Shinichi Tachi

Person

Sayama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for dry etching
- Patent number 7,071,114
- Issue date Jul 4, 2006
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,927,173
- Issue date Aug 9, 2005
- Renesas Technology Corp.
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,902,683
- Issue date Jun 7, 2005
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and manufacturing sy...
- Patent number 6,842,658
- Issue date Jan 11, 2005
- Hitachi, Ltd.
- Masaru Izawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 6,713,401
- Issue date Mar 30, 2004
- Hitachi, Ltd.
- Kenetsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for cleaning semiconductor wafers in a vacuum environment
- Patent number 6,643,893
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Yoshinori Momonoi
- B08 - CLEANING
Information Patent Grant
Method for cleaning semiconductor wafers in a vacuum environment
- Patent number 6,629,538
- Issue date Oct 7, 2003
- Hitachi, Ltd.
- Kenetsu Yokogawa
- B08 - CLEANING
Information Patent Grant
Dry chemical-mechanical polishing method
- Patent number 6,579,154
- Issue date Jun 17, 2003
- Hitachi, Ltd.
- Seiji Yamamoto
- B24 - GRINDING POLISHING
Information Patent Grant
Dry etching device and dry etching method
- Patent number 6,573,190
- Issue date Jun 3, 2003
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 6,562,722
- Issue date May 13, 2003
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and method for manufacturing a semiconduct...
- Patent number 6,551,445
- Issue date Apr 22, 2003
- Hitachi, Ltd.
- Ken'etsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,511,608
- Issue date Jan 28, 2003
- Hitachi, Ltd.
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching device and method of producing semiconductor devices
- Patent number 6,506,687
- Issue date Jan 14, 2003
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus and plasma treatment method
- Patent number 6,475,918
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 6,333,273
- Issue date Dec 25, 2001
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,197,151
- Issue date Mar 6, 2001
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 6,136,721
- Issue date Oct 24, 2000
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,136,214
- Issue date Oct 24, 2000
- Hitachi, Ltd.
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,129,806
- Issue date Oct 10, 2000
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,033,481
- Issue date Mar 7, 2000
- Hitachi, Ltd.
- Ken'etsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 6,008,133
- Issue date Dec 28, 1999
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,891,252
- Issue date Apr 6, 1999
- Hitachi, Ltd.
- Ken'etsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 5,795,832
- Issue date Aug 18, 1998
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device having improved isolation between elect...
- Patent number 5,736,449
- Issue date Apr 7, 1998
- Hitachi, Ltd.
- Hiroshi Miki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,705,029
- Issue date Jan 6, 1998
- Hitachi, Ltd.
- Sadayuki Okudaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dry etching
- Patent number 5,650,038
- Issue date Jul 22, 1997
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,643,473
- Issue date Jul 1, 1997
- Hitachi, Ltd.
- Shinichi Tachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device having improved isolation between elect...
- Patent number 5,499,207
- Issue date Mar 12, 1996
- Hitachi, Ltd.
- Hiroshi Miki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for dry etching
- Patent number 5,474,650
- Issue date Dec 12, 1995
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etching method and apparatus
- Patent number 5,409,562
- Issue date Apr 25, 1995
- Hitachi, Ltd.
- Takao Kumihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060144518
- Publication date Jul 6, 2006
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050082006
- Publication date Apr 21, 2005
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for dry etching
- Publication number 20050074977
- Publication date Apr 7, 2005
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040178180
- Publication date Sep 16, 2004
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20040058554
- Publication date Mar 25, 2004
- Masaru Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20030098288
- Publication date May 29, 2003
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device and manufacturing sy...
- Publication number 20020103563
- Publication date Aug 1, 2002
- Masaru Izawa
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for dry etching
- Publication number 20020098708
- Publication date Jul 25, 2002
- Hitachi, Ltd.
- Takao Kumihashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry cleaning method
- Publication number 20020092541
- Publication date Jul 18, 2002
- Kenetsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry cleaning apparatus
- Publication number 20020092121
- Publication date Jul 18, 2002
- Yoshinori Momonoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20020094691
- Publication date Jul 18, 2002
- Hitachi, Ltd.
- Kenetsu Yokogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20020069971
- Publication date Jun 13, 2002
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry chemical-mechanical polishing method
- Publication number 20020037684
- Publication date Mar 28, 2002
- Hitachi, Ltd.
- Seiji Yamamoto
- B24 - GRINDING POLISHING
Information Patent Application
PLASMA PROCESSING SYSTEM AND METHOD
- Publication number 20020020494
- Publication date Feb 21, 2002
- KEN?apos;ETSU YOKOGAWA
- H01 - BASIC ELECTRIC ELEMENTS

Shinichi Tachi

Person

Patents Grantslast 30 patents

Method and apparatus for dry etching

Plasma processing method

Plasma processing apparatus and plasma processing method

Method of manufacturing a semiconductor device and manufacturing sy...

Method for manufacturing semiconductor device

Apparatus for cleaning semiconductor wafers in a vacuum environment

Method for cleaning semiconductor wafers in a vacuum environment

Dry chemical-mechanical polishing method

Dry etching device and dry etching method

Method and apparatus for dry etching

Plasma processing system and method for manufacturing a semiconduct...

Plasma processing method

Dry etching device and method of producing semiconductor devices

Plasma treatment apparatus and plasma treatment method

Method and apparatus for dry etching

Plasma processing apparatus and plasma processing method

Method and apparatus for dry etching

Plasma processing method and apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Method and apparatus for dry etching

Plasma processing apparatus

Method and apparatus for dry etching

Semiconductor memory device having improved isolation between elect...

Dry etching method

Method for dry etching

Dry etching method

Semiconductor memory device having improved isolation between elect...

Method and apparatus for dry etching

Dry-etching method and apparatus

Patents Applicationslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Method and apparatus for dry etching

Plasma processing apparatus

Dry etching method

Plasma processing method

Method of manufacturing a semiconductor device and manufacturing sy...

Method and apparatus for dry etching

Dry cleaning method

Dry cleaning apparatus

Method for manufacturing semiconductor device

Plasma processing apparatus and plasma processing method

Dry chemical-mechanical polishing method

PLASMA PROCESSING SYSTEM AND METHOD