Senh THACH

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High temperature electrostatic chuck bonding adhesive
- Patent number 11,264,261
- Issue date Mar 1, 2022
- Applied Materials, Inc.
- Jennifer Y. Sun
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of processing a substrate support assembly
- Patent number 10,557,202
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Wendell Glen Boyd
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Real time monitoring with closed loop chucking force control
- Patent number 10,460,916
- Issue date Oct 29, 2019
- Applied Materials, Inc.
- Wendell Glenn Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixilated cooling, temperature controlled substrate support assembly
- Patent number 10,403,534
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with external flow adjustments for improved tem...
- Patent number 10,121,688
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Matthew J. Busche
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate support assembly having a plasma resistant protective layer
- Patent number 9,916,998
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control systems employing deflection sensors to control clamping fo...
- Patent number 9,875,923
- Issue date Jan 23, 2018
- Applied Materials, Inc.
- Wendell Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with external flow adjustments for improved tem...
- Patent number 9,622,375
- Issue date Apr 11, 2017
- Applied Materials, Inc.
- Matthew J. Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control systems employing deflection sensors to control clamping fo...
- Patent number 9,558,981
- Issue date Jan 31, 2017
- Applied Materials, Inc.
- Wendell Boyd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature electrostatic chuck bonding adhesive
- Patent number 9,520,314
- Issue date Dec 13, 2016
- Applied Materials, Inc.
- Jennifer Y. Sun
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck with internal flow adjustments for improved tem...
- Patent number 9,520,315
- Issue date Dec 13, 2016
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-body electrostatic chuck
- Patent number 8,941,969
- Issue date Jan 27, 2015
- Applied Materials, Inc.
- Senh Thach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing plasma arcing on surfaces of semiconductor proce...
- Patent number 8,871,312
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method of producing a plasma-resistant thermal oxide coating
- Patent number 8,758,858
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-resistant ceramics with controlled electrical resistivity
- Patent number 8,367,227
- Issue date Feb 5, 2013
- Applied Materials, Inc.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Wet clean process for recovery of anodized chamber parts
- Patent number 8,231,736
- Issue date Jul 31, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma resistant coatings for plasma chamber components
- Patent number 8,206,829
- Issue date Jun 26, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Erosion-resistant plasma chamber components comprising a metal base...
- Patent number 8,129,029
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Clean, dense yttrium oxide coating protecting semiconductor process...
- Patent number 8,067,067
- Issue date Nov 29, 2011
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-passivating plasma resistant material for joining chamber comp...
- Patent number 7,718,029
- Issue date May 18, 2010
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature aerosol deposition of a plasma resistive layer
- Patent number 7,479,464
- Issue date Jan 20, 2009
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas distribution plate fabricated from a solid yttrium oxide-compri...
- Patent number 7,479,304
- Issue date Jan 20, 2009
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with overhead RF source power electrode with low los...
- Patent number 7,220,937
- Issue date May 22, 2007
- Applied Materials, Inc.
- Daniel J. Hofman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus including plasma-resistant, weld...
- Patent number 7,055,732
- Issue date Jun 6, 2006
- Applied Materials, Inc.
- Senh Thach
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Halogen-resistant, anodized aluminum for use in semiconductor proce...
- Patent number 7,048,814
- Issue date May 23, 2006
- Applied Materials, Inc.
- Yixing Lin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Halogen-resistant, anodized aluminum for use in semiconductor proce...
- Patent number 7,033,447
- Issue date Apr 25, 2006
- Applied Materials, Inc.
- Yixing Lin
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
System level in-situ integrated dielectric etch process particularl...
- Patent number 6,949,203
- Issue date Sep 27, 2005
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for regulating temperature of a process kit in a semicond...
- Patent number 6,795,292
- Issue date Sep 21, 2004
- Dennis Grimard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Yttrium oxide based surface coating for semiconductor IC processing...
- Patent number 6,776,873
- Issue date Aug 17, 2004
- Jennifer Y Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature electrical connector
- Patent number 6,736,668
- Issue date May 18, 2004
- Arnold V. Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REAL TIME MONITORING WITH CLOSED LOOP CHUCKING FORCE CONTROL
- Publication number 20180330926
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Wendell Glenn BOYD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY HAVING A PLASMA RESISTANT PROTECTIVE LAYER
