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Shigeru Ando
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Hiratsuka, JP
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last 30 patents
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Patent Grant
Highly purified metal material and sputtering target using the same
Patent number
5,679,983
Issue date
Oct 21, 1997
Kabushiki Kaisha Toshiba
Takashi Ishigami
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Ti-W sputtering target and method for manufacturing same
Patent number
5,470,527
Issue date
Nov 28, 1995
Kabushiki Kaisha Toshiba
Takashi Yamanobe
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Highly purified metal material and sputtering target using the same
Patent number
5,458,697
Issue date
Oct 17, 1995
Kabushiki Kaisha Toshiba
Takashi Ishigami
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information
Patent Grant
Sputtering target and method of manufacturing the same
Patent number
5,418,071
Issue date
May 23, 1995
Kabushiki Kaisha Toshiba
Michio Satou
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Fluorescent lamp with phosphor having coated phosphor particles
Patent number
5,289,081
Issue date
Feb 22, 1994
Kabushiki Kaisha Toshiba
Masaaki Tamatani
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Highly purified metal material and sputtering target using the same
Patent number
5,196,916
Issue date
Mar 23, 1993
Kabushiki Kaisha Toshiba
Takashi Ishigami
C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...