Shigehiro Nagura

Person

Johetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer, resist material and patterning processing
- Patent number 7,157,207
- Issue date Jan 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,830,866
- Issue date Dec 14, 2004
- Shi-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning method
- Patent number 6,818,148
- Issue date Nov 16, 2004
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High molecular weight silicone compounds, resist compositions, and...
- Patent number 6,730,453
- Issue date May 4, 2004
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 6,703,183
- Issue date Mar 9, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,641,975
- Issue date Nov 4, 2003
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Styrene polymer, chemically amplified positive resist composition a...
- Patent number 6,613,844
- Issue date Sep 2, 2003
- Shin-Etsu Chemical Co., Ltd.
- Osamu Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,605,408
- Issue date Aug 12, 2003
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Onium salts, photoacid generators for resist compositions, resist c...
- Patent number 6,440,634
- Issue date Aug 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salts, photoacid generators, resist compositions, and pattern...
- Patent number 6,416,928
- Issue date Jul 9, 2002
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,395,446
- Issue date May 28, 2002
- Shin-Etsu Chemical Co., Ltd.
- Akihiro Seki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Styrene polymer, chemically amplified positive resist composition a...
- Patent number 6,384,169
- Issue date May 7, 2002
- Shin-Etsu Chemical Co., Ltd.
- Osamu Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,338,931
- Issue date Jan 15, 2002
- Shin-Etsu Chemical Co., Ltd.
- Kazunori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,335,141
- Issue date Jan 1, 2002
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,312,869
- Issue date Nov 6, 2001
- Shin-Etsu Chemical, Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High molecular weight silicone compounds resist compositions, and p...
- Patent number 6,309,796
- Issue date Oct 30, 2001
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist compositions
- Patent number 6,274,286
- Issue date Aug 14, 2001
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for production of saline-solution soluble xanthan gum
- Patent number 6,194,564
- Issue date Feb 27, 2001
- Shin-Etsu Chemical Co., Ltd.
- Kanji Murofushi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers and chemically amplified positive resist compositions
- Patent number 6,156,477
- Issue date Dec 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Kiyoshi Motomi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,136,502
- Issue date Oct 24, 2000
- Shin-Etsu Chemical Co., Ltd.
- Watanabe Satoshi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning method
- Patent number 6,117,621
- Issue date Sep 12, 2000
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition, pattern forming m...
- Patent number 6,114,462
- Issue date Sep 5, 2000
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Apparatus for the production of xanthan gum
- Patent number 6,110,731
- Issue date Aug 29, 2000
- Shin-Etsu Chemical Co., Ltd.
- Kanji Murofushi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 6,106,993
- Issue date Aug 22, 2000
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymeric compounds, chemically amplified positive type resist mate...
- Patent number 6,048,661
- Issue date Apr 11, 2000
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Partially hydrogenated polymers and chemically amplified positive r...
- Patent number 6,033,828
- Issue date Mar 7, 2000
- Shin-Etsu Chemical Co., Ltd.
- Junji Shimada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...
- Patent number 6,030,746
- Issue date Feb 29, 2000
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Nagata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers chemically amplified positive resist compositions, and pat...
- Patent number 6,027,854
- Issue date Feb 22, 2000
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of purifying xanthan gum using an alkaline protease and lys...
- Patent number 5,994,107
- Issue date Nov 30, 1999
- Shin-Etsu Chemical Co., Ltd.
- Kanji Murofushi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist compositions
- Patent number 5,985,512
- Issue date Nov 16, 1999
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Polymer, resist material and patterning processing
- Publication number 20050089796
- Publication date Apr 28, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20030091929
- Publication date May 15, 2003
- Tsunehiro Nishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20030013039
- Publication date Jan 16, 2003
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel styrene polymer, chemically amplified positive resist composi...
- Publication number 20030013832
- Publication date Jan 16, 2003
- Shin-Etsu Chemical Co., Ltd.
- Osamu Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
High molecular weight silicone compounds, resist compositions, and...
- Publication number 20020058205
- Publication date May 16, 2002
- Mutsuo Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20020039701
- Publication date Apr 4, 2002
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20020001772
- Publication date Jan 3, 2002
- SHIN-ETSU CHEMICAL CO., LTD.
- Tsunehiro Nishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Shigehiro Nagura

Person

Patents Grantslast 30 patents

Polymer, resist material and patterning processing

Resist composition and patterning process

Resist composition and patterning method

High molecular weight silicone compounds, resist compositions, and...

Polymer, resist composition and patterning process

Resist composition and patterning process

Styrene polymer, chemically amplified positive resist composition a...

Resist composition and patterning process

Onium salts, photoacid generators for resist compositions, resist c...

Onium salts, photoacid generators, resist compositions, and pattern...

Resist compositions and patterning process

Styrene polymer, chemically amplified positive resist composition a...

Resist compositions and patterning process

Chemically amplified positive resist composition, pattern forming m...

Chemically amplified positive resist composition, pattern forming m...

High molecular weight silicone compounds resist compositions, and p...

Resist compositions

Process for production of saline-solution soluble xanthan gum

Polymers and chemically amplified positive resist compositions

Resist composition and patterning process

Patterning method

Chemically amplified positive resist composition, pattern forming m...

Apparatus for the production of xanthan gum

Chemically amplified positive resist composition

Polymeric compounds, chemically amplified positive type resist mate...

Partially hydrogenated polymers and chemically amplified positive r...

Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...

Polymers chemically amplified positive resist compositions, and pat...

Process of purifying xanthan gum using an alkaline protease and lys...

Chemically amplified positive resist compositions

Patents Applicationslast 30 patents

Polymer, resist material and patterning processing

Polymer, resist composition and patterning process

Resist composition and patterning process

Novel styrene polymer, chemically amplified positive resist composi...

High molecular weight silicone compounds, resist compositions, and...

Resist composition and patterning process

Resist composition and patterning process