Seishi Fujiwara

Person

Sagamihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
CaF2 polycrystalline body, focus ring, plasma processing apparatus,...
- Patent number 9,580,331
- Issue date Feb 28, 2017
- Nikon Corporation
- Seishi Fujiwara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Quartz glass member and projection aligner
- Patent number 6,835,683
- Issue date Dec 28, 2004
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical member made of silica glass, method for manufacturing silic...
- Patent number 6,649,268
- Issue date Nov 18, 2003
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
UV synthetic silica glass optical member and reduction projection e...
- Patent number 6,587,262
- Issue date Jul 1, 2003
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical system with improved durability for projection exposure app...
- Patent number 6,587,181
- Issue date Jul 1, 2003
- Nikon Corporation
- Hiroki Jinbo
- G02 - OPTICS
Information Patent Grant
Forming method of silica glass and forming apparatus thereof
- Patent number 6,505,484
- Issue date Jan 14, 2003
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass member
- Patent number 6,473,226
- Issue date Oct 29, 2002
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic silica glass and its manufacturing method
- Patent number 6,442,973
- Issue date Sep 3, 2002
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Manufacturing method of synthetic silica glass
- Patent number 6,378,340
- Issue date Apr 30, 2002
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass and its manufacturing method
- Patent number 6,374,639
- Issue date Apr 23, 2002
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Optical system with improved durability for projection exposure app...
- Patent number 6,373,554
- Issue date Apr 16, 2002
- Nikon Corporation
- Hiroki Jinbo
- G02 - OPTICS
Information Patent Grant
Silica glass having superior durability against excimer laser beams...
- Patent number 6,339,033
- Issue date Jan 15, 2002
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass and its manufacturing method
- Patent number 6,291,377
- Issue date Sep 18, 2001
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass having superior durability against excimer laser beams...
- Patent number 6,174,830
- Issue date Jan 16, 2001
- Nikon Corporation
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Manufacturing method of synthetic silica glass
- Patent number 6,094,940
- Issue date Aug 1, 2000
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for estimating durability of optical member against excimer...
- Patent number 6,075,607
- Issue date Jun 13, 2000
- Nikon Corporation
- Hiroki Jinbo
- G01 - MEASURING TESTING
Information Patent Grant
Image-focusing optical system for ultraviolet laser
- Patent number 6,061,174
- Issue date May 9, 2000
- Nikon Corporation
- Masaki Shiozawa
- C30 - CRYSTAL GROWTH
Information Patent Grant
Fluorine-containing silica glass
- Patent number 5,958,809
- Issue date Sep 28, 1999
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,703,712
- Issue date Dec 30, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,702,495
- Issue date Dec 30, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,699,183
- Issue date Dec 16, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- G02 - OPTICS
Information Patent Grant
Silica glass member for UV-lithography, method for silica glass pro...
- Patent number 5,696,624
- Issue date Dec 9, 1997
- Nikon Corporation
- Norio Komine
- G02 - OPTICS
Information Patent Grant
Method for producing silica glass for use with light in a vacuum ul...
- Patent number 5,679,125
- Issue date Oct 21, 1997
- Nikon Corporation
- Hiroyuki Hiraiwa
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
CaF2 POLYCRYSTALLINE BODY, FOCUS RING, PLASMA PROCESSING APPARATUS,...
- Publication number 20140079902
- Publication date Mar 20, 2014
- Nikon Corporation
- Seishi Fujiwara
- C30 - CRYSTAL GROWTH
Information Patent Application
Optical member made of silica glass, method for manufacturing silic...
- Publication number 20050284177
- Publication date Dec 29, 2005
- Nikon Corporation
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic quartz glass member and method for producing the same
- Publication number 20050047986
- Publication date Mar 3, 2005
- Nikon Corporation
- Masafumi Mizuguchi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Optical member made of silica glass, method for manufacturing silic...
- Publication number 20040095566
- Publication date May 20, 2004
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Quartz glass member and projection aligner
- Publication number 20030171203
- Publication date Sep 11, 2003
- Norio Komine
- G02 - OPTICS
Information Patent Application
Fluorine-containing silica glass and its method of manufacture
- Publication number 20030037568
- Publication date Feb 27, 2003
- NIKON CORPORATION
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Synthetic silica glass optical member and method of manufacturing t...
- Publication number 20020144517
- Publication date Oct 10, 2002
- Nikon Corporation
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Optical system with improved durability for projection exposure app...
- Publication number 20020135746
- Publication date Sep 26, 2002
- NIKON CORPORATION
- Hiroki Jinbo
- G02 - OPTICS
Information Patent Application
Synthetic silica glass molding method, synthetic silica glass moldi...
- Publication number 20020050152
- Publication date May 2, 2002
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Silica glass and its manufacturing method
- Publication number 20020013208
- Publication date Jan 31, 2002
- NIKON CORPORATION
- Norio Komine
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Manufacturing method of synthetic silica glass
- Publication number 20020007649
- Publication date Jan 24, 2002
- Seishi Fujiwara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Silica glass having superior durability against excimer laser beams...
- Publication number 20010000508
- Publication date Apr 26, 2001
- NIKON CORPORATION
- Hiroki Jinbo
- C03 - GLASS MINERAL OR SLAG WOOL

Seishi Fujiwara

Person

Patents Grantslast 30 patents

CaF2 polycrystalline body, focus ring, plasma processing apparatus,...

Quartz glass member and projection aligner

Optical member made of silica glass, method for manufacturing silic...

UV synthetic silica glass optical member and reduction projection e...

Optical system with improved durability for projection exposure app...

Forming method of silica glass and forming apparatus thereof

Silica glass member

Synthetic silica glass and its manufacturing method

Manufacturing method of synthetic silica glass

Silica glass and its manufacturing method

Optical system with improved durability for projection exposure app...

Silica glass having superior durability against excimer laser beams...

Silica glass and its manufacturing method

Silica glass having superior durability against excimer laser beams...

Manufacturing method of synthetic silica glass

Method for estimating durability of optical member against excimer...

Image-focusing optical system for ultraviolet laser

Fluorine-containing silica glass

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Silica glass member for UV-lithography, method for silica glass pro...

Method for producing silica glass for use with light in a vacuum ul...

Patents Applicationslast 30 patents

CaF2 POLYCRYSTALLINE BODY, FOCUS RING, PLASMA PROCESSING APPARATUS,...

Optical member made of silica glass, method for manufacturing silic...

Synthetic quartz glass member and method for producing the same

Optical member made of silica glass, method for manufacturing silic...

Quartz glass member and projection aligner

Fluorine-containing silica glass and its method of manufacture

Synthetic silica glass optical member and method of manufacturing t...

Optical system with improved durability for projection exposure app...

Synthetic silica glass molding method, synthetic silica glass moldi...

Silica glass and its manufacturing method

Manufacturing method of synthetic silica glass

Silica glass having superior durability against excimer laser beams...