Shashank Deshmukh

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Porous low-k dielectric etch
- Patent number 10,361,091
- Issue date Jul 23, 2019
- Lam Research Corporation
- Eric Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated etch/clean for dielectric etch applications
- Patent number 9,396,961
- Issue date Jul 19, 2016
- Lam Research Corporation
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to eliminate “M-shape” etch rate profile in inductively cou...
- Patent number 8,956,500
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Stephen Yuen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching high K dielectrics with high selectivity to oxide containin...
- Patent number 8,722,547
- Issue date May 13, 2014
- Applied Materials, Inc.
- Radhika Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for high temperature etching a high-K material gate structure
- Patent number 8,501,626
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternative method for advanced CMOS logic gate etch applications
- Patent number 7,910,488
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Nicolas Gani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for etching flash memory gate stacks comprising h...
- Patent number 7,780,862
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-plasma system with pulsed reaction gas replenish for etching...
- Patent number 7,771,606
- Issue date Aug 10, 2010
- Applied Materials, Inc.
- Tae Won Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching tungsten silicide overlying polysilicon particu...
- Patent number 7,754,610
- Issue date Jul 13, 2010
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-plasma system for etching semiconductor structures
- Patent number 7,737,042
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Tae Won Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-plasma system with pulsed sample bias for etching semiconduc...
- Patent number 7,718,538
- Issue date May 18, 2010
- Applied Materials, Inc.
- Tae Won Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of pattern etching a silicon-containing hard mask
- Patent number 7,504,338
- Issue date Mar 17, 2009
- Applied Materials, Inc.
- Yan Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a gate structure of a field effect transistor...
- Patent number 7,368,392
- Issue date May 6, 2008
- Applied Materials, Inc.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled polymerization on plasma reactor wall
- Patent number 7,122,125
- Issue date Oct 17, 2006
- Applied Materials, Inc.
- Shashank C. Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for realtime CD microloading control
- Patent number 6,924,088
- Issue date Aug 2, 2005
- Applied Materials, Inc.
- David S. L. Mui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method having high silicon-to-photoresist selectivity
- Patent number 6,921,723
- Issue date Jul 26, 2005
- Applied Materials, Inc.
- Yung-Hee Yvette Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resist-selectivity etch for silicon trench etch applications
- Patent number 6,653,237
- Issue date Nov 25, 2003
- Applied Materials, Inc.
- Shashank Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching polysilicon to have a smooth surface
- Patent number 6,402,974
- Issue date Jun 11, 2002
- Applied Materials, Inc.
- Jitske Trevor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of silicon using fluorinated gas mixtures
- Patent number 6,235,214
- Issue date May 22, 2001
- Applied Materials, Inc.
- Shashank Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a thermal transfer regulator pad
- Patent number 5,978,202
- Issue date Nov 2, 1999
- Applied Materials, Inc.
- Ralph M. Wadensweiler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring pedestal temperature in a semiconductor waf...
- Patent number 5,893,643
- Issue date Apr 13, 1999
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching transistor gates using a hardmask
- Patent number 5,851,926
- Issue date Dec 22, 1998
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IN-SITU HYDROCARBON-BASED LAYER FOR NON-CONFORMAL PASSIVATION OF PA...
- Publication number 20230268192
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Eric HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POROUS LOW-K DIELECTRIC ETCH
- Publication number 20180350618
- Publication date Dec 6, 2018
- LAM RESEARCH CORPORATION
- Eric HUDSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED ETCH/CLEAN FOR DIELECTRIC ETCH APPLICATIONS
- Publication number 20160181117
- Publication date Jun 23, 2016
- LAM RESEARCH CORPORATION
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR HIGH TEMPERATURE ETCHING A HIGH-K GATE STRUCTURE
- Publication number 20130344701
- Publication date Dec 26, 2013
- Wei LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATIVE METHOD FOR ADVANCED CMOS LOGIC GATE ETCH APPLICATIONS
- Publication number 20090017633
- Publication date Jan 15, 2009
- Applied Materials, Inc.
- NICOLAS GANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR HIGH TEMPERATURE ETCHING A HIGH-K MATERIAL GATE STRUCTURE
- Publication number 20090004870
- Publication date Jan 1, 2009
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...
- Publication number 20080264904
- Publication date Oct 30, 2008
- STEPHEN YUEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-PLASMA SYSTEM FOR ETCHING SEMICONDUCTOR STRUCTURES
- Publication number 20080206900
- Publication date Aug 28, 2008
- TAE WON KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-PLASMA SYSTEM WITH PULSED REACTION GAS REPLENISH FOR ETCHING...
- Publication number 20080206901
- Publication date Aug 28, 2008
- TAE WON KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-PLASMA SYSTEM WITH PULSED SAMPLE BIAS FOR ETCHING SEMICONDUC...
- Publication number 20080197110
- Publication date Aug 21, 2008
- Tae Won Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR ETCHING FLASH MEMORY GATE STACKS COMPRISING H...
- Publication number 20080011423
- Publication date Jan 17, 2008
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching tungsten silicide overlying polysilicon particu...
- Publication number 20070281477
- Publication date Dec 6, 2007
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process including silo-chloro passivation for etching tungsten sili...
- Publication number 20070281479
- Publication date Dec 6, 2007
- Applied Materials, Inc.
- Kyeong-Tae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OF SiO2 WITH HIGH SELECTIVITY TO Si3N4 AND ETCHING METAL OX...
- Publication number 20070249182
- Publication date Oct 25, 2007
- Applied Materials, Inc.
- Radhika Mani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device and method for etching flash memory gate stacks comprising h...
- Publication number 20070224813
- Publication date Sep 27, 2007
- Applied Materials, Inc.
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of pattern etching a silicon-containing hard mask
- Publication number 20070010099
- Publication date Jan 11, 2007
- APPLIED MATERIALS, INC.
- Yan Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for endpoint detection during an etch process
- Publication number 20050070103
- Publication date Mar 31, 2005
- APPLIED MATERIALS, INC.
- Shashank C. Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating a gate structure of a field effect transistor...
- Publication number 20050009358
- Publication date Jan 13, 2005
- APPLIED MATERIALS, INC.
- Jinhan Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a silicon-containing dielectric material
- Publication number 20040084411
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Yan Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a silicon-containing dielectric material
- Publication number 20040087153
- Publication date May 6, 2004
- Yan Du
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlled polymerization on plasma reactor wall
- Publication number 20040084409
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Shashank C. Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for realtime CD microloading control
- Publication number 20040038139
- Publication date Feb 26, 2004
- David S.L. Mui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for controlling the extent of notch or undercut in an etched...
- Publication number 20040018647
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Steven J. Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for etching using building blocks
- Publication number 20040018739
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Farid Abooameri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Enhancing Critical Dimension Uniformity After Etch
- Publication number 20040018741
- Publication date Jan 29, 2004
- APPLIED MATERIALS, INC.
- Shashank C. Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High resist-selectivity etch for silicon trench etch applications
- Publication number 20030003752
- Publication date Jan 2, 2003
- Shashank Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS

