Seiichiro SHIRAI

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of semiconductor device, exposure method, and...
- Patent number 8,557,611
- Issue date Oct 15, 2013
- Renesas Electronics Corporation
- Seiichiro Shirai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device, mask and semiconducto...
- Patent number 7,875,409
- Issue date Jan 25, 2011
- Renesas Electronics Corporation
- Shinroku Maejima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method or an exposing method for a semiconductor devi...
- Patent number RE37996
- Issue date Feb 18, 2003
- Hitachi, Ltd.
- Fumio Mizuno
- 430 - Radiation imagery chemistry: process, composition, or product thereof
Information Patent Grant
Process for the collective removal of resist material and side wall...
- Patent number 6,436,220
- Issue date Aug 20, 2002
- Nitto Denko Corporation
- Eiji Toyoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring aberration of projection lens, method for form...
- Patent number 6,329,112
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Hiroshi Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist removing method, and curable pressure-sensitive adhesive, ad...
- Patent number 5,959,011
- Issue date Sep 28, 1999
- Nitto Denko Corporation
- Fumio Mizuno
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Manufacturing method or an exposing method for a semiconductor devi...
- Patent number 5,736,300
- Issue date Apr 7, 1998
- Hitachi, Ltd.
- Fumio Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method or an exposing method for a semiconductor devi...
- Patent number 5,578,422
- Issue date Nov 26, 1996
- Hitachi, Ltd.
- Fumio Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist removing method, and curable pressure-sensitive adhesive, ad...
- Patent number 5,466,325
- Issue date Nov 14, 1995
- Nitto Denko Corporation
- Fumio Mizuno
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Manufacturing method or an exposing method for a semiconductor devi...
- Patent number 5,436,095
- Issue date Jul 25, 1995
- Hitachi, Ltd.
- Fumio Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method and apparatus
- Patent number 5,405,810
- Issue date Apr 11, 1995
- Hitachi, Ltd.
- Fumio Mizuno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming process with dry etching
- Patent number 4,835,089
- Issue date May 30, 1989
- Hitachi, Ltd.
- Takao Iwayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, EXPOSURE METHOD FOR EXPO...
- Publication number 20120156623
- Publication date Jun 21, 2012
- RENESAS ELECTRONICS CORPORATION
- Seiichiro SHIRAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, EXPOSURE METHOD, AND...
- Publication number 20120156809
- Publication date Jun 21, 2012
- RENESAS ELECTRONICS CORPORATION
- Seiichiro SHIRAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, MASK AND SEMICONDUCTO...
- Publication number 20110074049
- Publication date Mar 31, 2011
- RENESAS ELECTRONICS CORPORATION
- Shinroku Maejima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device, mask and semiconducto...
- Publication number 20070134564
- Publication date Jun 14, 2007
- Shinroku Maejima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Seiichiro SHIRAI

Person

Patents Grantslast 30 patents

Manufacturing method of semiconductor device, exposure method, and...

Method of manufacturing semiconductor device, mask and semiconducto...

Manufacturing method or an exposing method for a semiconductor devi...

Process for the collective removal of resist material and side wall...

Method for measuring aberration of projection lens, method for form...

Resist removing method, and curable pressure-sensitive adhesive, ad...

Manufacturing method or an exposing method for a semiconductor devi...

Manufacturing method or an exposing method for a semiconductor devi...

Resist removing method, and curable pressure-sensitive adhesive, ad...

Manufacturing method or an exposing method for a semiconductor devi...

Alignment method and apparatus

Resist pattern forming process with dry etching

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, EXPOSURE METHOD FOR EXPO...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, EXPOSURE METHOD, AND...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, MASK AND SEMICONDUCTO...

Method of manufacturing semiconductor device, mask and semiconducto...