Satoshi Kaneko

Person

Koshi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate liquid processing apparatus
- Patent number 11,441,225
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Kazuki Motomatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrolytic processing jig and electrolytic processing method
- Patent number 11,427,920
- Issue date Aug 30, 2022
- Tokyo Electron Limited
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Substrate processing apparatus, substrate processing method and rec...
- Patent number 10,689,762
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Akira Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 10,584,420
- Issue date Mar 10, 2020
- Tokyo Electron Limited
- Kazuki Motomatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat exchange system, and substrate processing apparatus having same
- Patent number 10,081,033
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and sto...
- Patent number 9,822,453
- Issue date Nov 21, 2017
- Tokyo Electron Limited
- Satoshi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method, and co...
- Patent number 9,675,992
- Issue date Jun 13, 2017
- Tokyo Electron Limited
- Yoshihiro Kawaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 9,564,347
- Issue date Feb 7, 2017
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 9,242,279
- Issue date Jan 26, 2016
- Tokyo Electron Limited
- Satoshi Kaneko
- B08 - CLEANING
Information Patent Grant
Two-fluid nozzle and substrate liquid processing apparatus and subs...
- Patent number 9,214,365
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Yoshihiro Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid treatment apparatus with lift pin plate
- Patent number 9,048,269
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid cleaning apparatus with controlled liquid port eje...
- Patent number 9,022,045
- Issue date May 5, 2015
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,617,318
- Issue date Dec 31, 2013
- Tokyo Electron Limited
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positioning apparatus, a substrate processing apparatus and method...
- Patent number 8,550,470
- Issue date Oct 8, 2013
- Tokyo Electron Limited
- Yoshifumi Amano
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Porous member
- Patent number 8,409,482
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Jiro Higashijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Functional member having surface cleanliness
- Patent number 8,313,536
- Issue date Nov 20, 2012
- Tokyo Electron Limited
- Jiro Higashijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,051,862
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 7,998,308
- Issue date Aug 16, 2011
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing system
- Patent number 7,849,864
- Issue date Dec 14, 2010
- Tokyo Electron Limited
- Kazuhisa Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 7,793,610
- Issue date Sep 14, 2010
- Tokyo Electron Limited
- Masami Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positioning device and positioning method
- Patent number 6,052,913
- Issue date Apr 25, 2000
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate transporting and processing system
- Patent number 6,009,890
- Issue date Jan 4, 2000
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,271,788
- Issue date Dec 21, 1993
- Tokyo Electron Limited
- Makoto Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for forming reduced pressure and for processing object
- Patent number 5,223,113
- Issue date Jun 29, 1993
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and transporting device used in the same
- Patent number 5,211,795
- Issue date May 18, 1993
- Tokyo Electron Limited
- Yukimasa Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conveying apparatus
- Patent number 5,195,866
- Issue date Mar 23, 1993
- Tokyo Electron Limited
- Isahiro Hasegawa
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Pressure-reduced chamber system having a filter means
- Patent number 5,178,638
- Issue date Jan 12, 1993
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment system having gate device for decompression chamber
- Patent number 5,150,882
- Issue date Sep 29, 1992
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20220396882
- Publication date Dec 15, 2022
- TOKYO ELECTRON LIMITED
- Satoshi KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220154342
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Katsuhiro Morikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220056590
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Satoshi Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20220049356
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20210172066
- Publication date Jun 10, 2021
- TOKYO ELECTRON LIMITED
- Kazuki Motomatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD
- Publication number 20190233963
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Tomohisa Hoshino
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180010252
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Akira Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20180002811
- Publication date Jan 4, 2018
- TOKYO ELECTRON LIMITED
- Kazuki Motomatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...
- Publication number 20160375462
- Publication date Dec 29, 2016
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
HEAT EXCHANGE SYSTEM, AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
- Publication number 20150190838
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CO...
- Publication number 20150165471
- Publication date Jun 18, 2015
- TOKYO ELECTRON LIMITED
- Yoshihiro Kawaguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20150159276
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20140053882
- Publication date Feb 27, 2014
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO-FLUID NOZZLE AND SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBS...
- Publication number 20120325274
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Yoshihiro Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20120298147
- Publication date Nov 29, 2012
- Satoshi KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUT...
- Publication number 20120260947
- Publication date Oct 18, 2012
- Satoshi KANEKO
- B08 - CLEANING
Information Patent Application
TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE...
- Publication number 20120227770
- Publication date Sep 13, 2012
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160278
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT APPARATUS AND METHOD
- Publication number 20120160275
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIONING APPARATUS, A SUBSTRATE PROCESSING APPARATUS AND METHOD...
- Publication number 20110308067
- Publication date Dec 22, 2011
- TOKYO ELECTRON LIMITED
- Yoshifumi AMANO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20110048468
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Yoshifumi Amano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POROUS MEMBER
- Publication number 20110011793
- Publication date Jan 20, 2011
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FUNCTIONAL MEMBER HAVING SURFACE CLEANLINESS
- Publication number 20100204393
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Liquid Processing Apparatus and liquid Processing Method
- Publication number 20100144158
- Publication date Jun 10, 2010
- Norihiro Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing system
- Publication number 20080023049
- Publication date Jan 31, 2008
- TOKYO ELECTRON LIMITED
- Kazuhisa Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus
- Publication number 20070240638
- Publication date Oct 18, 2007
- TOKYO ELECTRON LIMITED
- Masami Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid processing apparatus
- Publication number 20070240824
- Publication date Oct 18, 2007
- TOKYO ELECTRON LIMITED
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS

Satoshi Kaneko

Person

Patents Grantslast 30 patents

Substrate liquid processing apparatus

Electrolytic processing jig and electrolytic processing method

Substrate processing apparatus, substrate processing method and rec...

Substrate liquid processing apparatus, substrate liquid processing...

Heat exchange system, and substrate processing apparatus having same

Substrate processing apparatus, substrate processing method and sto...

Substrate processing apparatus, substrate processing method, and co...

Liquid processing apparatus and liquid processing method

Liquid processing apparatus and liquid processing method

Two-fluid nozzle and substrate liquid processing apparatus and subs...

Substrate liquid treatment apparatus with lift pin plate

Substrate liquid cleaning apparatus with controlled liquid port eje...

Liquid processing apparatus and liquid processing method

Positioning apparatus, a substrate processing apparatus and method...

Porous member

Functional member having surface cleanliness

Liquid processing apparatus and liquid processing method

Liquid processing apparatus

Liquid processing system

Liquid processing apparatus

Positioning device and positioning method

Substrate transporting and processing system

Plasma processing apparatus

Apparatus for forming reduced pressure and for processing object

Plasma etching apparatus and transporting device used in the same

Conveying apparatus

Pressure-reduced chamber system having a filter means

Treatment system having gate device for decompression chamber

Patents Applicationslast 30 patents

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE LIQUID PROCESSING APPARATUS

ELECTROLYTIC PROCESSING JIG AND ELECTROLYTIC PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...

HEAT EXCHANGE SYSTEM, AND SUBSTRATE PROCESSING APPARATUS HAVING SAME

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND CO...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

TWO-FLUID NOZZLE AND SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBS...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUT...

TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE...

LIQUID TREATMENT APPARATUS AND METHOD

LIQUID TREATMENT APPARATUS AND METHOD

POSITIONING APPARATUS, A SUBSTRATE PROCESSING APPARATUS AND METHOD...

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

POROUS MEMBER

FUNCTIONAL MEMBER HAVING SURFACE CLEANLINESS

Liquid Processing Apparatus and liquid Processing Method

Liquid processing system

Liquid processing apparatus

Liquid processing apparatus