Satoru YAMAKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 12,068,189
- Issue date Aug 20, 2024
- Ebara Corporation
- Satoru Yamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,958,163
- Issue date Apr 16, 2024
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D1021832
- Issue date Apr 9, 2024
- Ebara Corporation
- Kenichi Akazawa
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus and method of controlling inclination of statio...
- Patent number 11,745,306
- Issue date Sep 5, 2023
- Ebara Corporation
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,731,235
- Issue date Aug 22, 2023
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D989012
- Issue date Jun 13, 2023
- Ebara Corporation
- Kenichi Akazawa
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,179,823
- Issue date Nov 23, 2021
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 11,088,011
- Issue date Aug 10, 2021
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D918161
- Issue date May 4, 2021
- Ebara Corporation
- Shingo Togashi
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holding apparatus, substrate suction determination method...
- Patent number 10,991,613
- Issue date Apr 27, 2021
- Ebara Corporation
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D913977
- Issue date Mar 23, 2021
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus
- Patent number 10,702,972
- Issue date Jul 7, 2020
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing method, top ring, and substrate polishing appar...
- Patent number 10,464,185
- Issue date Nov 5, 2019
- Ebara Corporation
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D859332
- Issue date Sep 10, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus, control method and recording medium
- Patent number 10,391,603
- Issue date Aug 27, 2019
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 10,213,896
- Issue date Feb 26, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D839224
- Issue date Jan 29, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing device and polishing method
- Patent number 9,999,956
- Issue date Jun 19, 2018
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D813180
- Issue date Mar 20, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D808349
- Issue date Jan 23, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holder, polishing apparatus, polishing method, and retain...
- Patent number 9,815,171
- Issue date Nov 14, 2017
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate retaining ring
- Patent number D799437
- Issue date Oct 10, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Retainer ring for substrate
- Patent number D794585
- Issue date Aug 15, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate retaining ring
- Patent number D793976
- Issue date Aug 8, 2017
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holder, polishing apparatus, and polishing method
- Patent number 9,662,764
- Issue date May 30, 2017
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 9,573,244
- Issue date Feb 21, 2017
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D770990
- Issue date Nov 8, 2016
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D769200
- Issue date Oct 18, 2016
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate retaining ring
- Patent number D766849
- Issue date Sep 20, 2016
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF CREATING RESPONSIVENESS PROFILE OF POLISHING RATE OF WORK...
- Publication number 20240253181
- Publication date Aug 1, 2024
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF CREATING RESPONSIVE PROFILE OF POLISHING RATE OF WORKPIEC...
- Publication number 20240198480
- Publication date Jun 20, 2024
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20220048157
- Publication date Feb 17, 2022
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20210335650
- Publication date Oct 28, 2021
- EBARA CORPORATION
- Satoru YAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...
- Publication number 20210217647
- Publication date Jul 15, 2021
- EBARA CORPORATION
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS
- Publication number 20200361056
- Publication date Nov 19, 2020
- EBARA CORPORATION
- Makoto Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200206867
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...
- Publication number 20200206868
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...
- Publication number 20200043773
- Publication date Feb 6, 2020
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20180301367
- Publication date Oct 18, 2018
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20180117730
- Publication date May 3, 2018
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...
- Publication number 20170266779
- Publication date Sep 21, 2017
- EBARA CORPORATION
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM
- Publication number 20170173756
- Publication date Jun 22, 2017
- EBARA CORPORATION
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20170144267
- Publication date May 25, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING DEVICE AND POLISHING METHOD
- Publication number 20150273650
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20150273657
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...
- Publication number 20150133038
- Publication date May 14, 2015
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND METHOD
- Publication number 20150093968
- Publication date Apr 2, 2015
- EBARA CORPORATION
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND METHOD
- Publication number 20150093971
- Publication date Apr 2, 2015
- EBARA CORPORATION
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS
- Publication number 20140370794
- Publication date Dec 18, 2014
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20130324012
- Publication date Dec 5, 2013
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20130196573
- Publication date Aug 1, 2013
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE
- Publication number 20130136884
- Publication date May 30, 2013
- EBARA CORPORATION
- Hozumi YASUDA
- B32 - LAYERED PRODUCTS
Information Patent Application
POLISHING APPARATUS AND METHOD
- Publication number 20120058709
- Publication date Mar 8, 2012
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for dressing polishing pad, profile measuring...
- Publication number 20090137190
- Publication date May 28, 2009
- EBARA CORPORATION
- Tetsuji Togawa
- B24 - GRINDING POLISHING

Satoru YAMAKI

Person

Patents Grantslast 30 patents

Polishing apparatus

Elastic membrane, substrate holding device, and polishing apparatus

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane

Polishing apparatus and method of controlling inclination of statio...

Polishing apparatus and polishing method

Elastic membrane

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane, substrate holding device, and polishing apparatus

Elastic membrane

Substrate holding apparatus, substrate suction determination method...

Elastic membrane for semiconductor wafer polishing

Polishing apparatus

Substrate polishing method, top ring, and substrate polishing appar...

Elastic membrane for semiconductor wafer polishing

Polishing apparatus, control method and recording medium

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing

Polishing device and polishing method

Elastic membrane for semiconductor wafer polishing apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Substrate holder, polishing apparatus, polishing method, and retain...

Substrate retaining ring

Retainer ring for substrate

Substrate retaining ring

Substrate holder, polishing apparatus, and polishing method

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Substrate retaining ring

Patents Applicationslast 30 patents

METHOD OF CREATING RESPONSIVENESS PROFILE OF POLISHING RATE OF WORK...

METHOD OF CREATING RESPONSIVE PROFILE OF POLISHING RATE OF WORKPIEC...

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...

SUBSTRATE HOLDING APPARATUS, SUBSTRATE SUCTION DETERMINATION METHOD...

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...

POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

POLISHING DEVICE AND POLISHING METHOD

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...

POLISHING APPARATUS AND METHOD

POLISHING APPARATUS AND METHOD

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD

ELASTIC MEMBRANE

POLISHING APPARATUS AND METHOD

Method and apparatus for dressing polishing pad, profile measuring...