Shingo Togashi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Rubber membrane having first and second hardness for use in a polis...
- Patent number 12,358,096
- Issue date Jul 15, 2025
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Film-thickness measuring method, method of detecting notch portion,...
- Patent number 12,183,642
- Issue date Dec 31, 2024
- Ebara Corporation
- Osamu Nabeya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 12,068,189
- Issue date Aug 20, 2024
- Ebara Corporation
- Satoru Yamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,958,163
- Issue date Apr 16, 2024
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D1021832
- Issue date Apr 9, 2024
- Ebara Corporation
- Kenichi Akazawa
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus and method of controlling inclination of statio...
- Patent number 11,745,306
- Issue date Sep 5, 2023
- Ebara Corporation
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 11,731,235
- Issue date Aug 22, 2023
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D989012
- Issue date Jun 13, 2023
- Ebara Corporation
- Kenichi Akazawa
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Method of detecting abnormality of a roller which transmits a local...
- Patent number 11,654,524
- Issue date May 23, 2023
- Ebara Corporation
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing a substrate
- Patent number 11,548,113
- Issue date Jan 10, 2023
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, substrate polishing apparatus, and method...
- Patent number 11,478,895
- Issue date Oct 25, 2022
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane and substrate holding apparatus
- Patent number 11,472,001
- Issue date Oct 18, 2022
- Ebara Corporation
- Cheng Cheng
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus, elastic membrane, polishing apparatus,...
- Patent number 11,179,823
- Issue date Nov 23, 2021
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding device, and polishing apparatus
- Patent number 11,088,011
- Issue date Aug 10, 2021
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane
- Patent number D918161
- Issue date May 4, 2021
- Ebara Corporation
- Shingo Togashi
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D913977
- Issue date Mar 23, 2021
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus
- Patent number 10,702,972
- Issue date Jul 7, 2020
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, and substrate polishing apparatus
- Patent number 10,486,284
- Issue date Nov 26, 2019
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing method, top ring, and substrate polishing appar...
- Patent number 10,464,185
- Issue date Nov 5, 2019
- Ebara Corporation
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 10,414,015
- Issue date Sep 17, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D859332
- Issue date Sep 10, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus, control method and recording medium
- Patent number 10,391,603
- Issue date Aug 27, 2019
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing a substrate
- Patent number 10,307,882
- Issue date Jun 4, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 10,213,896
- Issue date Feb 26, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing
- Patent number D839224
- Issue date Jan 29, 2019
- Ebara Corporation
- Satoru Yamaki
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing device and polishing method
- Patent number 9,999,956
- Issue date Jun 19, 2018
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D813180
- Issue date Mar 20, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane and substrate holding apparatus
- Patent number 9,884,401
- Issue date Feb 6, 2018
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D808349
- Issue date Jan 23, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
ELASTIC MEMBRANE, POLISHING HEAD, AND POLISHING METHOD
- Publication number 20250100107
- Publication date Mar 27, 2025
- EBARA CORPORATION
- Yuichi KATO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD AND POLISHING SYSTEM
- Publication number 20240399526
- Publication date Dec 5, 2024
- EBARA CORPORATION
- Yuichi KATO
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE AND METHOD OF MANUFACTURING ELASTIC MEMBRANE
- Publication number 20230065029
- Publication date Mar 2, 2023
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
FILM-THICKNESS MEASURING METHOD, METHOD OF DETECTING NOTCH PORTION,...
- Publication number 20220344221
- Publication date Oct 27, 2022
- EBARA CORPORATION
- Osamu NABEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING RECIPE DETERMINATION DEVICE
- Publication number 20220168864
- Publication date Jun 2, 2022
- EBARA CORPORATION
- Yoshikazu Kato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20220048157
- Publication date Feb 17, 2022
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20210335650
- Publication date Oct 28, 2021
- EBARA CORPORATION
- Satoru YAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS
- Publication number 20210060725
- Publication date Mar 4, 2021
- EBARA CORPORATION
- Cheng Cheng
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF DETECTING ABNORMALITY OF A ROLLER WHICH TRANSMITS A LOCAL...
- Publication number 20210060723
- Publication date Mar 4, 2021
- EBARA CORPORATION
- Tomoko Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS
- Publication number 20200361056
- Publication date Nov 19, 2020
- EBARA CORPORATION
- Makoto Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20200206867
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...
- Publication number 20200206868
- Publication date Jul 2, 2020
- EBARA CORPORATION
- Tomoko Owada
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20200047308
- Publication date Feb 13, 2020
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
METHOD AND APPARATUS FOR POLISHING A SUBSTRATE
- Publication number 20190240801
- Publication date Aug 8, 2019
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS
- Publication number 20180301367
- Publication date Oct 18, 2018
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...
- Publication number 20180117730
- Publication date May 3, 2018
- EBARA CORPORATION
- Osamu NABEYA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...
- Publication number 20170266779
- Publication date Sep 21, 2017
- EBARA CORPORATION
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM
- Publication number 20170173756
- Publication date Jun 22, 2017
- EBARA CORPORATION
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20170144267
- Publication date May 25, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20170106497
- Publication date Apr 20, 2017
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20170057049
- Publication date Mar 2, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
METHOD AND APPARATUS FOR POLISHING A SUBSTRATE
- Publication number 20160176011
- Publication date Jun 23, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING DEVICE AND POLISHING METHOD
- Publication number 20150273650
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20150273657
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...
- Publication number 20150133038
- Publication date May 14, 2015
- EBARA CORPORATION
- Satoru YAMAKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20140370794
- Publication date Dec 18, 2014
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS
- Publication number 20140065934
- Publication date Mar 6, 2014
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING METHOD AND POLISHING APPARATUS
- Publication number 20130337722
- Publication date Dec 19, 2013
- KEISUKE NAMIKI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20130324012
- Publication date Dec 5, 2013
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD
- Publication number 20130196573
- Publication date Aug 1, 2013
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING

