Satoshi Takechi

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device, and method of forming...
- Patent number 8,257,909
- Issue date Sep 4, 2012
- Fujitsu Semiconductor Limited
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,465,529
- Issue date Dec 16, 2008
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 7,179,580
- Issue date Feb 20, 2007
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist composition and method for forming patt...
- Patent number 7,129,017
- Issue date Oct 31, 2006
- Fujitsu Limited
- Hajime Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing semiconductor device and method of forming...
- Patent number 7,060,635
- Issue date Jun 13, 2006
- Fujitsu Limited
- Akihiko Otoguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified resist composition and method for forming patt...
- Patent number 6,902,859
- Issue date Jun 7, 2005
- Fujitsu Limited
- Hajime Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multi-layered resist structure and manufacturing method of semicond...
- Patent number 6,887,649
- Issue date May 3, 2005
- Fujitsu Limited
- Akihiko Otoguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material and method for forming a resist pattern with the re...
- Patent number 6,790,580
- Issue date Sep 14, 2004
- Fujitsu Limited
- Satoshi Takechi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,790,589
- Issue date Sep 14, 2004
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for the formation of resist patterns
- Patent number 6,699,645
- Issue date Mar 2, 2004
- Fujitsu Limited
- Makoto Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,344,304
- Issue date Feb 5, 2002
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,329,125
- Issue date Dec 11, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation process for esters and resist materials
- Patent number 6,248,920
- Issue date Jun 19, 2001
- Fujitsu Limited
- Satoshi Takechi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material and process for the formation...
- Patent number 6,207,342
- Issue date Mar 27, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,200,725
- Issue date Mar 13, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with bleaching effect
- Patent number 6,120,977
- Issue date Sep 19, 2000
- Fujitsu Limited
- Yuko Kaimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,013,416
- Issue date Jan 11, 2000
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive material and method for forming pattern
- Patent number 6,004,720
- Issue date Dec 21, 1999
- Fujitsu Limited
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 5,968,713
- Issue date Oct 19, 1999
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist patterns by using an ammonium or morpholi...
- Patent number 5,879,851
- Issue date Mar 9, 1999
- Fujitsu Limited
- Makoto Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material including si-containing resist having acid removabl...
- Patent number 5,856,071
- Issue date Jan 5, 1999
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and process for forming res...
- Patent number 5,506,088
- Issue date Apr 9, 1996
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation material and pattern formation method
- Patent number 5,443,690
- Issue date Aug 22, 1995
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for formation of resist patterns
- Patent number 5,403,699
- Issue date Apr 4, 1995
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming resist pattern
- Patent number 5,326,670
- Issue date Jul 5, 1994
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method and radiation resist for use when working th...
- Patent number 5,192,643
- Issue date Mar 9, 1993
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern formation process
- Patent number 5,153,103
- Issue date Oct 6, 1992
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material for energy beam lithography and method of using the...
- Patent number 5,104,479
- Issue date Apr 14, 1992
- Fujitsu Limited
- Akiko Kotachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing of semiconductor device and pattern-forming c...
- Patent number 5,087,551
- Issue date Feb 11, 1992
- Fujitsu Limited
- Yuko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for production of semiconductor device
- Patent number 5,068,169
- Issue date Nov 26, 1991
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20070037090
- Publication date Feb 15, 2007
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified resist composition and method for forming patt...
- Publication number 20050175936
- Publication date Aug 11, 2005
- FUJITSU LIMITED
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20040202961
- Publication date Oct 14, 2004
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of manufacturing semiconductor device, and method of forming...
- Publication number 20040043332
- Publication date Mar 4, 2004
- FUJITSU LIMITED
- Hajime Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device and method of forming...
- Publication number 20040033444
- Publication date Feb 19, 2004
- Akihiko Otoguro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and method for forming a resist pattern with the re...
- Publication number 20030143483
- Publication date Jul 31, 2003
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-layered resist structure and manufacturing method of semicond...
- Publication number 20020192595
- Publication date Dec 19, 2002
- FUJITSU LIMITED
- Akihiko Otoguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemically amplified resist composition and method for forming patt...
- Publication number 20020150834
- Publication date Oct 17, 2002
- FUJITSU LIMITED
- Hajime Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Radiation sensitive material and method for forming pattern
- Publication number 20020076645
- Publication date Jun 20, 2002
- FUJITSU LIMITED
- Satoshi Takechi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified resist compositions and process for the format...
- Publication number 20010003640
- Publication date Jun 14, 2001
- FUJITSU LIMITED
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THE FORMATION OF RESIST PATTERNS
- Publication number 20010001703
- Publication date May 24, 2001
- Makoto Takahashi
- MAKOTO TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Satoshi Takechi

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device, and method of forming...

Radiation sensitive material and method for forming pattern

Radiation sensitive material and method for forming pattern

Chemically amplified resist composition and method for forming patt...

Method of manufacturing semiconductor device and method of forming...

Chemically amplified resist composition and method for forming patt...

Multi-layered resist structure and manufacturing method of semicond...

Resist material and method for forming a resist pattern with the re...

Radiation sensitive material and method for forming pattern

Method for the formation of resist patterns

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

Preparation process for esters and resist materials

Chemically amplified resist material and process for the formation...

Chemically amplified resist compositions and process for the format...

Photoresist with bleaching effect

Chemically amplified resist compositions and process for the format...

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

Method for forming resist patterns by using an ammonium or morpholi...

Resist material including si-containing resist having acid removabl...

Chemically amplified resist composition and process for forming res...

Pattern formation material and pattern formation method

Process for formation of resist patterns

Process for forming resist pattern

Pattern-forming method and radiation resist for use when working th...

Resist composition and pattern formation process

Resist material for energy beam lithography and method of using the...

Process for preparing of semiconductor device and pattern-forming c...

Process for production of semiconductor device

Patents Applicationslast 30 patents

Radiation sensitive material and method for forming pattern

Chemically amplified resist composition and method for forming patt...

Radiation sensitive material and method for forming pattern

Method of manufacturing semiconductor device, and method of forming...

Method of manufacturing semiconductor device and method of forming...

Resist material and method for forming a resist pattern with the re...

Multi-layered resist structure and manufacturing method of semicond...

Chemically amplified resist composition and method for forming patt...

Radiation sensitive material and method for forming pattern

Chemically amplified resist compositions and process for the format...

METHOD FOR THE FORMATION OF RESIST PATTERNS