING METHOD OF PHOTOMASK PATTERN DATA, PHOTOMASK CREATED BY USI...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...

Pattern forming method and method for manufacturing semiconductor d...

Photomask, method for detecting pattern defect of the same, and met...

Mask pattern correction device, method of correcting mask pattern,...

Apparatus and method for correcting pattern dimension and photo mas...

Local flare correction

Photomask

Method and equipment for simulation

Photomask, method for detecting pattern defect of the same, and met...