Shih Chung CHEN

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine-free tungsten ALD for dielectric selectivity improvement
- Patent number 12,062,545
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Ilanit Fisher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
P-type dipole for P-FET
- Patent number 11,996,455
- Issue date May 28, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,888,045
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reflector film growth
- Patent number 11,776,980
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Luping Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,658,218
- Issue date May 23, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing gate induced drain leakage in DRAM wordline
- Patent number 11,552,082
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for V-NAND word line stack
- Patent number 11,476,267
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-type dipole for p-FET
- Patent number 11,289,579
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,245,022
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-doped nitride films for improved high-k reliability
- Patent number 11,171,047
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...
- Patent number 11,075,276
- Issue date Jul 27, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing effective oxide thickness in a semiconductor str...
- Patent number 11,062,900
- Issue date Jul 13, 2021
- Applied Materials, Inc.
- Luping Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 10,872,763
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing gate induced drain leakage in DRAM wordline
- Patent number 10,790,287
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of flatness of a susceptor of a display CVD chamber
- Patent number 10,763,154
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Ying Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for doping engineering and threshold voltage...
- Patent number 10,665,450
- Issue date May 26, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low thickness dependent work-function nMOS integration for metal gate
- Patent number 10,608,097
- Issue date Mar 31, 2020
- Applied Materials, Inc.
- Paul F. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Water bottle stand
- Patent number D839018
- Issue date Jan 29, 2019
- APPLIED IP, LLC
- Mihai I. A. Boitor
- D06 - Furnishings
Information Patent Grant
Selective etch of metal nitride films
- Patent number 10,014,185
- Issue date Jul 3, 2018
- Applied Materials, Inc.
- Liqi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidized showerhead and process kit parts and methods of using same
- Patent number 9,914,999
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Muhammad M. Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-threshold voltage structures with a lanthanum nitride film an...
- Patent number 9,748,354
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Wei V. Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of films comprising aluminum alloys with high aluminum c...
- Patent number 9,683,287
- Issue date Jun 20, 2017
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-metal film deposition with initiation layer
- Patent number 9,269,584
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of N-metal films comprising aluminum alloys
- Patent number 9,145,612
- Issue date Sep 29, 2015
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for manufacturing metal gates
- Patent number 8,987,080
- Issue date Mar 24, 2015
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
N-metal film deposition with initiation layer
- Patent number 8,895,443
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping aluminum in tantalum silicide
- Patent number 8,592,305
- Issue date Nov 26, 2013
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods for Forming Low Resistivity Contacts
- Publication number 20240105444
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Jiang LU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON MOLD FOR DRAM CAPACITOR
- Publication number 20240038833
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Fredrick Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF GROWING METAL-CONTAINING FILMS
- Publication number 20230295803
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Haoming Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
P-TYPE DIPOLE FOR P-FET
- Publication number 20230253466
- Publication date Aug 10, 2023
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Distribution Apparatuses
- Publication number 20230193463
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Shashidhara Patel H B
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION
- Publication number 20230113514
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Shih Chung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20230005945
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Jacqueline S. Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER PEDESTAL WITH IMPROVED UNIFORMITY
- Publication number 20220367236
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20220165854
- Publication date May 26, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE FLOW FOR TRANSISTOR
- Publication number 20220115516
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Reducing Titanium Nitride Etching During Tungsten Film Fo...
- Publication number 20220098731
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Kedi Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE-FREE TUNGSTEN ALD FOR DIELECTRIC SELECTIVITY IMPROVEMENT
- Publication number 20210384036
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Ilanit Fisher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine-Free Tungsten ALD And Tungsten Selective CVD For Dielectrics
- Publication number 20210384035
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Ilanit Fisher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REFLECTOR FILM GROWTH
- Publication number 20210288086
- Publication date Sep 16, 2021
- Applied Materials, Inc.
- Luping Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PMOS High-K Metal Gates
- Publication number 20210134972
- Publication date May 6, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
P-Type Dipole For P-FET
- Publication number 20210098581
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine-Doped Nitride Films for Improved High-K Reliability
- Publication number 20200411373
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE
- Publication number 20200388621
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE FLOW FOR TRANSISTOR
- Publication number 20200373404
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20200373318
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20200350157
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- David Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REDUCING EFFECTIVE OXIDE THICKNESS IN A SEMICONDUCTOR STR...
- Publication number 20200176247
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- LUPING LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE
- Publication number 20200176451
- Publication date Jun 4, 2020
- Applied Materials, Inc.
- Sung-Kwan Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...
- Publication number 20200111885
- Publication date Apr 9, 2020
- Applied Materials, Inc.
- YONGJING LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF FLATNESS OF A SUSCEPTOR OF A DISPLAY CVD CHAMBER
- Publication number 20200071823
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Ying MA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Depositing Metal Carbide Films
- Publication number 20200071825
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR DOPING ENGINEERING AND THRESHOLD VOLTAGE...
- Publication number 20190057863
- Publication date Feb 21, 2019
- YIXIONG YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Thickness Dependent Work-Function nMOS Integration For Metal Gate
- Publication number 20190019874
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Paul F. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-THRESHOLD VOLTAGE STRUCTURES WITH A LANTHANUM NITRIDE FILM AN...
- Publication number 20170179252
- Publication date Jun 22, 2017
- Applied Materials, Inc.
- Wei V. TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDIZED SHOWERHEAD AND PROCESS KIT PARTS AND METHODS OF USING SAME
- Publication number 20160319428
- Publication date Nov 3, 2016
- Applied Materials, Inc.
- Muhammad M. RASHEED
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shih Chung CHEN

