Seon-Mee Cho

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer passivation or etch stop TFT
- Patent number 9,935,183
- Issue date Apr 3, 2018
- Applied Materials, Inc.
- Dong-kil Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,818,580
- Issue date Nov 14, 2017
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer passivation or etch stop TFT
- Patent number 9,590,113
- Issue date Mar 7, 2017
- Applied Materials, Inc.
- Dong-kil Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to grow in-situ crystalline IGZO using co-sputtering targets
- Patent number 9,337,030
- Issue date May 10, 2016
- Intermolecular, Inc.
- Seon-Mee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a silicon containing layer with argon gas di...
- Patent number 9,287,137
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Qunhua Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pin hole evaluation method of dielectric films for metal oxide semi...
- Patent number 9,245,809
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- Dong-Kil Yim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming crystalline IGZO through annealing
- Patent number 9,202,690
- Issue date Dec 1, 2015
- Intermolecular, Inc.
- Sang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission line RF applicator for plasma chamber
- Patent number 9,048,518
- Issue date Jun 2, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
SiOx process chemistry development using microwave plasma CVD
- Patent number 8,906,813
- Issue date Dec 9, 2014
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film deposition using microwave plasma
- Patent number 8,883,269
- Issue date Nov 11, 2014
- Applied Materials, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 8,715,788
- Issue date May 6, 2014
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conformal plasma immersed ion implantation assisted by a...
- Patent number 8,709,924
- Issue date Apr 29, 2014
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
- Patent number 8,168,519
- Issue date May 1, 2012
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 8,043,667
- Issue date Oct 25, 2011
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation method using a pure or nearly pur...
- Patent number 7,968,439
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for porogen removal and mechanical strength enhancement of l...
- Patent number 7,892,985
- Issue date Feb 22, 2011
- Novellus Systems, Inc.
- Seon-Mee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ dose monitoring using optical emission spectroscopy
- Patent number 7,871,828
- Issue date Jan 18, 2011
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation with highly uniform chamber seaso...
- Patent number 7,691,755
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Shijian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
UV treatment of STI films for increasing tensile stress
- Patent number 7,622,162
- Issue date Nov 24, 2009
- Novellus Systems, Inc.
- Bart van Schravendijk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-K dielectric film usin...
- Patent number 7,611,757
- Issue date Nov 3, 2009
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydroxyl bond removal and film densification method for oxide films...
- Patent number 7,589,028
- Issue date Sep 15, 2009
- Novellus Systems, Inc.
- Seon-Mee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dosimetry using optical emission spectroscopy/residual gas analyzer...
- Patent number 7,531,469
- Issue date May 12, 2009
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal-free catalysts for pulsed deposition layer process for confor...
- Patent number 7,491,653
- Issue date Feb 17, 2009
- Novellus Systems, Inc.
- George D. Papasouliotis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for UV exposure of low dielectric constant mat...
- Patent number 7,265,061
- Issue date Sep 4, 2007
- Novellus Systems, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve mechanical strength of low-k dielectric film usin...
- Patent number 7,253,125
- Issue date Aug 7, 2007
- Novellus Systems, Inc.
- Ananda K. Bandyopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized energy pulse rapid thermal anneal dielectric film densifi...
- Patent number 7,163,899
- Issue date Jan 16, 2007
- Novellus Systems, Inc.
- Seon-Mee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD plasma assisted lower dielectric constant SICOH film
- Patent number 7,153,787
- Issue date Dec 26, 2006
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for reducing plasma charge damage for plasma processes
- Patent number 7,036,453
- Issue date May 2, 2006
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted lower dielectric constant SICOH film
- Patent number 6,943,127
- Issue date Sep 13, 2005
- Applied Materials Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbide deposited by high density plasma chemical-vapor dep...
- Patent number 6,926,926
- Issue date Aug 9, 2005
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER PASSIVATION OR ETCH STOP TFT
- Publication number 20170162678
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- Dong-Kil YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20160208380
- Publication date Jul 21, 2016
- Applied Materials, Inc.
