Seiichi WATANABE

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus, data processing apparatus and data pro...
- Patent number 11,605,530
- Issue date Mar 14, 2023
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fuel cell
- Patent number 11,417,892
- Issue date Aug 16, 2022
- HITACHI HIGH-TECH CORPORATION
- Noriyuki Sakuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 11,308,182
- Issue date Apr 19, 2022
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,783,220
- Issue date Sep 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus, data processing apparatus and data pro...
- Patent number 10,615,010
- Issue date Apr 7, 2020
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, data processing apparatus and processing ap...
- Patent number 10,073,818
- Issue date Sep 11, 2018
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Sample processing apparatus, sample processing system, and method f...
- Patent number 9,390,941
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing method
- Patent number 8,497,213
- Issue date Jul 30, 2013
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,142,674
- Issue date Mar 27, 2012
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,075,733
- Issue date Dec 13, 2011
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,807,581
- Issue date Oct 5, 2010
- Hitachi High-Technologies Corporation
- Susumu Tauchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus having high frequency power source with...
- Patent number 7,615,132
- Issue date Nov 10, 2009
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus using active matching
- Patent number 7,373,899
- Issue date May 20, 2008
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,169,255
- Issue date Jan 30, 2007
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing the surface of an insulating article, printer...
- Patent number 7,141,319
- Issue date Nov 28, 2006
- Sony Corporation
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 7,029,594
- Issue date Apr 18, 2006
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method with controlled biasing func...
- Patent number 6,875,366
- Issue date Apr 5, 2005
- Hitachi, Ltd.
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method using active matching
- Patent number 6,806,201
- Issue date Oct 19, 2004
- Hitachi, Ltd.
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,777,037
- Issue date Aug 17, 2004
- Hitachi, Ltd.
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Printer head
- Patent number 6,575,552
- Issue date Jun 10, 2003
- Sony Corporation
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing the surface of an insulating article
- Patent number 6,447,849
- Issue date Sep 10, 2002
- Sony Corporation
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Complex magnetic head and manufacturing method of complex magnetic...
- Patent number 6,400,530
- Issue date Jun 4, 2002
- Mitsubishi Denki K.K.
- Hirofumi Ouchi
- G11 - INFORMATION STORAGE
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,158,383
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of complex magnetic head core
- Patent number 6,088,909
- Issue date Jul 18, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Hirofumi Ouchi
- G11 - INFORMATION STORAGE
Information Patent Grant
Reduced profile magnetic head assembly and method of manufacturing...
- Patent number 5,999,498
- Issue date Dec 7, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Seiichi Handa
- G11 - INFORMATION STORAGE
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,914,051
- Issue date Jun 22, 1999
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic head device having increased dimensional accuracy and impr...
- Patent number 5,894,387
- Issue date Apr 13, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Naoto Sugawara
- G11 - INFORMATION STORAGE
Information Patent Grant
Surface wave plasma processing apparatus
- Patent number 5,886,473
- Issue date Mar 23, 1999
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,804,033
- Issue date Sep 8, 1998
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing method and apparatus
- Patent number 5,785,807
- Issue date Jul 28, 1998
- Hitachi, Ltd.
- Saburo Kanai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DOCUMENT PREPARATION SUPPORT DEVICE, DOCUMENT PREPARATION SUPPORT M...
- Publication number 20250110944
- Publication date Apr 3, 2025
- NEC Corporation
- Ryosuke WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FUEL BATTERY CELL AND FUEL BATTERY MODULE
- Publication number 20220069327
- Publication date Mar 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Yoshitaka SASAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fuel Cell
- Publication number 20210408556
- Publication date Dec 30, 2021
- Hitachi High-Tech Corporation
- Noriyuki SAKUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20200380066
- Publication date Dec 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Seiichi Watanabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20200203133
- Publication date Jun 25, 2020
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20180341625
- Publication date Nov 29, 2018
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...
- Publication number 20160336154
- Publication date Nov 17, 2016
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...
- Publication number 20150154145
- Publication date Jun 4, 2015
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS
- Publication number 20140220489
- Publication date Aug 7, 2014
- Hitachi High-Technologies Corporation
- Yutaka KOZUMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...
- Publication number 20120228261
- Publication date Sep 13, 2012
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20120145323
- Publication date Jun 14, 2012
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100043976
- Publication date Feb 25, 2010
- Hitachi High-Technologies Corporation
- Seiichi WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20090194506
- Publication date Aug 6, 2009
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD WITH CONTROLLED BIASING FUNC...
- Publication number 20090165955
- Publication date Jul 2, 2009
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080217295
- Publication date Sep 11, 2008
- SUSUMU TAUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20080182419
- Publication date Jul 31, 2008
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20070193976
- Publication date Aug 23, 2007
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH...
- Publication number 20070186856
- Publication date Aug 16, 2007
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method with controlled biasing func...
- Publication number 20050155711
- Publication date Jul 21, 2005
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus having high frequency power source with...
- Publication number 20050081999
- Publication date Apr 21, 2005
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus using active matching
- Publication number 20050034813
- Publication date Feb 17, 2005
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20040238490
- Publication date Dec 2, 2004
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040045673
- Publication date Mar 11, 2004
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20030168012
- Publication date Sep 11, 2003
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20030155075
- Publication date Aug 21, 2003
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for processing the surface of an insulating article, printer...
- Publication number 20020187278
- Publication date Dec 12, 2002
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for processing the surface of an insulating article, printer...
- Publication number 20020182340
- Publication date Dec 5, 2002
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20020114897
- Publication date Aug 22, 2002
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method using active matching
- Publication number 20020038631
- Publication date Apr 4, 2002
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method with controlled biasing func...
- Publication number 20020031617
- Publication date Mar 14, 2002
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Seiichi WATANABE

