Scott Edward Fuller

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Endpointing for focused ion beam processing
- Patent number 10,529,538
- Issue date Jan 7, 2020
- FEI Company
- Scott Edward Fuller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpointing for focused ion beam processing
- Patent number 10,204,762
- Issue date Feb 12, 2019
- FEI Company
- Scott Edward Fuller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation of lamellae for TEM viewing
- Patent number 10,068,749
- Issue date Sep 4, 2018
- FEI Company
- Scott Edward Fuller
- G01 - MEASURING TESTING
Information Patent Grant
Three dimensional fiducial
- Patent number 8,822,957
- Issue date Sep 2, 2014
- FEI Company
- Cliff Bugge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three dimensional fiducial
- Patent number 8,502,172
- Issue date Aug 6, 2013
- FEI Company
- Cliff Bugge
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of producing a patterned photoresist used to prepare high pe...
- Patent number 7,208,249
- Issue date Apr 24, 2007
- Applied Materials, Inc.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of increasing the shelf life of a blank photomask substrate
- Patent number 6,998,206
- Issue date Feb 14, 2006
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of preparing optically imaged high performance photomasks
- Patent number 6,703,169
- Issue date Mar 9, 2004
- Applied Materials, Inc.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
ENDPOINTING FOR FOCUSED ION BEAM PROCESSING
- Publication number 20190172680
- Publication date Jun 6, 2019
- FEI Company
- Scott Edward FULLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENDPOINTING FOR FOCUSED ION BEAM PROCESSING
- Publication number 20160126060
- Publication date May 5, 2016
- Scott Edward Fuller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System of Creating a Symmetrical FIB Deposition
- Publication number 20150369710
- Publication date Dec 24, 2015
- FEI Company
- Scott Edward Fuller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Three Dimensional Fiducial
- Publication number 20130344292
- Publication date Dec 26, 2013
- FEI Company
- Cliff Bugge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREPARATION OF LAMELLAE FOR TEM VIEWING
- Publication number 20130319849
- Publication date Dec 5, 2013
- FEI Company
- Scott Edward Fuller
- G01 - MEASURING TESTING
Information Patent Application
Method of increasing the shelf life of a blank photomask substrate
- Publication number 20040146790
- Publication date Jul 29, 2004
- Scott Fuller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing a patterned photoresist used to prepare high pe...
- Publication number 20040063003
- Publication date Apr 1, 2004
- APPLIED MATERIALS, INC.
- Melvin Warren Montgomery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of preparing optically imaged high performance photomasks
- Publication number 20030027083
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Scott Fuller
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Scott Edward Fuller

Person

Patents Grantslast 30 patents

Endpointing for focused ion beam processing

Endpointing for focused ion beam processing

Preparation of lamellae for TEM viewing

Three dimensional fiducial

Three dimensional fiducial

Method of producing a patterned photoresist used to prepare high pe...

Method of increasing the shelf life of a blank photomask substrate

Method of preparing optically imaged high performance photomasks

Patents Applicationslast 30 patents

ENDPOINTING FOR FOCUSED ION BEAM PROCESSING

ENDPOINTING FOR FOCUSED ION BEAM PROCESSING

Method and System of Creating a Symmetrical FIB Deposition

Three Dimensional Fiducial

PREPARATION OF LAMELLAE FOR TEM VIEWING

Method of increasing the shelf life of a blank photomask substrate

Method of producing a patterned photoresist used to prepare high pe...

Method of preparing optically imaged high performance photomasks