Shigehiro MIURA

Person

  • Iwate, JP

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    DEPOSITION METHOD

    • Publication number 20200312621
    • Publication date Oct 1, 2020
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    METHOD FOR DRY CLEANING A SUSCEPTOR AND SUBSTRATE PROCESSING APPARATUS

    • Publication number 20190360092
    • Publication date Nov 28, 2019
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMING METHOD AND FILM FORMING APPARATUS

    • Publication number 20190284691
    • Publication date Sep 19, 2019
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Film Forming Apparatus

    • Publication number 20190276935
    • Publication date Sep 12, 2019
    • TOKYO ELECTRON LIMITED
    • Masato YONEZAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Film Forming Apparatus, Film Forming Method, and Recording Medium

    • Publication number 20180327906
    • Publication date Nov 15, 2018
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

    • Publication number 20180135178
    • Publication date May 17, 2018
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    • Publication number 20180047545
    • Publication date Feb 15, 2018
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILM DEPOSITION METHOD

    • Publication number 20170338099
    • Publication date Nov 23, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM DEPOSITION APPARATUS

    • Publication number 20170335453
    • Publication date Nov 23, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD FOR PROCESSING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

    • Publication number 20170268104
    • Publication date Sep 21, 2017
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM DEPOSITION METHOD

    • Publication number 20170253964
    • Publication date Sep 7, 2017
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM DEPOSITION METHOD

    • Publication number 20170218516
    • Publication date Aug 3, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM DEPOSITION METHOD

    • Publication number 20170218510
    • Publication date Aug 3, 2017
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS AND FILM DEPOSITION METHOD

    • Publication number 20170167019
    • Publication date Jun 15, 2017
    • TOKYO ELECTRON LIMITED
    • Kazuhide HASEBE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

    • Publication number 20170130333
    • Publication date May 11, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND SUB...

    • Publication number 20170125258
    • Publication date May 4, 2017
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Film Forming Apparatus

    • Publication number 20170051403
    • Publication date Feb 23, 2017
    • TOKYO ELECTRON LIMITED
    • Masato YONEZAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS

    • Publication number 20170009341
    • Publication date Jan 12, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Substrate Processing Method and Substrate Processing Apparatus

    • Publication number 20170002464
    • Publication date Jan 5, 2017
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD AND APPARATUS FOR DEPOSITING A SILICON-CONTAINING FILM

    • Publication number 20160379868
    • Publication date Dec 29, 2016
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    • Publication number 20160358794
    • Publication date Dec 8, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND RECORDIN...

    • Publication number 20160293390
    • Publication date Oct 6, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING DEVICE AND OPERATION METHOD

    • Publication number 20160268105
    • Publication date Sep 15, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    • Publication number 20160260587
    • Publication date Sep 8, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    • Publication number 20160258065
    • Publication date Sep 8, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    METHOD OF DEPOSITING A SILICON-CONTAINING FILM

    • Publication number 20160254136
    • Publication date Sep 1, 2016
    • TOKYO ELECTRON LIMITED
    • Jun SATO
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    FILM DEPOSITION APPARATUS

    • Publication number 20160244877
    • Publication date Aug 25, 2016
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMING APPARATUS

    • Publication number 20160138159
    • Publication date May 19, 2016
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FILM FORMING APPARATUS, FILM FORMING METHOD, AND RECORDING MEDIUM

    • Publication number 20160122872
    • Publication date May 5, 2016
    • TOKYO ELECTRON LIMITED
    • Hitoshi KATO
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

    • Publication number 20160071722
    • Publication date Mar 10, 2016
    • TOKYO ELECTRON LIMITED
    • Shigehiro MIURA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...