Person

Patents Grantslast 30 patents

Fluorine-free tungsten ALD for dielectric selectivity improvement

P-type dipole for P-FET

Integrated dipole flow for transistor

Methods for reflector film growth

P-type dipole for p-FET

Reducing gate induced drain leakage in DRAM wordline

Liner for V-NAND word line stack

P-type dipole for p-FET

Integrated dipole flow for transistor

Fluorine-doped nitride films for improved high-k reliability

Methods and apparatus for n-type metal oxide semiconductor (NMOS) m...

Method of reducing effective oxide thickness in a semiconductor str...

Treatments to enhance material structures

Reducing gate induced drain leakage in DRAM wordline

Measurement of flatness of a susceptor of a display CVD chamber

Methods and apparatus for doping engineering and threshold voltage...

Low thickness dependent work-function nMOS integration for metal gate

Water bottle stand

Selective etch of metal nitride films

Oxidized showerhead and process kit parts and methods of using same

Multi-threshold voltage structures with a lanthanum nitride film an...

Deposition of films comprising aluminum alloys with high aluminum c...

N-metal film deposition with initiation layer

Deposition of N-metal films comprising aluminum alloys

Methods for manufacturing metal gates

N-metal film deposition with initiation layer

Doping aluminum in tantalum silicide

Patents Applicationslast 30 patents

Methods for Forming Low Resistivity Contacts

CARBON MOLD FOR DRAM CAPACITOR

METHODS OF GROWING METAL-CONTAINING FILMS

P-TYPE DIPOLE FOR P-FET

Gas Distribution Apparatuses

METHODS FOR SEAMLESS GAP FILLING USING GRADIENT OXIDATION

LINER FOR V-NAND WORD LINE STACK

HEATER PEDESTAL WITH IMPROVED UNIFORMITY

P-Type Dipole For P-FET

INTEGRATED DIPOLE FLOW FOR TRANSISTOR

Method Of Reducing Titanium Nitride Etching During Tungsten Film Fo...

FLUORINE-FREE TUNGSTEN ALD FOR DIELECTRIC SELECTIVITY IMPROVEMENT

Fluorine-Free Tungsten ALD And Tungsten Selective CVD For Dielectrics

METHODS FOR REFLECTOR FILM GROWTH

PMOS High-K Metal Gates

P-Type Dipole For P-FET

Fluorine-Doped Nitride Films for Improved High-K Reliability

REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE

INTEGRATED DIPOLE FLOW FOR TRANSISTOR

LINER FOR V-NAND WORD LINE STACK

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

METHOD OF REDUCING EFFECTIVE OXIDE THICKNESS IN A SEMICONDUCTOR STR...

REDUCING GATE INDUCED DRAIN LEAKAGE IN DRAM WORDLINE

METHODS AND APPARATUS FOR N-TYPE METAL OXIDE SEMICONDUCTOR (NMOS) M...

MEASUREMENT OF FLATNESS OF A SUSCEPTOR OF A DISPLAY CVD CHAMBER

Methods Of Depositing Metal Carbide Films

METHODS AND APPARATUS FOR DOPING ENGINEERING AND THRESHOLD VOLTAGE...

Low Thickness Dependent Work-Function nMOS Integration For Metal Gate

MULTI-THRESHOLD VOLTAGE STRUCTURES WITH A LANTHANUM NITRIDE FILM AN...

OXIDIZED SHOWERHEAD AND PROCESS KIT PARTS AND METHODS OF USING SAME