Shinichi SUGIYAMA

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,009,791
- Issue date May 18, 2021
- FUJIFILM Corporation
- Takamitsu Tomiga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, and, method for producing electronic device...
- Patent number 10,126,651
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Shinichi Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray- or radiation-sensitive resin composition, actinic ray-...
- Patent number 9,454,079
- Issue date Sep 27, 2016
- FUJIFILM Corporation
- Akinori Shibuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,785,104
- Issue date Jul 22, 2014
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,632,938
- Issue date Jan 21, 2014
- FUJIFILM Corporation
- Shinichi Sugiyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,349,535
- Issue date Jan 8, 2013
- FUJIFILM Corporation
- Kana Fujii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,142,977
- Issue date Mar 27, 2012
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,124,310
- Issue date Feb 28, 2012
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern-forming method using the same
- Patent number 7,989,137
- Issue date Aug 2, 2011
- FUJIFILM Corporation
- Shuji Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,923,196
- Issue date Apr 12, 2011
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,799,506
- Issue date Sep 21, 2010
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 7,691,560
- Issue date Apr 6, 2010
- FUJIFILM Corporation
- Kazuyoshi Mizutami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,592,118
- Issue date Sep 22, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern formation method using the same
- Patent number 7,498,116
- Issue date Mar 3, 2009
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180299777
- Publication date Oct 18, 2018
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...
- Publication number 20180217497
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR FORMING PATTERNED MASK, METHOD F...
- Publication number 20160209749
- Publication date Jul 21, 2016
- FUJIFILM CORPORATION
- Hisao YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160004156
- Publication date Jan 7, 2016
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE...
- Publication number 20150160555
- Publication date Jun 11, 2015
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140248562
- Publication date Sep 4, 2014
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...
- Publication number 20140234759
- Publication date Aug 21, 2014
- FUJIFILM CORPORATION
- Shohei KATAOKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140212814
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Junichi ITO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20110081612
- Publication date Apr 7, 2011
- FUJIFILM CORPORATION
- Kana FUJII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20110014570
- Publication date Jan 20, 2011
- FUJIFILM CORPORATION
- Kazuyoshi Mizutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20100248136
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Shinichi SUGIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20100248146
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME
- Publication number 20090087789
- Publication date Apr 2, 2009
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20090087776
- Publication date Apr 2, 2009
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20090087784
- Publication date Apr 2, 2009
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
- Publication number 20080241750
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241743
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241749
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080081289
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and pattern forming method using the same
- Publication number 20070224539
- Publication date Sep 27, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Shinichi SUGIYAMA

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Pattern forming method, and, method for producing electronic device...

Actinic ray- or radiation-sensitive resin composition, actinic ray-...

Resist composition and pattern forming method using the same

Actinic-ray- or radiation-sensitive resin composition and method of...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition and pattern-forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition and pattern formation method using the same

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMING METHOD, METHOD FOR FORMING PATTERNED MASK, METHOD F...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, AND, METHOD FOR PRODUCING ELECTRONIC DEVICE...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Resist composition and pattern forming method using the same