Person

Patents Grantslast 30 patents

Plasma processing apparatus, data processing apparatus and data pro...

Fuel cell

Data processing method, data processing apparatus and processing ap...

Data processing method, data processing apparatus and processing ap...

Plasma processing apparatus, data processing apparatus and data pro...

Data processing method, data processing apparatus and processing ap...

Sample processing apparatus, sample processing system, and method f...

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus having high frequency power source with...

Plasma processing apparatus using active matching

Plasma processing apparatus

Method for processing the surface of an insulating article, printer...

Plasma processing method

Plasma processing apparatus and method with controlled biasing func...

Plasma processing apparatus and method using active matching

Plasma processing method and apparatus

Printer head

Method for processing the surface of an insulating article

Complex magnetic head and manufacturing method of complex magnetic...

Plasma processing method and apparatus

Manufacturing method of complex magnetic head core

Reduced profile magnetic head assembly and method of manufacturing...

Microwave plasma processing method and apparatus

Magnetic head device having increased dimensional accuracy and impr...

Surface wave plasma processing apparatus

Microwave plasma processing method and apparatus

Microwave plasma processing method and apparatus

Patents Applicationslast 30 patents

DOCUMENT PREPARATION SUPPORT DEVICE, DOCUMENT PREPARATION SUPPORT M...

FUEL BATTERY CELL AND FUEL BATTERY MODULE

Fuel Cell

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

PLASMA PROCESSING APPARATUS, DATA PROCESSING APPARATUS AND DATA PRO...

DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING AP...

METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS

SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...

Plasma Processing Apparatus and Plasma Processing Method

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus And Plasma Processing Method

PLASMA PROCESSING APPARATUS AND METHOD WITH CONTROLLED BIASING FUNC...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

Plasma processing apparatus and plasma processing method

PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH...

Plasma processing apparatus and method with controlled biasing func...

Plasma processing apparatus having high frequency power source with...

Plasma processing apparatus using active matching

Plasma processing method and apparatus

Plasma processing apparatus and plasma processing method

Plasma processing device and plasma processing method

Plasma processing apparatus and plasma processing method

Method for processing the surface of an insulating article, printer...

Method for processing the surface of an insulating article, printer...

Plasma processing method and apparatus

Plasma processing apparatus and method using active matching

Plasma processing apparatus and method with controlled biasing func...