Seiji Okura

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
CVD apparatus and method of cleaning the CVD apparatus
- Patent number 8,277,560
- Issue date Oct 2, 2012
- National Institute of Advanced Industrial Science and Technology
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device for cleaning CVD device and method of cleaning CVD device
- Patent number 8,043,438
- Issue date Oct 25, 2011
- National Institute of Advanced Industrial Science and Technology
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device with a fluorinated silicate glass film as an i...
- Patent number 7,012,336
- Issue date Mar 14, 2006
- Renesas Technology Corp.
- Seiji Okura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having passivation fil...
- Patent number 6,759,317
- Issue date Jul 6, 2004
- Renesas Technology Corp.
- Hiroshi Tobimatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with a fluorinated silicate glass film as an i...
- Patent number 6,579,787
- Issue date Jun 17, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Seiji Okura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for cleaning of a CVD reactor
- Publication number 20090269506
- Publication date Oct 29, 2009
- Seiji Okura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SELF-CLEANING OF CARBON-BASED FILM
- Publication number 20090090382
- Publication date Apr 9, 2009
- ASM JAPAN K.K.
- Yoshinori Morisada
- B08 - CLEANING
Information Patent Application
Coated aluminum material for semiconductor manufacturing apparatus
- Publication number 20080118412
- Publication date May 22, 2008
- ASM JAPAN K.K.
- Seiji Okura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF SELF-CLEANING OF CARBON-BASED FILM
- Publication number 20070248767
- Publication date Oct 25, 2007
- ASM JAPAN K.K.
- Seiji Okura
- B08 - CLEANING
Information Patent Application
Device for cleaning cvd device and method of cleaning cvd device
- Publication number 20060207630
- Publication date Sep 21, 2006
- RESEARCH INST. OF INNOVATIVE TECH. FOR THE EARTH
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd apparatus and method for cleaning cvd apparatus
- Publication number 20060201533
- Publication date Sep 14, 2006
- RESEARCH INST. OF INNOVATIVE TECH. FOR THE EARTH
- Etsuo Wani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device with a fluorinated silicate glass film as an i...
- Publication number 20060081992
- Publication date Apr 20, 2006
- Renesas Technology Corp.
- Seiji Okura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cvd apparatus having means for cleaning with fluorine gas and metho...
- Publication number 20050252451
- Publication date Nov 17, 2005
- Tatsuro Beppu
- B08 - CLEANING
Information Patent Application
Cvd apparatus and method of cleaning the cvd apparatus
- Publication number 20040255854
- Publication date Dec 23, 2004
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd apparatus and method of cleaning the cvd apparatus
- Publication number 20040250775
- Publication date Dec 16, 2004
- Katsuo Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device with a fluorinated silicate glass film as an i...
- Publication number 20030211721
- Publication date Nov 13, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Seiji Okura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device having passivation fil...
- Publication number 20020090809
- Publication date Jul 11, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Hiroshi Tobimatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device with a fluorinated silicate glass film as an i...
- Publication number 20020024145
- Publication date Feb 28, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Seiji Okura
- H01 - BASIC ELECTRIC ELEMENTS

Seiji Okura

Person

Patents Grantslast 30 patents

CVD apparatus and method of cleaning the CVD apparatus

Device for cleaning CVD device and method of cleaning CVD device

Semiconductor device with a fluorinated silicate glass film as an i...

Method of manufacturing semiconductor device having passivation fil...

Semiconductor device with a fluorinated silicate glass film as an i...

Patents Applicationslast 30 patents

Method and apparatus for cleaning of a CVD reactor

METHOD OF SELF-CLEANING OF CARBON-BASED FILM

Coated aluminum material for semiconductor manufacturing apparatus

METHOD OF SELF-CLEANING OF CARBON-BASED FILM

Device for cleaning cvd device and method of cleaning cvd device

Cvd apparatus and method for cleaning cvd apparatus

Semiconductor device with a fluorinated silicate glass film as an i...

Cvd apparatus having means for cleaning with fluorine gas and metho...

Cvd apparatus and method of cleaning the cvd apparatus

Cvd apparatus and method of cleaning the cvd apparatus

Semiconductor device with a fluorinated silicate glass film as an i...

Method of manufacturing semiconductor device having passivation fil...

Semiconductor device with a fluorinated silicate glass film as an i...