- John M. WHITE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER PASSIVATION OR ETCH STOP TFT
- Publication number 20160013320
- Publication date Jan 14, 2016
- Applied Materials Inc.
- Dong-kil YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20150340204
- Publication date Nov 26, 2015
- Applied Materials, Inc.
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAAC IGZO Deposited at Room Temperature
- Publication number 20150279674
- Publication date Oct 1, 2015
- Intermolecular, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Novel Method to Grow In-Situ Crystalline IGZO
- Publication number 20150279670
- Publication date Oct 1, 2015
- INTERMOLECULAR INC.
- Seon-Mee Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGZO with Intra-Layer Variations and Methods for Forming the Same
- Publication number 20150187574
- Publication date Jul 2, 2015
- LG Display Co. Ltd.
- Minh Huu Le
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Crystalline IGZO Through Annealing
- Publication number 20150179448
- Publication date Jun 25, 2015
- Intermolecular, Inc.
- Sang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Crystalline IGZO Through Power Supply Mode Opti...
- Publication number 20150179444
- Publication date Jun 25, 2015
- LG Display Co., Ltd.
- Sang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Crystalline IGZO Through Processing Condition O...
- Publication number 20150179446
- Publication date Jun 25, 2015
- LG Display Co., Ltd.
- Sang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIN HOLE EVALUATION METHOD OF DIELECTRIC FILMS FOR METAL OXIDE SEMI...
- Publication number 20140273312
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Dong-Kil YIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIOX PROCESS CHEMISTRY DEVELOPMENT USING MICROWAVE PLASMA CVD
- Publication number 20130302999
- Publication date Nov 14, 2013
- Tae Kyung WON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission line RF applicator for plasma chamber
- Publication number 20130221833
- Publication date Aug 29, 2013
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING A SILICON CONTAINING LAYER WITH ARGON GAS DI...
- Publication number 20130087783
- Publication date Apr 11, 2013
- Applied Materials, Inc.
- Qunhua Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...
- Publication number 20130068161
- Publication date Mar 21, 2013
- Applied Materials, Inc.
- John M. White
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Transmission Line RF Applicator for Plasma Chamber
- Publication number 20120326592
- Publication date Dec 27, 2012
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH COOLED GAS DELIVERY LINE
- Publication number 20120279943
- Publication date Nov 8, 2012
- Applied Materials, Inc.
- Helinda Nominanda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM DEPOSITION USING MICROWAVE PLASMA
- Publication number 20120171391
- Publication date Jul 5, 2012
- Applied Materials, Inc.
- Tae Kyung WON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION METHOD USING A PURE OR NEARLY PUR...
- Publication number 20110207307
- Publication date Aug 25, 2011
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...
- Publication number 20110159673
- Publication date Jun 30, 2011
- HIROJI HANAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...
- Publication number 20090203197
- Publication date Aug 13, 2009
- HIROJI HANAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER...
- Publication number 20090195777
- Publication date Aug 6, 2009
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma immersion ion implantation method using a pure or nearly pur...
- Publication number 20090197401
- Publication date Aug 6, 2009
- Applied Materials, Inc.
- Shijian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA IMMERSION ION IMPLANTATION WITH HIGHLY UNIFORM CHAMBER SEASO...
- Publication number 20080286982
- Publication date Nov 20, 2008
- Shijian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DOSE MONITORING USING OPTICAL EMISSION SPECTROSCOPY
- Publication number 20080188013
- Publication date Aug 7, 2008
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dry photoresist stripping process and apparatus
- Publication number 20080153306
- Publication date Jun 26, 2008
- APPLIED MATERIALS, INC.
- Seon-Mee Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WET PHOTORESIST STRIPPING PROCESS AND APPARATUS
- Publication number 20080149135
- Publication date Jun 26, 2008
- Seon-Mee Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER...
- Publication number 20080075834
- Publication date Mar 27, 2008
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD plasma assisted lower dielectric constant sicoh film
- Publication number 20050153572
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing a low-k material having a controlled thicknes...
- Publication number 20040161536
- Publication date Aug 19, 2004
- APPLIED MATERIALS, INC.
- Chi-I Lang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Seon-Mee Cho

Person

Patents Grantslast 30 patents

Multilayer passivation or etch stop TFT

Transmission line RF applicator for plasma chamber

Multilayer passivation or etch stop TFT

Method to grow in-situ crystalline IGZO using co-sputtering targets

Methods for depositing a silicon containing layer with argon gas di...