- Publication number 20180151401
- Publication date May 31, 2018
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...
- Publication number 20170213754
- Publication date Jul 27, 2017
- Matthew J. Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20170167018
- Publication date Jun 15, 2017
- Applied Materials, Inc.
- Wendell Glen BOYD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTROL SYSTEMS EMPLOYING DEFLECTION SENSORS TO CONTROL CLAMPING FO...
- Publication number 20170103911
- Publication date Apr 13, 2017
- Applied Materials, Inc.
- Wendell BOYD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE
- Publication number 20170092525
- Publication date Mar 30, 2017
- JENNIFER Y. SUN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ELECTROSTATIC CHUCK WITH INTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...
- Publication number 20150187626
- Publication date Jul 2, 2015
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...
- Publication number 20150187625
- Publication date Jul 2, 2015
- Matthew J. Busche
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIXILATED COOLING, TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20150129165
- Publication date May 14, 2015
- Applied Materials, Inc.
- Vijay D. PARKHE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE-BODY ELECTROSTATIC CHUCK
- Publication number 20140177123
- Publication date Jun 26, 2014
- Applied Materials, Inc.
- Senh Thach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY HAVING A PLASMA RESISTANT PROTECTIVE LAYER
- Publication number 20140154465
- Publication date Jun 5, 2014
- Applied Materials, Inc.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCK WITH REAL-TIME HEAT ZONE REGUL...
- Publication number 20130284374
- Publication date Oct 31, 2013
- Dmitry LUBOMIRSKY
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Method of reducing plasma arcing on surfaces of semiconductor proce...
- Publication number 20130022838
- Publication date Jan 24, 2013
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Method of producing a plasma-resistant thermal oxide coating
- Publication number 20120125488
- Publication date May 24, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION SHOWERHEAD WITH COATING MATERIAL FOR SEMICONDUCTOR...
- Publication number 20110198034
- Publication date Aug 18, 2011
- Jennifer Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE
- Publication number 20100156054
- Publication date Jun 24, 2010
- Applied Materials, Inc.
- Jennifer Y. Sun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILLED POLYMER COMPOSITION FOR ETCH CHAMBER COMPONENT
- Publication number 20100140222
- Publication date Jun 10, 2010
- Jennifer Y. Sun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PLASMA RESISTANT COATINGS FOR PLASMA CHAMBER COMPONENTS
- Publication number 20100119843
- Publication date May 13, 2010
- Applied Materials, Inc.
- JENNIFER Y. SUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ceramic coating comprising yttrium which is resistant to a reducing...
- Publication number 20090214825
- Publication date Aug 27, 2009
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Erosion resistant yttrium comprising metal with oxidized coating fo...
- Publication number 20090162647
- Publication date Jun 25, 2009
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Corrosion-resistant gas distribution plate for plasma processing ch...
- Publication number 20090087615
- Publication date Apr 2, 2009
- Jennifer Y. Sun
- C30 - CRYSTAL GROWTH
Information Patent Application
WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS
- Publication number 20090056745
- Publication date Mar 5, 2009
- Applied Materials, Inc.
- JENNIFER Y. SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma-resistant ceramics with controlled electrical resistivity
- Publication number 20090036292
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Method of coating semiconductor processing apparatus with protectiv...
- Publication number 20080213496
- Publication date Sep 4, 2008
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE AEROSOL DEPOSITION OF A PLASMA RESISTIVE LAYER
- Publication number 20080108225
- Publication date May 8, 2008
- JENNIFER Y. SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-PASSIVATING PLASMA RESISTANT MATERIAL FOR JOINING CHAMBER COMP...
- Publication number 20080029211
- Publication date Feb 7, 2008
- JENNIFER Y. SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas distribution plate fabricated from a solid yttrium oxide-compri...
- Publication number 20050056218
- Publication date Mar 17, 2005
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- C30 - CRYSTAL GROWTH
Information Patent Application
Clean, dense yttrium oxide coating protecting semiconductor process...
- Publication number 20050037193
- Publication date Feb 17, 2005
- Jennifer Y. Sun
- C30 - CRYSTAL GROWTH
Information Patent Application
Process kit for erosion resistance enhancement
- Publication number 20050016684
- Publication date Jan 27, 2005
- APPLIED MATERIALS, INC.
- Jennifer Y. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrochemically roughened aluminum semiconductor chamber surfaces
- Publication number 20040224171
- Publication date Nov 11, 2004
- Jennifer Y. Sun
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Person

Patents Grantslast 30 patents

High temperature electrostatic chuck bonding adhesive

Method of processing a substrate support assembly

Real time monitoring with closed loop chucking force control

Pixilated cooling, temperature controlled substrate support assembly

Electrostatic chuck with external flow adjustments for improved tem...