Shingo Togashi

Person

Patents Grantslast 30 patents

Rubber membrane having first and second hardness for use in a polis...

Film-thickness measuring method, method of detecting notch portion,...

Polishing apparatus

Elastic membrane, substrate holding device, and polishing apparatus

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane

Polishing apparatus and method of controlling inclination of statio...

Polishing apparatus and polishing method

Elastic membrane

Method of detecting abnormality of a roller which transmits a local...

Method and apparatus for polishing a substrate

Substrate holding device, substrate polishing apparatus, and method...

Elastic membrane and substrate holding apparatus

Substrate holding apparatus, elastic membrane, polishing apparatus,...

Elastic membrane, substrate holding device, and polishing apparatus

Elastic membrane

Elastic membrane for semiconductor wafer polishing

Polishing apparatus

Substrate holding device, and substrate polishing apparatus

Substrate polishing method, top ring, and substrate polishing appar...

Polishing apparatus and polishing method

Elastic membrane for semiconductor wafer polishing

Polishing apparatus, control method and recording medium

Method and apparatus for polishing a substrate

Elastic membrane, substrate holding apparatus, and polishing apparatus

Elastic membrane for semiconductor wafer polishing

Polishing device and polishing method

Elastic membrane for semiconductor wafer polishing apparatus

Elastic membrane and substrate holding apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Patents Applicationslast 30 patents

ELASTIC MEMBRANE, POLISHING HEAD, AND POLISHING METHOD

POLISHING HEAD AND POLISHING SYSTEM

ELASTIC MEMBRANE AND METHOD OF MANUFACTURING ELASTIC MEMBRANE

FILM-THICKNESS MEASURING METHOD, METHOD OF DETECTING NOTCH PORTION,...

POLISHING RECIPE DETERMINATION DEVICE

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS

METHOD OF DETECTING ABNORMALITY OF A ROLLER WHICH TRANSMITS A LOCAL...

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS AND METHOD OF CONTROLLING INCLINATION OF STATIO...

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

METHOD AND APPARATUS FOR POLISHING A SUBSTRATE

ELASTIC MEMBRANE, SUBSTRATE HOLDING DEVICE, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS, ELASTIC MEMBRANE, POLISHING APPARATUS,...

SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...

POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

POLISHING APPARATUS AND POLISHING METHOD

METHOD AND APPARATUS FOR POLISHING A SUBSTRATE

POLISHING DEVICE AND POLISHING METHOD

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDER, POLISHING APPARATUS, POLISHING METHOD, AND RETAIN...

POLISHING APPARATUS

ELASTIC MEMBRANE AND SUBSTRATE HOLDING APPARATUS

POLISHING METHOD AND POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

SUBSTRATE HOLDER, POLISHING APPARATUS, AND POLISHING METHOD