Shing-Li Sung

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Campbell, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Dielectric plasma etch process with in-situ amorphous carbon mask w...
- Patent number 7,510,976
- Issue date Mar 31, 2009
- Applied Materials, Inc.
- Shing-Li Sung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF SUBSTRATE POLYMER REMOVAL
- Publication number 20090293907
- Publication date Dec 3, 2009
- Nancy Fung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ETCHING USING ADVANCED PATTERNING FILM IN CAPACITIVE COU...
- Publication number 20090023294
- Publication date Jan 22, 2009
- Applied Materials, Inc.
- JUDY WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric plasma etch process with in-situ amorphous carbon mask w...
- Publication number 20070249171
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Shing-Li Sung
- H01 - BASIC ELECTRIC ELEMENTS