Substrate support assembly having a plasma resistant protective layer

Control systems employing deflection sensors to control clamping fo...

Electrostatic chuck with external flow adjustments for improved tem...

Control systems employing deflection sensors to control clamping fo...

High temperature electrostatic chuck bonding adhesive

Electrostatic chuck with internal flow adjustments for improved tem...

Single-body electrostatic chuck

Method of reducing plasma arcing on surfaces of semiconductor proce...

Method of producing a plasma-resistant thermal oxide coating

Plasma-resistant ceramics with controlled electrical resistivity

Wet clean process for recovery of anodized chamber parts

Plasma resistant coatings for plasma chamber components

Erosion-resistant plasma chamber components comprising a metal base...

Clean, dense yttrium oxide coating protecting semiconductor process...

Self-passivating plasma resistant material for joining chamber comp...

Low temperature aerosol deposition of a plasma resistive layer

Gas distribution plate fabricated from a solid yttrium oxide-compri...

Plasma reactor with overhead RF source power electrode with low los...

Semiconductor processing apparatus including plasma-resistant, weld...

Halogen-resistant, anodized aluminum for use in semiconductor proce...

Halogen-resistant, anodized aluminum for use in semiconductor proce...

System level in-situ integrated dielectric etch process particularl...

Apparatus for regulating temperature of a process kit in a semicond...

Yttrium oxide based surface coating for semiconductor IC processing...

High temperature electrical connector

Patents Applicationslast 30 patents

REAL TIME MONITORING WITH CLOSED LOOP CHUCKING FORCE CONTROL

SUBSTRATE SUPPORT ASSEMBLY HAVING A PLASMA RESISTANT PROTECTIVE LAYER

ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...

METHOD OF PROCESSING A SUBSTRATE SUPPORT ASSEMBLY

CONTROL SYSTEMS EMPLOYING DEFLECTION SENSORS TO CONTROL CLAMPING FO...

HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE

ELECTROSTATIC CHUCK WITH INTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...

ELECTROSTATIC CHUCK WITH EXTERNAL FLOW ADJUSTMENTS FOR IMPROVED TEM...

PIXILATED COOLING, TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY

SINGLE-BODY ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT ASSEMBLY HAVING A PLASMA RESISTANT PROTECTIVE LAYER

HIGH TEMPERATURE ELECTROSTATIC CHUCK WITH REAL-TIME HEAT ZONE REGUL...

Method of reducing plasma arcing on surfaces of semiconductor proce...

Method of producing a plasma-resistant thermal oxide coating

GAS DISTRIBUTION SHOWERHEAD WITH COATING MATERIAL FOR SEMICONDUCTOR...

HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE

FILLED POLYMER COMPOSITION FOR ETCH CHAMBER COMPONENT

PLASMA RESISTANT COATINGS FOR PLASMA CHAMBER COMPONENTS

Ceramic coating comprising yttrium which is resistant to a reducing...

Erosion resistant yttrium comprising metal with oxidized coating fo...

Corrosion-resistant gas distribution plate for plasma processing ch...

WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS

Plasma-resistant ceramics with controlled electrical resistivity

Method of coating semiconductor processing apparatus with protectiv...

LOW TEMPERATURE AEROSOL DEPOSITION OF A PLASMA RESISTIVE LAYER

SELF-PASSIVATING PLASMA RESISTANT MATERIAL FOR JOINING CHAMBER COMP...

Gas distribution plate fabricated from a solid yttrium oxide-compri...

Clean, dense yttrium oxide coating protecting semiconductor process...

Process kit for erosion resistance enhancement

Electrochemically roughened aluminum semiconductor chamber surfaces