Sharad N. Yedave

Person

Danbury, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,827,973
- Issue date Nov 28, 2023
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation system with mixture of arc chamber materials
- Patent number 11,682,540
- Issue date Jun 20, 2023
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion methods for ion implantation
- Patent number 11,621,148
- Issue date Apr 4, 2023
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine ion implantation system with non-tungsten materials and me...
- Patent number 11,538,687
- Issue date Dec 27, 2022
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine ion implantation method and system
- Patent number 11,315,791
- Issue date Apr 26, 2022
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium tetraflouride and hydrogen mixtures for an ion implantati...
- Patent number 11,299,802
- Issue date Apr 12, 2022
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation system with mixture of arc chamber materials
- Patent number 11,139,145
- Issue date Oct 5, 2021
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon implantation in substrates and provision of silicon precurs...
- Patent number 11,062,906
- Issue date Jul 13, 2021
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogenated isotopically enriched boront trifluoride dopant source...
- Patent number 10,920,087
- Issue date Feb 16, 2021
- Entegris, Inc.
- Steven Bishop
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Ion implantation processes and apparatus using gallium
- Patent number 10,892,137
- Issue date Jan 12, 2021
- Entegris, Inc.
- Joseph D. Sweeney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and assemblies using fluorine containing and inert gases fo...
- Patent number 10,622,192
- Issue date Apr 14, 2020
- Entegris, Inc.
- Sharad N. Yedave
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon dopant gas and co-flow for implant beam and source life perf...
- Patent number 10,354,877
- Issue date Jul 16, 2019
- Entegris, Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phosphorus or arsenic ion implantation utilizing enhanced source te...
- Patent number 10,109,488
- Issue date Oct 23, 2018
- Entegris, Inc.
- Oleg Byl
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion source cleaning in semiconductor processing systems
- Patent number 9,991,095
- Issue date Jun 5, 2018
- Entegris, Inc.
- Joseph D. Sweeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Carbon dopant gas and co-flow for implant beam and source life perf...
- Patent number 9,960,042
- Issue date May 1, 2018
- Entegris Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isotopically-enriched boron-containing compounds, and methods of ma...
- Patent number 9,685,304
- Issue date Jun 20, 2017
- Entegris, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Isotopically-enriched boron-containing compounds, and methods of ma...
- Patent number 9,142,387
- Issue date Sep 22, 2015
- Entegris, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Ion implantation system and method
- Patent number 9,111,860
- Issue date Aug 18, 2015
- Entegris, Inc.
- Edward E. Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implantation system and method
- Patent number 8,796,131
- Issue date Aug 5, 2014
- Advanced Technology Materials, Inc.
- Edward E. Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning of semiconductor processing systems
- Patent number 8,603,252
- Issue date Dec 10, 2013
- Advanced Technology Materials, Inc.
- Frank Dimeo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Isotopically-enriched boron-containing compounds, and methods of ma...
- Patent number 8,598,022
- Issue date Dec 3, 2013
- Advanced Technology Materials, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Isotopically-enriched boron-containing compounds, and methods of ma...
- Patent number 8,138,071
- Issue date Mar 20, 2012
- Advanced Technology Materials, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Isotopically-enriched boron-containing compounds, and methods of ma...
- Patent number 8,062,965
- Issue date Nov 22, 2011
- Advanced Technology Materials, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...
- Publication number 20220186358
- Publication date Jun 16, 2022
- Entegris, Inc.
- Oleg Byl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...
- Publication number 20220044908
- Publication date Feb 10, 2022
- Entegris, Inc.
- Barry Lewis CHAMBERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Implantation System with Mixture of Arc Chamber Materials
- Publication number 20210398773
- Publication date Dec 23, 2021
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...
- Publication number 20210189550
- Publication date Jun 24, 2021
- Entegris, Inc.
- Oleg BYL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA IMMERSION METHODS FOR ION IMPLANTATION
- Publication number 20210090860
- Publication date Mar 25, 2021
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM WITH MIXTURE OF ARC CHAMBER MATERIALS
- Publication number 20210020402
- Publication date Jan 21, 2021
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE ION IMPLANTATION METHOD AND SYSTEM
- Publication number 20200194264
- Publication date Jun 18, 2020
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE ION IMPLANTATION SYSTEM WITH NON-TUNGSTEN MATERIALS AND ME...
- Publication number 20200194265
- Publication date Jun 18, 2020
- Entegris, Inc.
- Ying TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION PROCESSES AND APPARATUS USING GALLIUM
- Publication number 20200083015
- Publication date Mar 12, 2020
- Entegris, Inc.
- Joseph D. SWEENEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND ASSEMBLIES USING FLOURINE CONTAINING AND INERT GASSES F...
- Publication number 20190189402
- Publication date Jun 20, 2019
- Entegris, Inc.
- Sharad N. YEDAVE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGENATED ISOTOPICALLY ENRICHED BORONT TRIFLUORIDE DOPANT SOURCE...
- Publication number 20190136069
- Publication date May 9, 2019
- Entegris, Inc.
- Steven Bishop
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOSPHORUS OR ARSENIC ION IMPLANTATION UTILIZING ENHANCED SOURCE TE...
- Publication number 20190103275
- Publication date Apr 4, 2019
- Entegris, Inc.
- Oleg Byl
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FLUID SUPPLY PACKAGE
- Publication number 20190078696
- Publication date Mar 14, 2019
- Entegris, Inc.
- Glenn M. Tom
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERF...
- Publication number 20180211839
- Publication date Jul 26, 2018
- Entegris, Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorinated compositions for ion source performance improvements in...
- Publication number 20170330726
- Publication date Nov 16, 2017
- Entegris, Inc.
- Barry Lewis Chambers
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOSPHORUS OR ARSENIC ION IMPLANTATION UTILIZING ENHANCED SOURCE TE...
- Publication number 20170250084
- Publication date Aug 31, 2017
- Entegris, Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON IMPLANTATION IN SUBSTRATES AND PROVISION OF SILICON PRECURS...
- Publication number 20160211137
- Publication date Jul 21, 2016
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERF...
- Publication number 20160020102
- Publication date Jan 21, 2016
- Entegris Inc.
- Oleg Byl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...
- Publication number 20160013018
- Publication date Jan 14, 2016
- Entegris, Inc.
- Robert Kaim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND METHOD
- Publication number 20150357152
- Publication date Dec 10, 2015
- Entegris, Inc.
- Edward E. Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND METHOD
- Publication number 20140342538
- Publication date Nov 20, 2014
- Advanced Technology Materials, Inc.
- Edward E. Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...
- Publication number 20140090598
- Publication date Apr 3, 2014
- Advanced Technology Materials, Inc.
- Robert Kaim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND METHOD
- Publication number 20120252195
- Publication date Oct 4, 2012
- Advanced Technology Materials, Inc.
- Edward E. Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...
- Publication number 20120108044
- Publication date May 3, 2012
- Advanced Technology Materials, Inc.
- Robert KAIM
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20120058252
- Publication date Mar 8, 2012
- Advanced Technology Materials, Inc.
- Joseph D. Sweeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20110259366
- Publication date Oct 27, 2011
- Advanced Technology Materials, Inc.
- Joseph D. Sweeney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...
- Publication number 20110159671
- Publication date Jun 30, 2011
- Advanced Technology Materials, Inc.
- Robert KAIM
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...
- Publication number 20110097882
- Publication date Apr 28, 2011
- Advanced Technology Materials, Inc.
- Robert Kaim
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20100154835
- Publication date Jun 24, 2010
- Advanced Technology Materials, Inc.
- Frank Dimeo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Sharad N. Yedave