Pin hole evaluation method of dielectric films for metal oxide semi...

Methods for forming crystalline IGZO through annealing

Transmission line RF applicator for plasma chamber

SiOx process chemistry development using microwave plasma CVD

Thin film deposition using microwave plasma

Method to improve mechanical strength of low-K dielectric film usin...

Method for conformal plasma immersed ion implantation assisted by a...

Plasma immersion ion implantation method using a pure or nearly pur...

Method to improve mechanical strength of low-K dielectric film usin...

Plasma immersion ion implantation method using a pure or nearly pur...

Method for porogen removal and mechanical strength enhancement of l...

In-situ dose monitoring using optical emission spectroscopy

Plasma immersion ion implantation with highly uniform chamber seaso...

UV treatment of STI films for increasing tensile stress

Method to improve mechanical strength of low-K dielectric film usin...

Hydroxyl bond removal and film densification method for oxide films...

Dosimetry using optical emission spectroscopy/residual gas analyzer...

Metal-free catalysts for pulsed deposition layer process for confor...

Method and apparatus for UV exposure of low dielectric constant mat...

Method to improve mechanical strength of low-k dielectric film usin...

Localized energy pulse rapid thermal anneal dielectric film densifi...

CVD plasma assisted lower dielectric constant SICOH film

Apparatus for reducing plasma charge damage for plasma processes

CVD plasma assisted lower dielectric constant SICOH film

Silicon carbide deposited by high density plasma chemical-vapor dep...

Patents Applicationslast 30 patents

MULTILAYER PASSIVATION OR ETCH STOP TFT

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

MULTILAYER PASSIVATION OR ETCH STOP TFT

Transmission Line RF Applicator for Plasma Chamber

CAAC IGZO Deposited at Room Temperature

Novel Method to Grow In-Situ Crystalline IGZO

IGZO with Intra-Layer Variations and Methods for Forming the Same

Methods for Forming Crystalline IGZO Through Annealing

Methods for Forming Crystalline IGZO Through Power Supply Mode Opti...

Methods for Forming Crystalline IGZO Through Processing Condition O...

PIN HOLE EVALUATION METHOD OF DIELECTRIC FILMS FOR METAL OXIDE SEMI...

SIOX PROCESS CHEMISTRY DEVELOPMENT USING MICROWAVE PLASMA CVD

Transmission line RF applicator for plasma chamber

METHODS FOR DEPOSITING A SILICON CONTAINING LAYER WITH ARGON GAS DI...

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LA...

Transmission Line RF Applicator for Plasma Chamber

PROCESSING CHAMBER WITH COOLED GAS DELIVERY LINE

THIN FILM DEPOSITION USING MICROWAVE PLASMA

PLASMA IMMERSION ION IMPLANTATION METHOD USING A PURE OR NEARLY PUR...

NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...

NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTE...

DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER...

Plasma immersion ion implantation method using a pure or nearly pur...

PLASMA IMMERSION ION IMPLANTATION WITH HIGHLY UNIFORM CHAMBER SEASO...

IN-SITU DOSE MONITORING USING OPTICAL EMISSION SPECTROSCOPY

Dry photoresist stripping process and apparatus

WET PHOTORESIST STRIPPING PROCESS AND APPARATUS

DOSIMETRY USING OPTICAL EMISSION SPECTROSCOPY/RESIDUAL GAS ANALYZER...

CVD plasma assisted lower dielectric constant sicoh film

Method for depositing a low-k material having a controlled thicknes...