Seokmin Yun

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of dielectric film treatment
- Patent number 9,236,279
- Issue date Jan 12, 2016
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of particle contaminant removal
- Patent number 8,828,145
- Issue date Sep 9, 2014
- Lam Research Corporation
- Yizhak Sabba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing pattern collapse in high aspect ratio nanostruct...
- Patent number 8,617,993
- Issue date Dec 31, 2013
- Lam Research Corporation
- Amir A. Yasseri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing premature drying
- Patent number 8,277,570
- Issue date Oct 2, 2012
- Lam Research Corporation
- Seokmin Yun
- B08 - CLEANING
Information Patent Grant
Method of damaged low-k dielectric film layer removal
- Patent number 8,277,675
- Issue date Oct 2, 2012
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing premature drying
- Patent number 8,021,512
- Issue date Sep 20, 2011
- Lam Research Corporation
- Seokmin Yun
- B08 - CLEANING
Information Patent Grant
Method of preventing pattern collapse during rinsing and drying
- Patent number 7,967,916
- Issue date Jun 28, 2011
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate preparation using megasonic coupling fluid meniscus and m...
- Patent number 7,810,513
- Issue date Oct 12, 2010
- Lam Research Corporation
- John M. Boyd
- B08 - CLEANING
Information Patent Grant
Post etch wafer surface cleaning with liquid meniscus
- Patent number 7,597,765
- Issue date Oct 6, 2009
- Lam Research Corporation
- Ji Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge surface treatment with liquid meniscus
- Patent number 7,584,761
- Issue date Sep 8, 2009
- Lam Research Corporation
- Seokmin Yun
- B08 - CLEANING
Information Patent Grant
Enhanced wafer cleaning method
- Patent number 7,568,488
- Issue date Aug 4, 2009
- Lam Research Corporation
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced wafer cleaning method
- Patent number 7,329,321
- Issue date Feb 12, 2008
- Lam Research Corporation
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma stripping using periodic modulation of gas chemis...
- Patent number 7,294,580
- Issue date Nov 13, 2007
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU HYDROCARBON-BASED LAYER FOR NON-CONFORMAL PASSIVATION OF PA...
- Publication number 20230268192
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Eric HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE DISK WITH APERTURE FOR ETCH CONTROL
- Publication number 20230245865
- Publication date Aug 3, 2023
- LAM RESEARCH CORPORATION
- Chih-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
- Publication number 20220102624
- Publication date Mar 31, 2022
- LAM RESEARCH CORPORATION
- Seokmin YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Anisotropic Pattern Etching and Treatment
- Publication number 20210151290
- Publication date May 20, 2021
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Anisotropic Pattern Etching and Treatment
- Publication number 20190148109
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Low-K Dielectric Film Repair
- Publication number 20140170780
- Publication date Jun 19, 2014
- LAM RESEARCH CORPORATION
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DIELECTRIC FILM TREATMENT
- Publication number 20140048108
- Publication date Feb 20, 2014
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Post Etch Polymer Residue Removal
- Publication number 20120115332
- Publication date May 10, 2012
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER
- Publication number 20120103371
- Publication date May 3, 2012
- LAM RESEARCH AG
- SEOKMIN YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Preventing Premature Drying
- Publication number 20110294301
- Publication date Dec 1, 2011
- LAM RESEARCH CORPORATION
- Seokmin Yun
- B08 - CLEANING
Information Patent Application
METHOD FOR REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUC...
- Publication number 20110189858
- Publication date Aug 4, 2011
- LAM RESEARCH CORPORATION
- Amir A. Yasseri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PREPARATION USING MEGASONIC COUPLING FLUID MENISCUS
- Publication number 20100319726
- Publication date Dec 23, 2010
- John M. Boyd
- B08 - CLEANING
Information Patent Application
Method of Particle Contaminant Removal
- Publication number 20100229890
- Publication date Sep 16, 2010
- Lam Research Corp.
- Yizhak T. Sabba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of low-k dielectric film repair
- Publication number 20100015731
- Publication date Jan 21, 2010
- LAM RESEARCH CORPORATION
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of preventing premature drying
- Publication number 20090246372
- Publication date Oct 1, 2009
- LAM RESEARCH CORPORATION
- Seokmin Yun
- B08 - CLEANING
Information Patent Application
METHOD OF DIELECTRIC FILM TREATMENT
- Publication number 20090229638
- Publication date Sep 17, 2009
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREVENTING PATTERN COLLAPSE DURING RINSING AND DRYING
- Publication number 20090229637
- Publication date Sep 17, 2009
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of post etch polymer residue removal
- Publication number 20090211596
- Publication date Aug 27, 2009
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of damaged low-k dielectric film layer removal
- Publication number 20090173718
- Publication date Jul 9, 2009
- LAM RESEARCH CORPORATION
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED WAFER CLEANING METHOD
- Publication number 20080169008
- Publication date Jul 17, 2008
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post etch wafer surface cleaning with liquid meniscus
- Publication number 20070240737
- Publication date Oct 18, 2007
- LAM RESEARCH CORPORATION
- Ji Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced wafer cleaning method
- Publication number 20060124153
- Publication date Jun 15, 2006
- Lam Research Corp.
- Seokmin Yun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for plasma stripping using periodic modulation of gas chemis...
- Publication number 20040224520
- Publication date Nov 11, 2004
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS

Seokmin Yun

Person

Patents Grantslast 30 patents

Method and apparatus for anisotropic pattern etching and treatment

Method of dielectric film treatment

Method of particle contaminant removal

Method of reducing pattern collapse in high aspect ratio nanostruct...

Method of preventing premature drying

Method of damaged low-k dielectric film layer removal

Method of preventing premature drying

Method of preventing pattern collapse during rinsing and drying

Substrate preparation using megasonic coupling fluid meniscus and m...

Post etch wafer surface cleaning with liquid meniscus

Wafer edge surface treatment with liquid meniscus

Enhanced wafer cleaning method

Enhanced wafer cleaning method

Method for plasma stripping using periodic modulation of gas chemis...

Patents Applicationslast 30 patents

ION BEAM ETCH SYSTEM AND METHOD

IN-SITU HYDROCARBON-BASED LAYER FOR NON-CONFORMAL PASSIVATION OF PA...

MOVABLE DISK WITH APERTURE FOR ETCH CONTROL

ION BEAM ETCHING WITH GAS TREATMENT AND PULSING

Method and Apparatus for Anisotropic Pattern Etching and Treatment

Method and Apparatus for Anisotropic Pattern Etching and Treatment

Method of Low-K Dielectric Film Repair

METHOD OF DIELECTRIC FILM TREATMENT

Method of Post Etch Polymer Residue Removal

METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER

Method of Preventing Premature Drying

METHOD FOR REDUCING PATTERN COLLAPSE IN HIGH ASPECT RATIO NANOSTRUC...

SUBSTRATE PREPARATION USING MEGASONIC COUPLING FLUID MENISCUS

Method of Particle Contaminant Removal

Method of low-k dielectric film repair

Method of preventing premature drying

METHOD OF DIELECTRIC FILM TREATMENT

METHOD OF PREVENTING PATTERN COLLAPSE DURING RINSING AND DRYING

Method of post etch polymer residue removal

Method of damaged low-k dielectric film layer removal

ENHANCED WAFER CLEANING METHOD

Post etch wafer surface cleaning with liquid meniscus

Enhanced wafer cleaning method

Method for plasma stripping using periodic modulation of gas chemis...