Person

Patents Grantslast 30 patents

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Ion implantation system with mixture of arc chamber materials

Plasma immersion methods for ion implantation

Fluorine ion implantation system with non-tungsten materials and me...

Fluorine ion implantation method and system

Germanium tetraflouride and hydrogen mixtures for an ion implantati...

Ion implantation system with mixture of arc chamber materials

Silicon implantation in substrates and provision of silicon precurs...

Hydrogenated isotopically enriched boront trifluoride dopant source...

Ion implantation processes and apparatus using gallium

Methods and assemblies using fluorine containing and inert gases fo...

Carbon dopant gas and co-flow for implant beam and source life perf...

Phosphorus or arsenic ion implantation utilizing enhanced source te...

Ion source cleaning in semiconductor processing systems

Carbon dopant gas and co-flow for implant beam and source life perf...

Isotopically-enriched boron-containing compounds, and methods of ma...

Isotopically-enriched boron-containing compounds, and methods of ma...

Ion implantation system and method

Ion implantation system and method

Cleaning of semiconductor processing systems

Isotopically-enriched boron-containing compounds, and methods of ma...

Isotopically-enriched boron-containing compounds, and methods of ma...

Isotopically-enriched boron-containing compounds, and methods of ma...

Patents Applicationslast 30 patents

GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...

FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN...

Ion Implantation System with Mixture of Arc Chamber Materials

GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATI...

PLASMA IMMERSION METHODS FOR ION IMPLANTATION

ION IMPLANTATION SYSTEM WITH MIXTURE OF ARC CHAMBER MATERIALS

FLUORINE ION IMPLANTATION METHOD AND SYSTEM

FLUORINE ION IMPLANTATION SYSTEM WITH NON-TUNGSTEN MATERIALS AND ME...

ION IMPLANTATION PROCESSES AND APPARATUS USING GALLIUM

METHODS AND ASSEMBLIES USING FLOURINE CONTAINING AND INERT GASSES F...

HYDROGENATED ISOTOPICALLY ENRICHED BORONT TRIFLUORIDE DOPANT SOURCE...

PHOSPHORUS OR ARSENIC ION IMPLANTATION UTILIZING ENHANCED SOURCE TE...

FLUID SUPPLY PACKAGE

CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERF...

Fluorinated compositions for ion source performance improvements in...

PHOSPHORUS OR ARSENIC ION IMPLANTATION UTILIZING ENHANCED SOURCE TE...

SILICON IMPLANTATION IN SUBSTRATES AND PROVISION OF SILICON PRECURS...

CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERF...

ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...

ION IMPLANTATION SYSTEM AND METHOD

ION IMPLANTATION SYSTEM AND METHOD

ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...

ION IMPLANTATION SYSTEM AND METHOD

ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...

ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS

ION SOURCE CLEANING IN SEMICONDUCTOR PROCESSING SYSTEMS

ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...

ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MA...

CLEANING OF SEMICONDUCTOR PROCESSING SYSTEMS