Shashank Deshmukh

Person

Patents Grantslast 30 patents

Porous low-k dielectric etch

Integrated etch/clean for dielectric etch applications

Methods to eliminate “M-shape” etch rate profile in inductively cou...

Etching high K dielectrics with high selectivity to oxide containin...

Methods for high temperature etching a high-K material gate structure

Shallow trench isolation etch process

Alternative method for advanced CMOS logic gate etch applications

Device and method for etching flash memory gate stacks comprising h...

Pulsed-plasma system with pulsed reaction gas replenish for etching...

Process for etching tungsten silicide overlying polysilicon particu...

Pulsed-plasma system for etching semiconductor structures

Pulsed-plasma system with pulsed sample bias for etching semiconduc...

Method of pattern etching a silicon-containing hard mask

Method of fabricating a gate structure of a field effect transistor...

Controlled polymerization on plasma reactor wall

Method and system for realtime CD microloading control

Etching method having high silicon-to-photoresist selectivity

High resist-selectivity etch for silicon trench etch applications

Method for etching polysilicon to have a smooth surface

Plasma etching of silicon using fluorinated gas mixtures

Electrostatic chuck having a thermal transfer regulator pad

Apparatus for measuring pedestal temperature in a semiconductor waf...

Method for etching transistor gates using a hardmask

Patents Applicationslast 30 patents

IN-SITU HYDROCARBON-BASED LAYER FOR NON-CONFORMAL PASSIVATION OF PA...

POROUS LOW-K DIELECTRIC ETCH

INTEGRATED ETCH/CLEAN FOR DIELECTRIC ETCH APPLICATIONS

METHODS FOR HIGH TEMPERATURE ETCHING A HIGH-K GATE STRUCTURE

SHALLOW TRENCH ISOLATION ETCH PROCESS

ALTERNATIVE METHOD FOR ADVANCED CMOS LOGIC GATE ETCH APPLICATIONS

METHODS FOR HIGH TEMPERATURE ETCHING A HIGH-K MATERIAL GATE STRUCTURE

METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...

PULSED-PLASMA SYSTEM FOR ETCHING SEMICONDUCTOR STRUCTURES

PULSED-PLASMA SYSTEM WITH PULSED REACTION GAS REPLENISH FOR ETCHING...

PULSED-PLASMA SYSTEM WITH PULSED SAMPLE BIAS FOR ETCHING SEMICONDUC...

DEVICE AND METHOD FOR ETCHING FLASH MEMORY GATE STACKS COMPRISING H...

Process for etching tungsten silicide overlying polysilicon particu...

Process including silo-chloro passivation for etching tungsten sili...

ETCHING OF SiO2 WITH HIGH SELECTIVITY TO Si3N4 AND ETCHING METAL OX...

Device and method for etching flash memory gate stacks comprising h...

Method of pattern etching a silicon-containing hard mask

Method and apparatus for endpoint detection during an etch process

Method of fabricating a gate structure of a field effect transistor...

Method of etching a silicon-containing dielectric material

Method of etching a silicon-containing dielectric material

Controlled polymerization on plasma reactor wall

Method and system for realtime CD microloading control

Method for controlling the extent of notch or undercut in an etched...

Methods for etching using building blocks

Method For Enhancing Critical Dimension Uniformity After Etch

High resist-selectivity etch for silicon trench etch applications